公开(公告)号：US20030176081A1

公开(公告)日：2003-09-18

申请号：US10412038

申请日：2003-04-10

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Fred C. Redeker ,  Rajeev Bajaj

IPC分类号： H01L021/31

CPC分类号： B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  G01B7/105

摘要： A method of chemical mechanical polishing a metal layer on a substrate in which the substrate is polished at a first polishing rate. Polishing is monitored with an eddy current monitoring system, and the polishing rate is reduced to a second polishing rate when the eddy current monitoring system indicates that a predetermined thickness of the metal layer remains on the substrate. Then polishing is monitored with an optical monitoring system, and polishing is halted when the optical monitoring system indicates that an underlying layer is at least partially exposed.

公开(公告)号：US20030092371A1

公开(公告)日：2003-05-15

申请号：US10330876

申请日：2002-12-27

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Thomas H. Osterheld ,  Sen-Hou Ko

IPC分类号： B24D011/00

CPC分类号： B24B37/26

摘要： A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.

摘要翻译： 一种用于化学机械抛光装置的抛光垫。 抛光垫包括多个同心的圆形槽。 抛光垫可以包括具有不同宽度和间隔的凹槽的多个区域。

公开(公告)号：US20020137450A1

公开(公告)日：2002-09-26

申请号：US10040108

申请日：2001-10-29

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Thomas H. Osterheld ,  Sen-Hou Ko

IPC分类号： B24D011/00

CPC分类号： B24B37/26

摘要： A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.

摘要翻译： 一种用于化学机械抛光装置的抛光垫。 抛光垫包括多个同心的圆形槽。 抛光垫可以包括具有不同宽度和间隔的凹槽的多个区域。

公开(公告)号：US20020086619A1

公开(公告)日：2002-07-04

申请号：US10044894

申请日：2002-01-09

申请人： Applied Materials, Inc., a Delaware Corporation

发明人： Robert D. Tolles

IPC分类号： B24B001/00

CPC分类号： B24B37/24 ,  B24D3/32 ,  B24D3/344

摘要： A polishing material for chemical mechanical polishing has a mesh of fibers and a binder material holding the fibers in the mesh. The binder material coalesced among the fibers to leave pores in the interstices between the fibers of the mesh. The fibers and binder material provide the polishing material with a brittle texture. The fibers can be cellulose, and the binder material can be a phenolic resin.

摘要翻译： 用于化学机械抛光的抛光材料具有纤维网和将纤维保持在网中的粘合剂材料。 粘合剂材料在纤维之间聚合以在网状物的纤维之间的空隙中留下孔。 纤维和粘合剂材料为抛光材料提供脆性质地。 纤维可以是纤维素，粘合剂材料可以是酚醛树脂。

公开(公告)号：US20010036805A1

公开(公告)日：2001-11-01

申请号：US09863118

申请日：2001-05-22

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Manoocher M.B. Birang ,  Allan Gleason ,  William L. Guthrie

IPC分类号： B23F021/23 ,  B24D011/00

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B47/12 ,  B24B49/04 ,  B24B49/12 ,  B24B51/00 ,  B24D18/00 ,  G01B11/06 ,  G01B11/0683

摘要： The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

摘要翻译： 用于化学机械抛光装置的抛光垫及其制造方法。 抛光垫具有与抛光表面相邻的覆盖层和与压板相邻的背衬层。 具有第一横截面积的覆盖层中的第一开口和具有第二不同横截面积的背衬层中的第二开口形成穿过抛光垫的孔。 基本上透明的聚氨酯塞被定位在孔中，并且粘合剂材料将塞子固定在孔中。

公开(公告)号：US20040209556A1

公开(公告)日：2004-10-21

申请号：US10826185

申请日：2004-04-15

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Steven M. Zuniga ,  Thomas H. Osterheld ,  Lawrence M. Rosenberg

IPC分类号： B24B001/00

CPC分类号： B24B41/06 ,  B24B37/30 ,  B24B37/32

摘要： A substrate is maintained beneath a substrate mounting surface with a retaining ring that includes a generally annular lower portion having a bottom surface for contacting the polishing surface during polishing, and a generally annular upper portion having a bottom surface joined to the lower portion and a top surface fixed to and abutting the base. The lower portion is made of a plastic and the upper lower portion is made of a metal which is more rigid than the plastic.

摘要翻译： 衬底被保持在衬底安装表面下方，其具有保持环，保持环包括大体上环形的下部，其具有用于在抛光期间接触抛光表面的底表面，以及大致环形的上部，其具有连接到下部的底面， 表面固定到基座上并邻接基座。 下部由塑料制成，上部的上部由比塑料更硬的金属制成。

公开(公告)号：US20040033769A1

公开(公告)日：2004-02-19

申请号：US10353326

申请日：2003-01-28

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

IPC分类号： B24B005/00

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

公开(公告)号：US20040033762A1

公开(公告)日：2004-02-19

申请号：US10640127

申请日：2003-08-12

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Hung Chih Chen ,  Ming Kuei Tseng ,  Steven Zuniga

IPC分类号： B24B049/00 ,  B24B051/00

CPC分类号： B24B37/30 ,  B24B47/22 ,  B24B49/00 ,  B25J15/0616 ,  H01L21/30625

摘要： A carrier head has a base, a flexible membrane, and a valve in the carrier head that forms part of a substrate detection system. The valve includes a valve stem that contacts an upper surface of the flexible membrane so that if a substrate is attached to the lower surface of the flexible membrane when the first chamber is evacuated, the valve is actuated to generate a signal to the substrate detection system.

摘要翻译： 载体头具有基底，柔性膜和载体头中的形成基底检测系统的一部分的阀。 所述阀包括与所述柔性膜的上表面接触的阀杆，使得如果在所述第一室被抽真空时将所述基板附接到所述柔性膜的下表面，则所述阀被致动以产生到所述基板检测系统的信号 。

公开(公告)号：US20020164928A1

公开(公告)日：2002-11-07

申请号：US10141316

申请日：2002-05-07

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Robert D. Tolles

IPC分类号： B24B001/00

CPC分类号： B24B37/24 ,  B24D3/32 ,  B24D3/344

摘要： A polishing material for chemical mechanical polishing has a mesh of fibers and a binder material holding the fibers in the mesh. The binder material coalesced among the fibers to leave pores in the interstices between the fibers of the mesh. The fibers and binder material provide the polishing material with a brittle texture. The fibers can be cellulose, and the binder material can be a phenolic resin.

摘要翻译： 用于化学机械抛光的抛光材料具有纤维网和将纤维保持在网中的粘合剂材料。 粘合剂材料在纤维之间聚合以在网状物的纤维之间的空隙中留下孔。 纤维和粘合剂材料为抛光材料提供脆性质地。 纤维可以是纤维素，粘合剂材料可以是酚醛树脂。

公开(公告)号：US20020086624A1

公开(公告)日：2002-07-04

申请号：US10071745

申请日：2002-02-08

申请人： Applied Materials, Inc. a Delaware corporation

发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

IPC分类号： B24B001/00

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.