LENS AND LENS UNIT
    21.
    发明公开
    LENS AND LENS UNIT 审中-公开

    公开(公告)号:US20240069301A1

    公开(公告)日:2024-02-29

    申请号:US18235049

    申请日:2023-08-17

    申请人: HOYA CORPORATION

    发明人: Kenji YAMANAKA

    IPC分类号: G02B7/02

    CPC分类号: G02B7/02

    摘要: A lens includes: an optical-functioning portion that is a glass press-molded product and has both lens surfaces in an optical axis direction and a volume absorption portion allowing a shape error due to press-molding around the lens surfaces; and a flange portion made of a material different from the glass of the optical-functioning portion, fixed to the optical-functioning portion to surround the volume absorption portion, and having a position reference surface serving as a reference of a lens position. An outer diameter D in an orthogonal direction to the optical axis defined by the flange portion and a thickness t of the flange portion satisfy the following condition (1) or (2).


    when 2 mm≤D≤5 mm, 0.15≤t≤0.35  (1)



    when D>5 mm, 0.15+(D−5)×0.03≤t≤0.15+(D−5)×0.07  (2)

    Reflective mask blank, reflective mask, and method for manufacturing semiconductor device

    公开(公告)号:US11914281B2

    公开(公告)日:2024-02-27

    申请号:US17311662

    申请日:2019-12-23

    申请人: HOYA CORPORATION

    发明人: Yohei Ikebe

    IPC分类号: G03F1/24 G03F1/26

    CPC分类号: G03F1/24 G03F1/26

    摘要: A reflective mask blank comprises a substrate; a multilayer reflective film which is formed on the substrate and reflects EUV light; and a layered film which is formed on the multilayer reflective film. The layered film has an absolute reflectance of 2.5% or less with respect to EUV light, and comprises a first layer and a second layer formed on the first layer; and the first layer comprises a phase shift film which shifts the phase of EUV light. Alternatively, the layered film is a phase shift film which comprises a first layer and a second layer formed on the first layer, and which shifts the phase of EUV light; and the first layer comprises an absorption layer that has an absolute reflectance of 2.5% or less with respect to EUV light.

    Imaging module and endoscope having image sensor and mounting board

    公开(公告)号:US11903566B2

    公开(公告)日:2024-02-20

    申请号:US17259735

    申请日:2020-03-12

    申请人: HOYA CORPORATION

    发明人: Atsushi Komoro

    摘要: An imaging module includes: an image sensor; and a mounting board on which the image sensor is mounted together with a plurality of passive components. The mounting board includes: a first surface on which the image sensor is surface-mounted; a second surface that is located on an opposite side to the first surface and on which the passive component is mounted; a third surface that is continuous with the second surface via a step and on which the passive component is mounted; and a columnar cable connection block that rises from the second and third surfaces and to which a cable is connected.

    Reflective mask blank, reflective mask and method of manufacturing semiconductor device

    公开(公告)号:US11880130B2

    公开(公告)日:2024-01-23

    申请号:US17946709

    申请日:2022-09-16

    申请人: HOYA CORPORATION

    IPC分类号: G03F1/24 G03F1/26

    CPC分类号: G03F1/24 G03F1/26

    摘要: Provided are a reflective mask blank, having a phase shift film having little dependence of phase difference and reflectance on film thickness, and a reflective mask. The reflective mask blank is characterized in that the phase shift film is composed of a material comprised of an alloy having two or more types of metal so that reflectance of the surface of the phase shift film is more than 3% to not more than 20% and so as to have a phase difference of 170 degrees to 190 degrees, and when a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k>α*n+β is defined as Group A and a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k

    MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

    公开(公告)号:US20230393457A1

    公开(公告)日:2023-12-07

    申请号:US18034656

    申请日:2021-12-02

    申请人: HOYA CORPORATION

    IPC分类号: G03F1/32

    CPC分类号: G03F1/32

    摘要: Provided is a mask blank. A mask blank comprising a phase shift film on a transparent substrate, the phase shift film having a structure in which a first layer, a second layer, and a third layer are layered in this order on the transparent substrate, the first layer and the third layer including hafnium and oxygen, and the second layer including silicon and oxygen, wherein when thicknesses of the first layer, the second layer, and the third layer are represented by D1, D2, and D3, respectively, all relationships of (Expression 1-A) to (Expression 1-D) are satisfied, or all relationships of (Expression 2-A) to (Expression 2-D) are satisfied.