公开(公告)号：US20040116047A1

公开(公告)日：2004-06-17

申请号：US10722716

申请日：2003-11-25

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Andreas Norbert Wiswesser ,  Judon Tony Pan ,  Boguslaw Swedek

IPC分类号： B24B049/00

CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/12 ,  G01B11/0683 ,  H01L21/3212

摘要： An apparatus, as well as a method, determines an endpoint of chemical mechanical polishing a metal layer on a substrate. The method of the apparatus includes bringing a surface of a substrate into contact with a polishing pad that has a window; causing relative motion between the substrate and the polishing pad; directing a light beam through the window, the motion of the polishing pad relative to the substrate causing the light beam to move in a path across the substrate; detecting light beam reflections from the substrate and a retaining ring; generating reflection data associated with the light beam reflections; dividing the reflection data into a plurality of radial ranges; and identifying the predetermined pattern from the reflection data in the plurality of radial ranges to establish the endpoint.

摘要翻译： 一种装置以及一种方法确定化学机械抛光衬底上的金属层的终点。 该装置的方法包括使基板的表面与具有窗口的抛光垫接触; 引起基板和抛光垫之间的相对运动; 将光束引导通过窗口，抛光垫相对于基底的运动导致光束在穿过基底的路径中移动; 检测来自基板和保持环的光束反射; 产生与光束反射相关联的反射数据; 将反射数据分割成多个径向范围; 以及根据所述多个径向范围内的反射数据识别所述预定图案以建立所述端点。

公开(公告)号：US20040087184A1

公开(公告)日：2004-05-06

申请号：US10636517

申请日：2003-08-07

申请人： APPLIED MATERIALS INC., A Delaware corporation ,  AIR PRODUCTS AND CHEMICALS INC., A Delaware Corporation

发明人： Robert P. Mandal ,  Alexandros T. Demos ,  Timothy Weidman ,  Michael P. Nault ,  Nikolaos Bekiaris ,  Scott J. Weigel ,  Lee A. Senecal ,  James E. Mac Dougall ,  Hareesh Thridandam

IPC分类号： H01L021/31 ,  H01L021/469

CPC分类号： H01L21/02126 ,  C01B33/16 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695

摘要： A process for depositing porous silicon oxide-based films using a sol-gel approach utilizing a precursor solution formulation which includes a purified nonionic surfactant and an additive among other components, where the additive is either an ionic additive or an amine additive which forms an ionic ammonium type salt in the acidic precursor solution. Using this precursor solution formulation enables formation of a film having a dielectric constant less than 2.5, appropriate mechanical properties, and minimal levels of alkali metal impurities. In one embodiment, this is achieved by purifying the surfactant and adding ionic or amine additives such as tetraalkylammonium salts and amines to the stock precursor solution.

摘要翻译： 一种使用溶胶 - 凝胶方法沉积多孔氧化硅基膜的方法，该方法使用前体溶液制剂，其包含纯化的非离子表面活性剂和其它组分中的添加剂，其中添加剂是形成离子的离子添加剂或胺添加剂 铵型盐在酸性前体溶液中。 使用这种前体溶液制剂可以形成介电常数小于2.5，适当的机械性能和最低水平的碱金属杂质的薄膜。 在一个实施方案中，这通过纯化表面活性剂并将离子或胺添加剂例如四烷基铵盐和胺添加到原料前体溶液中来实现。

公开(公告)号：US20030136332A1

公开(公告)日：2003-07-24

申请号：US10057014

申请日：2002-01-24

申请人： APPLIED MATERIALS INC., A Delaware corporation

发明人： Padmanabhan Krishnaraj ,  Pavel Ionov ,  Canfeng Lai ,  Michael Santiago Cox ,  Shamouil Shamouilian

IPC分类号： C30B023/00 ,  C30B025/00 ,  C30B028/12 ,  C30B028/14

CPC分类号： C23C16/45523 ,  C23C16/045 ,  C23C16/509 ,  C30B25/105 ,  H01J37/32935 ,  H01L21/02164 ,  H01L21/02274 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/76837

摘要： A continuous in situ process of deposition, etching, and deposition is provided for forming a film on a substrate using a plasma process. The etch-back may be performed without separate plasma activation of the etchant gas. The sequence of deposition, etching, and deposition permits features with high aspect ratios to be filled, while the continuity of the process results in improved uniformity.

摘要翻译： 提供了沉积，蚀刻和沉积的连续原位工艺，用于使用等离子体工艺在衬底上形成膜。 可以在没有蚀刻剂气体的单独的等离子体激活的情况下执行回蚀。 沉积，蚀刻和沉积的顺序允许填充高纵横比的特征，而过程的连续性导致改善的均匀性。

公开(公告)号：US20030104760A1

公开(公告)日：2003-06-05

申请号：US10339959

申请日：2003-01-10

申请人： Applied Materials, Inc. a Delaware corporation

发明人： Bret W. Adams ,  Boguslaw A. Swedek ,  Rajeev Bajaj ,  Savitha Nanjangud ,  Andreas Norbert Wiswesser ,  Stan D. Tsai ,  David A. Chan ,  Fred C. Redeker ,  Manoocher Birang

IPC分类号： B24B049/00

CPC分类号： B24B37/013 ,  B24B37/042 ,  B24B49/04 ,  B24B49/12 ,  H01L21/30625

摘要： An optical monitoring system for a two-step polishing process which generates a reflectance trace for each of plurality of radial zones. The CMP apparatus may switch from a high-selectivity slurry to a low-selectivity slurry when any of the reflectance traces indicate initial clearance of the metal layer, and polishing may halt when all of the reflectance traces indicate that oxide layer has been completely exposed.

公开(公告)号：US20030029475A1

公开(公告)日：2003-02-13

申请号：US10153315

申请日：2002-05-21

申请人： APPLIED MATERIALS, INC., A Delaware corporation

发明人： Zhong Qiang Hua ,  Zhengquan Tan ,  Zhuang Li ,  Kent Rossman

IPC分类号： C25F003/30 ,  C25F001/00

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  Y10S438/905

摘要： A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after depositing a layer of material over a substrate disposed in the chamber. In one embodiment the process comprises transferring the substrate out of the chamber; flowing a first gas into the substrate processing chamber and forming a plasma within the chamber from the first gas in order to heat the chamber; and thereafter, extinguishing the plasma, flowing an etchant gas into a remote plasma source, forming reactive species from the etchant gas and transporting the reactive species into the substrate processing chamber to etch the unwanted deposition build-up.

摘要翻译： 一种在将材料层沉积在设置在腔室中的衬底上之后，从衬底处理室的一个或多个内表面去除不想要的沉积积累的过程。 在一个实施例中，该方法包括将衬底转移出腔室; 将第一气体流入基板处理室，并在第一气体内在室内形成等离子体，以便加热室; 然后熄灭等离子体，将蚀刻剂气体流入远程等离子体源，从蚀刻剂气体形成反应物质并将反应物质输送到衬底处理室中以蚀刻不需要的沉积物积聚。

公开(公告)号：US20020164938A1

公开(公告)日：2002-11-07

申请号：US10187143

申请日：2002-06-28

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Hung Chih Chen ,  Steven M. Zuniga

IPC分类号： B24B005/00 ,  B24B029/00 ,  B24B047/02 ,  B24B041/06

CPC分类号： B24B37/30 ,  B24B37/32 ,  B24B49/16

摘要： A compressible film that is detachably securable to a surface of a rigid structure in the carrier head. The compressible film has a plurality of apertures positioned to create a non-uniform pressure distribution on a substrate during polishing so as to improve polishing uniformity. The apertures may be spaced and positioned to provide a pressure distribution on the substrate that is locally uniform but globally non-uniform.

摘要翻译： 一种可拆卸地固定在承载头中刚性结构表面的可压缩膜。 可压缩膜具有多个孔，其定位成在抛光期间在基板上产生不均匀的压力分布，以便提高抛光均匀性。 孔可以间隔开并定位成在衬底上提供局部均匀但全局不均匀的压力分布。

公开(公告)号：US20020072313A1

公开(公告)日：2002-06-13

申请号：US10059519

申请日：2002-01-28

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Steven M. Zuniga ,  Hung Chih Chen ,  Manoocher Birang ,  Kapila Wijekoon ,  Sen-Hou Ko

IPC分类号： B24B005/00

CPC分类号： B24B37/30 ,  B24B37/32 ,  B24B49/16

摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the same purpose.

公开(公告)号：US20010041526A1

公开(公告)日：2001-11-15

申请号：US09908868

申请日：2001-07-18

申请人： Applied Materials, Inc. a Delaware Corporation

发明人： Ilya Perlov ,  Eugene Gantvarg ,  Sen-Hou Ko

IPC分类号： B24B005/00 ,  B24B029/00

CPC分类号： B24B37/30 ,  B24B37/32 ,  B24B47/10 ,  B24B47/12 ,  B24B49/16

摘要： A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the cuter portion may be significantly less than the width of the middle portion. The carrier head may also includea flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.

摘要翻译： 具有连接到基座以限定第一室，第二室和第三室的柔性构件的承载头。 柔性构件的下表面提供了具有与第一腔室相关联的内部部分的基底接收表面，围绕内部部分并与第二腔室相关联的基本上环形的中间部分，以及围绕中间部分和相关联的基本上环形的外部部分 与第三个房间。 切割部分的宽度可以明显小于中间部分的宽度。 承载头还可以包括连接到驱动轴的凸缘和将凸缘枢转地连接到基座的万向架。

公开(公告)号：US20040198187A1

公开(公告)日：2004-10-07

申请号：US10686354

申请日：2003-10-14

申请人： Applied Materials, Inc., a Delaware corporation

发明人： Robert D. Tolles

IPC分类号： B24B001/00

CPC分类号： B24B37/22 ,  B24B37/24 ,  B29C35/08 ,  B29C65/14 ,  B29C65/1406 ,  B29C65/1483 ,  B29C65/1496 ,  B29C65/48 ,  B29C65/4825 ,  B29C65/4845 ,  B29C66/1122 ,  B29C66/21 ,  B29C66/41 ,  B29C66/43 ,  B29C66/452 ,  B29C66/71 ,  B29C66/80 ,  B29C2035/0827 ,  B29L2031/736 ,  B29K2075/00

摘要： A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the radiation passes through the transparent regions and impinges onto the adhesive layer on the polishing pad. The area of the adhesive layer corresponding to the transparent regions of the mask is cured to be less adhesive. The area of the adhesive layer corresponding to the opaque regions remain adhesive.

摘要翻译： 用于选择性地改变抛光垫粘合剂层的方法包括提供具有透明区域和不透明区域的掩模，并且将辐射引导到掩模，使得辐射通过透明区域并撞击抛光垫上的粘合剂层。 对应于掩模的透明区域的粘合剂层的面积被固化成较少的粘合剂。 对应于不透明区域的粘合剂层的面积保持粘合。

公开(公告)号：US20040060514A1

公开(公告)日：2004-04-01

申请号：US10674569

申请日：2003-09-29

申请人： APPLIED MATERIALS, INC. A Delaware corporation

发明人： Karthik Janakiraman ,  Nitin Ingle ,  Zheng Yuan ,  Steven Gianoulakis

IPC分类号： C23C016/00

CPC分类号： C23C16/455 ,  C23C16/45565

摘要： A gas distribution showerhead is designed to allow deposition of uniformly thick films over a wide range of showerhead-to-wafer spacings. In accordance with one embodiment of the present invention, the number, width, and/or depth of orifices inlet to the faceplate are reduced in order to increase flow resistance and thereby elevate pressure upstream of the faceplate. This elevated upstream gas flow pressure in turn reduces variation in the velocity of gas flowed through center portions of the showerhead relative to edge portions, thereby ensuring uniformity in thickness of film deposited on the edge or center portions of the wafer.

摘要翻译： 气体分配喷头被设计成允许在宽范围的喷头到晶片间隔上沉积均匀的厚膜。 根据本发明的一个实施例，为了增加流动阻力，从而提高面板上游的压力，减小了面板入口孔数，宽度和/或深度。 这种升高的上游气体流量压力又降低了通过喷头的中心部分相对于边缘部分流动的气体的速度变化，从而确保沉积在晶片的边缘或中心部分上的膜的厚度均匀。