Abstract:
A method for optimizing masks used for forming conductive features and a method for creating the mask features on an IC device are disclosed. An exemplary embodiment includes receiving a design database including a plurality of conductive features. First and second features suitable for joining are identified from the plurality of conductive features. A joined feature corresponding to the first and the second features is characterized. A cut shape configured to separate the first and second features from the joined feature is also characterized. The joined feature is categorized into a first conductive mask, the cut shape is categorized into a cut mask, and a third feature is categorized into a second conductive mask. The categorized shapes and features of the first conductive mask, the second conductive mask, and the cut mask are provided for manufacturing a mask set corresponding to the categorized shapes and features.
Abstract:
A method that includes forming a masking element on a semiconductor substrate and overlying a defined space. A first feature and a second feature are each formed on the semiconductor substrate. The space interposes the first and second features and extends from a first end of the first feature to a first end of the second feature. A third feature is then formed adjacent and substantially parallel the first and second features. The third feature extends at least from the first end of the first feature to the first end of the second feature.
Abstract:
The present disclosure provides a method including providing a semiconductor substrate and forming a first layer and a second layer on the semiconductor substrate. The first layer is patterned to provide a first element, a second element, and a space interposing the first and second elements. Spacer elements are then formed on the sidewalls on the first and second elements of the first layer. Subsequently, the second layer is etched using the spacer elements and the first and second elements as a masking element.
Abstract:
A process of making Form A of atazanavir sulfate comprises: a) mixing atazanavir free base with a solvent selected from the group consisting of methanol (MeOH), ethanol (EtOH), isopropanol (IPA), N-methylprrolidone (NMP) and combinations thereof; b) reacting sulfuric acid with the atazanavir free base in the mixture formed in step a) to form a reaction solution comprising atazanavir sulfate; c) mixing an antisolvent with the reaction solution; d) seeding the mixture formed in step c) with an effective amount of Form A of atazanavir sulfate to form a seeded mixture comprising Form A of atazanavir sulfate; and e) isolating Form A of atazanavir sulfate in solid form from the seeded mixture; wherein the antisolvent is selected from the group consisting of methyl tert-butyl ether (MTBE), ethyl acetate (EtOAc), acetonitrile (MeCN), isopropyl acetate (IPAc), cyclohexane, and combinations thereof. In one alternative, step c) may be performed before step b). In another alternative, step d) may be carried out concurrent with or prior to step c).
Abstract:
A process of making Form A of atazanavir sulfate comprises: a) mixing atazanavir free base with a solvent selected from the group consisting of methanol (MeOH), ethanol (EtOH), isopropanol (IPA), N-methylprrolidone (NMP) and combinations thereof; b) reacting sulfuric acid with the atazanavir free base in the mixture formed in step a) to form a reaction solution comprising atazanavir sulfate; c) mixing an antisolvent with the reaction solution; d) seeding the mixture formed in step c) with an effective amount of Form A of atazanavir sulfate to form a seeded mixture comprising Form A of atazanavir sulfate; and e) isolating Form A of atazanavir sulfate in solid form from the seeded mixture; wherein the antisolvent is selected from the group consisting of methyl tert-butyl ether (MTBE), ethyl acetate (EtOAc), acetonitrile (MeCN), isopropyl acetate (IPAc), cyclohexane, and combinations thereof. In one alternative, step c) may be performed before step b). In another alternative, step d) may be carried out concurrent with or prior to step c).
Abstract:
A portable electronic device includes a casing, a key, a loudspeaker, a soft insulating material, and an actuating unit. The key is disposed at the casing. The loudspeaker is embedded into the casing flatly. The soft insulating material covers the casing and the loudspeaker. The actuating unit is coupled to the key and the loudspeaker, and it actuates the loudspeaker to protrude from the casing in response to an actuation of the key.
Abstract:
An electronic device has a function of inputting Roman letters. The electronic device includes a display unit, an input unit, and a control unit. The input unit has a plurality of operation directions associated a plurality of direction input signals. The input unit is operated towards one of the operation directions, the input unit generates one of the direction input signals corresponding to a shape character. Each group of the shape characters corresponds to at least one Roman letter. The control unit is coupled to the display unit and the input unit, respectively, and the control unit is used for receiving a group of the direction input signals generated by the input unit to obtain a group of the shape characters corresponding to the group of the direction input signals and to provide at least one Roman letter corresponding to the group of the shape characters for the display unit.
Abstract:
A method of selectively hydrogenating a conjugated diene by using a supported ionic liquid nano-palladium catalyst. The supported ionic liquid nano-palladium catalyst, hydrogen and a reactant having the conjugated diene react at a temperature ranging from 40 to 120° C. and a pressure ranging from 100 to 400 psig. A ratio of the catalyst to the reactant ranges from 1/20 to 1/250 (g/ml).