CHEMICAL-MECHANICAL POLISHING PAD CONDITIONING SYSTEM
    11.
    发明申请
    CHEMICAL-MECHANICAL POLISHING PAD CONDITIONING SYSTEM 有权
    化学机械抛光垫调节系统

    公开(公告)号:US20110244764A1

    公开(公告)日:2011-10-06

    申请号:US12754645

    申请日:2010-04-06

    IPC分类号: B24B1/00 B24B21/18

    CPC分类号: B24B53/017

    摘要: Polishing pad conditioning system. The system includes a first rotatable platen supporting a polishing pad containing asperities having a radius of curvature. A second rotatable platen supports a disk of bulk material having holes therethrough, the second rotatable platen supported for translation as well as rotation. Means are provided for pushing the polishing pad and bulk material into contact at an interface during rotation and translation and means are provided for passing a slurry through the holes in the bulk material to the interface whereby the radius of curvature of the pad asperities is increased. Water may be delivered to the bulk material for cooling. A process for conditioning a polishing pad is also disclosed.

    摘要翻译: 抛光垫调节系统。 该系统包括支撑包含具有曲率半径的凹凸的抛光垫的第一可旋转压板。 第二可旋转压板支撑具有穿过其中的孔的散装材料盘,第二可旋转压板被支撑成平移和旋转。 提供了用于在旋转和平移期间将抛光垫和散装材料在界面处推动接触的装置,并且提供了用于使浆料通过块状材料中的孔通过到界面的装置,由此增加焊盘粗糙度的曲率半径。 水可以输送到散装材料进行冷却。 还公开了一种用于调理抛光垫的工艺。

    Centerless belt grinder
    12.
    发明授权
    Centerless belt grinder 有权
    无心磨床

    公开(公告)号:US07803037B2

    公开(公告)日:2010-09-28

    申请号:US11983712

    申请日:2007-11-09

    IPC分类号: B24B7/00 B24B21/18

    CPC分类号: B24B5/18 B24B21/02 B24B55/02

    摘要: A multi-head centerless belt grinder for removing material from a workpiece includes a common base and a plurality of grinding heads spaced apart from one another and mounted to the common base. Each grinding head includes a moveable work rest blade, a moveable regulating wheel and a moveable grinding belt positioned by servomotors to centerless grind the workpiece along a common axis of rotation. The grinder is programmable for rapid machine changeover and set-up typically within 2-5 minutes to accommodate a large range of workpiece diameters. This feature results in improved productivity and output as well as greater flexibility for scheduling numerous workpiece diameters within a normal eight-hour work shift. A trough may extend beneath and between each of the grinding heads to more efficiently collect and transfer grinding swarf generated during the grinding process to a filter operable to separate solids within the swarf from coolant.

    摘要翻译: 用于从工件去除材料的多头无心磨带磨床包括:公共基座和彼此间隔开并安装到公共基座的多个研磨头。 每个研磨头包括可移动的工作休息叶片,可移动的调节轮和由伺服电动机定位的可移动研磨带,以沿着共同的旋转轴线对工件进行无心磨削。 研磨机是可编程的,用于快速的机器切换和设置,通常在2-5分钟内以适应大范围的工件直径。 该功能可提高生产效率和产量,并具有更大的灵活性,可在正常的八小时工作班次内调度多个工件直径。 槽可以在每个研磨头之下和之间延伸,以更有效地收集和转移在研磨过程中产生的研磨切屑到可操作以将切屑内的固体与冷却剂分离的过滤器。

    Carrier ring for carrier head
    13.
    发明授权
    Carrier ring for carrier head 有权
    承载头用于承载头

    公开(公告)号:US07699688B2

    公开(公告)日:2010-04-20

    申请号:US11741677

    申请日:2007-04-27

    IPC分类号: B24B21/18

    CPC分类号: B24B37/32

    摘要: A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.

    摘要翻译: 描述了具有基座组件,保持环组件,载体环和柔性膜的承载头。 承载环具有环形上部和环形下部,其具有比环形上部的上表面更小的内径的下表面,其中承载环周向地包围保持环并且具有接触抛光的下表面 垫。

    Tool setter for a grinding machine
    14.
    发明授权

    公开(公告)号:US07686678B2

    公开(公告)日:2010-03-30

    申请号:US11703725

    申请日:2007-02-08

    申请人: Torgny Jansson

    发明人: Torgny Jansson

    IPC分类号: B24B21/18

    CPC分类号: B24B3/38 B24B41/066

    摘要: A device or tool setter has the purpose of setting the position of a support bar, adjustably connected to a grinding machine, in relation to a rotatable grindstone of the machine for obtaining a desired edge angle of a tool supported for grinding by the support bar. The device is provided with discs for defining two contact points with the grindstone and a hole for connection to the support bar.

    Non-glazing dressing wheel
    15.
    发明授权
    Non-glazing dressing wheel 失效
    非玻璃修整轮

    公开(公告)号:US07530886B2

    公开(公告)日:2009-05-12

    申请号:US10560521

    申请日:2004-06-23

    申请人: Steven G. Smarsh

    发明人: Steven G. Smarsh

    IPC分类号: B24B21/18

    CPC分类号: B24B53/14 B24B53/12

    摘要: A non-glazing dressing wheel (10) suitable for dressing a grinding wheel surface to be used for maintaining a certain tolerance to assure reliability and quality control of ground parts during the grinding operation. The dressing wheel includes at least a first dressing wheel component (12) including at least one interrupted cutting outer surface, wherein the interrupted cutting surface is embodied in a cutting wheel (10) with a plurality of tips (12) extending outwardly from the outer surface. The plurality of tips (12) contact the grinding wheel during the grinding operation, thereby alleviating glazing and heat expansion of the grinding wheel while being dressed. Other preferred embodiments include sandwiching the interrupted cutting surface between two flat grinding surfaces, preferably being made of diamond or Borazon.

    摘要翻译: 一种适用于修整砂轮表面的非玻璃修整轮(10),用于保持一定的公差,以确保在磨削操作期间对接地部件的可靠性和质量控制。 修整轮包括至少一个包括至少一个中断的切割外表面的修整轮部件(12),其中中断的切割表面被实施在具有从外部向外延伸的多个尖端(12)的切割轮(10)中 表面。 在研磨操作期间,多个尖端(12)接触砂轮,从而在打磨时减轻磨轮的玻璃和热膨胀。 其它优选实施例包括将中断的切割表面夹在两个平坦的研磨表面之间,优选地由金刚石或硼砂制成。

    Contoured CMP pad dresser and associated methods
    16.
    发明授权
    Contoured CMP pad dresser and associated methods 有权
    轮廓CMP抛光修整器及相关方法

    公开(公告)号:US07201645B2

    公开(公告)日:2007-04-10

    申请号:US10954956

    申请日:2004-09-29

    申请人: Chien-Min Sung

    发明人: Chien-Min Sung

    IPC分类号: B24B21/18

    摘要: CMP pad dressers with increased pad dressing work loads on the centrally located abrasive particles during dressing of a CMP pad, and methods associated therewith are disclosed and described. The increase in work load on centralized particles improves pad dressing performance and also extends the service life of the pad dresser.

    摘要翻译: 在修整CMP垫期间,在中心位置的磨料颗粒上具有增加的衬垫修整工作载荷的CMP抛光垫修整器,以及与之相关的方法被公开和描述。 集中式颗粒的工作负荷的增加可改善垫料修整性能,并延长焊盘修整器的使用寿命。

    CERAMIC POLISHING PAD DRESSER AND METHOD FOR FABRICATING THE SAME
    17.
    发明申请
    CERAMIC POLISHING PAD DRESSER AND METHOD FOR FABRICATING THE SAME 有权
    陶瓷抛光垫片及其制作方法

    公开(公告)号:US20070049185A1

    公开(公告)日:2007-03-01

    申请号:US11466716

    申请日:2006-08-23

    IPC分类号: B24B21/18

    CPC分类号: B24B53/017 B24D3/14

    摘要: A ceramic polishing pad dresser and the method for fabricating the same are provided. Abrasive particles are adhered onto a ceramic substrate by heating a ceramic powder to be vitrified, thus forming a ceramic diamond disk. Meanwhile, a plastic base is mounted on the bottom of the ceramic diamond disk. As for heating the ceramic powder to be vitrified, the ceramic powder with low melting point is disposed on the ceramic substrate, and to be heated to form a vitrified adhering layer, so as to adhere the abrasive particles disposed thereon to the ceramic substrate. The plastic base mounted on the bottom of the ceramic diamond disk is provided for bearing the ceramic diamond disk and has corresponding screw holes and positioning holes formed thereon for fitting the chemical mechanical polishing table to be mounted and reducing the manufacturing cost.

    摘要翻译: 提供陶瓷抛光垫修整器及其制造方法。 通过加热待陶瓷的陶瓷粉末将磨料颗粒粘附到陶瓷基材上,从而形成陶瓷金刚石圆盘。 同时,在陶瓷金刚石圆盘的底部安装塑料底座。 对于陶瓷粉末进行加热,将陶瓷粉末熔点低的陶瓷粉末设置在陶瓷基板上,加热形成玻璃化粘附层,使其上配置的磨粒附着在陶瓷基板上。 安装在陶瓷金刚石圆盘底部的塑料基座设置用于承载陶瓷金刚石圆盘,并具有形成在其上的相应螺纹孔和定位孔,用于安装待安装的化学机械抛光台并降低制造成本。

    BELT SANDER ERASER ATTACHMENT
    18.
    发明申请
    BELT SANDER ERASER ATTACHMENT 失效
    皮带砂光机附件

    公开(公告)号:US20070010182A1

    公开(公告)日:2007-01-11

    申请号:US11176663

    申请日:2005-07-07

    IPC分类号: B24B21/18

    CPC分类号: B24B23/06 B24B53/007

    摘要: A Belt Sander Eraser Attachment is disclosed. The attachment is configured to be attached to a conventional belt sander such that it provides the operator with the ability to remove built up sawdust and the like from the sanding belt. The device removably replaces the conventional front handle on a sander and the new handle has functionality as both a handle and an actuator for the belt sander eraser. The eraser actuation is convenient and ergonomically comfortable for the user while the sander is in use.

    摘要翻译: 皮带砂光机橡皮擦附件被披露。 附件被配置为附接到传统的带式砂磨机,使得其提供操作者从砂带上去除建立的锯屑等的能力。 该装置可拆卸地代替砂光机上的常规前手柄,并且新手柄具有作为皮带砂光机橡皮擦的手柄和致动器的功能。 当砂光机使用时,橡皮擦致动方便和符合人体工程学的使用者舒适。

    METHOD FOR MANUFACTURING DIAMOND FILM
    19.
    发明申请
    METHOD FOR MANUFACTURING DIAMOND FILM 失效
    制造金刚石薄膜的方法

    公开(公告)号:US20070004325A1

    公开(公告)日:2007-01-04

    申请号:US11427215

    申请日:2006-06-28

    申请人: Hsiao-Kuo CHANG

    发明人: Hsiao-Kuo CHANG

    IPC分类号: B24B53/00 B24B21/18

    CPC分类号: C23C16/01 C23C16/27

    摘要: A method for manufacturing a diamond film is provided. The material with a low thermal decomposition point is used as a substrate. A buffer layer is formed on the substrate by coating or deposition, and then a diamond film is coated thereon, fitting the shape of the required diamond film. With the buffer layer, the coating or deposition uniformity of the diamond film is improved, and the problems such as thermal stress cracking and assembly damage are solved as well. During a subsequent process of forming the diamond film, the substrate is thermally decomposed due to a high temperature, such that the problems such as stripping and die loss are overcome.

    摘要翻译: 提供了制造金刚石膜的方法。 具有低热分解点的材料用作基底。 通过涂覆或沉积在衬底上形成缓冲层,然后在其上涂覆金刚石膜,使其适合所需金刚石膜的形状。 利用缓冲层,金刚石膜的涂层或沉积均匀性得到改善,也解决了热应力开裂和组装损坏等问题。 在形成金刚石薄膜的后续工艺中,由于高温,基板被热分解,从而克服了剥离和模具损耗等问题。

    Dressing tool, dressing device, dressing method, processing device and semiconductor device producing method
    20.
    发明申请
    Dressing tool, dressing device, dressing method, processing device and semiconductor device producing method 审中-公开
    修整工具,修整装置,修整方法,加工装置和半导体装置的制造方法

    公开(公告)号:US20060292969A1

    公开(公告)日:2006-12-28

    申请号:US11511279

    申请日:2006-08-29

    IPC分类号: B24B1/00 B24B21/18

    CPC分类号: B24B53/017

    摘要: A dressing apparatus DA is constructed from a pad holding mechanism 10 which holds a polishing pad 15 that has a doughnut disk-form pad surface 15a, and which causes this polishing pad 15 to rotate, a dressing tool 2 which has a substantially rectangular dressing surface 3, and a dressing tool holding mechanism 1 which holds the dressing tool 2 so that the dressing surface 3 of this dressing tool 2 is caused to face the pad surface 15a of the polishing pad 15 that is held and caused to rotate by the pad holding mechanism 10. The dressing tool holding mechanism 1 causes the held dressing tool 2 to contact the pad surface 15a in a state in which the centerline L1 in the direction of width of the dressing surface 3 is oriented so that this centerline extends in the radial direction of the pad surface 15a, and thus causes dressing to be performed. As a result, the flatness of the working surface following dressing can be improved.

    摘要翻译: 修整装置DA由保持具有环形盘形垫表面15a的抛光垫15的垫保持机构10构成,并使该抛光垫15旋转,修整工具2具有大致矩形的敷料 表面3和修整工具保持机构1,其保持修整工具2,使得该修整工具2的修整面3面对被保持并由其旋转的抛光垫15的焊盘表面15a 敷料保持机构10.修整工具保持机构1使得保持的修整工具2在修整面3的宽度方向上的中心线L 1取向成使得该中心线延伸的状态下接触衬垫表面15a 在垫表面15a的径向方向上,从而进行修整。 结果,能够提高修整后的工作面的平坦度。