公开(公告)号：US20220319797A1

公开(公告)日：2022-10-06

申请号：US17708517

申请日：2022-03-30

Applicant: ASML Netherlands B.V.

Inventor： Shichen GU ,  Weiming REN ,  Qingpo XI

IPC: H01J37/09 ,  H01J37/20

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.

公开(公告)号：US20220308459A1

公开(公告)日：2022-09-29

申请号：US17838946

申请日：2022-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina EUMMELEN ,  Frank Debougnoux ,  Koen Cuypers ,  Han Henricus Aldegonda Lempens ,  Theodorus Wilhelmus Polet ,  Jorge Alberto Vieyra Salas ,  John Maria Bombeeck ,  Johannes Cornelis Paulus Melman ,  Giovanni Luca Gattobigio

IPC: G03F7/20

Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

公开(公告)号：US20220301811A1

公开(公告)日：2022-09-22

申请号：US17633176

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Lingling PU ,  Bo WANG ,  Zhonghua DONG ,  Yongxin WANG

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/2251 ,  G06T5/00 ,  G06T5/50

Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.

公开(公告)号：US20220299889A1

公开(公告)日：2022-09-22

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis VAN KEULEN ,  Hendrikus COX ,  Ramidin Izair KAMIDI ,  Willem Herman Gertruda Anna KOENEN

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.

公开(公告)号：US20220299881A1

公开(公告)日：2022-09-22

申请号：US17636103

申请日：2020-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Yunan ZHENG ,  Yongfa FAN ,  Mu FENG ,  Leiwu ZHENG ,  Jen-Shiang WANG ,  Ya LUO ,  Chenji ZHANG ,  Jun CHEN ,  Zhenyu HOU ,  Jinze WANG ,  Feng CHEN ,  Ziyang MA ,  Xin GUO ,  Jin CHENG

IPC: G03F7/20

Abstract: A method for generating modified contours and/or generating metrology gauges based on the modified contours. A method of generating metrology gauges for measuring a physical characteristic of a structure on a substrate includes obtaining (i) measured data associated with the physical characteristic of the structure printed on the substrate, and (ii) at least portion of a simulated contour of the structure, the at least a portion of the simulated contour being associated with the measured data; modifying, based on the measured data, the at least a portion of the simulated contour of the structure; and generating the metrology gauges on or adjacent to the modified at least a portion of the simulated contour, the metrology gauges being placed to measure the physical characteristic of the simulated contour of the structure.

公开(公告)号：US11448607B2

公开(公告)日：2022-09-20

申请号：US16470928

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： Chiyan Kuan

IPC: G01N23/225 ,  H01J37/22 ,  H01J37/30 ,  H01J37/153 ,  H01J37/21

Abstract: Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.

公开(公告)号：US20220293389A1

公开(公告)日：2022-09-15

申请号：US17636344

申请日：2020-08-15

Applicant: ASML Netherlands B.V.

Inventor： Thomas Jarik HUISMAN ,  Shakeeb Bin HASAN

IPC: H01J37/22 ,  H01J37/28 ,  G06T5/00

Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.

公开(公告)号：US20220291590A1

公开(公告)日：2022-09-15

申请号：US17634309

申请日：2020-07-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing SU ,  Yana CHENG ,  Zchenxi LIN ,  Yi ZOU ,  Ddavit HARUTYUNYAN ,  Emil Peter SCHMITT-WEAVER ,  Kaustuve BHATTACHARYYA ,  Cornelis Johannes Henricus LAMBREGTS ,  Hadi YAGUBIZADE

IPC: G03F7/20

Abstract: A method for determining a model to predict overlay data associated with a current substrate being patterned. The method involves obtaining (i) a first data set associated with one or more prior layers and/or current layer of the current substrate, (ii) a second data set including overlay metrology data associated with one or more prior substrates, and (iii) de-corrected measured overlay data associated with the current layer of the current substrate; and determining, based on (i) the first data set, (ii) the second data set, and (iii) the de-corrected measured overlay data, values of a set of model parameters associated with the model such that the model predicts overlay data for the current substrate, wherein the values are determined such that a cost function is minimized, the cost function comprising a difference between the predicted data and the de-corrected measured overlay data.

公开(公告)号：US20220290734A1

公开(公告)日：2022-09-15

申请号：US17633000

申请日：2020-07-09

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten VAN DE WIJDEVEN ,  Johannes VERMEULEN ,  Jeroen Pieter STARREVELD ,  Stan Henricus VAN DER MEULEN

IPC: F16F15/02 ,  F16F13/00 ,  G03F7/20

Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.

公开(公告)号：US11443915B2

公开(公告)日：2022-09-13

申请号：US16649975

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Joe Wang ,  Chia Wen Lin ,  Zhongwei Chen ,  Chang-Chun Yeh

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.