公开(公告)号：US08588865B2

公开(公告)日：2013-11-19

申请号：US12872605

申请日：2010-08-31

申请人： Beak-kwon Son ,  Dong-won Lee ,  Jae-hyun Kim ,  Sang-ki Kang

发明人： Beak-kwon Son ,  Dong-won Lee ,  Jae-hyun Kim ,  Sang-ki Kang

IPC分类号： H04B1/38 ,  H04K3/00

CPC分类号： H03G3/3047 ,  H04B1/1036 ,  H04B1/12

摘要： A method of removing a signal from among received signals, the method including: filtering the received signals; detecting a time band of the filtered received signals where an energy value of the filtered received signals exceeds a reference energy value; and applying a gain value to one or more received signals, from among the received signals, in the detected time band.

公开(公告)号：US08538748B2

公开(公告)日：2013-09-17

申请号：US12957941

申请日：2010-12-01

申请人： Nam-il Lee ,  Yang-su Kim ,  Beak-kwon Son

发明人： Nam-il Lee ,  Yang-su Kim ,  Beak-kwon Son

IPC分类号： G10L21/02

CPC分类号： G10L21/02 ,  H03G3/32 ,  H03G9/005 ,  H03G9/025

摘要： A method and apparatus which enhance a voice signal received by a reception terminal from a transmission terminal, the method including: detecting a magnitude of a noise signal peripheral to the reception terminal; checking a volume level which is set in the reception terminal while the voice signal is received from the transmission terminal; and adaptively enhancing at least one of a volume and an articulation of the voice signal on the basis of a magnitude of the noise signal and the checked volume level.

摘要翻译： 一种增强接收终端从发送终端接收的语音信号的方法和装置，所述方法包括：检测接收终端外围的噪声信号的大小; 在从发送终端接收到语音信号的情况下，对接收终端中设定的音量进行检查; 并且基于噪声信号的大小和所检查的音量水平自适应地增强语音信号的音量和发音中的至少一个。

公开(公告)号：US20130208757A1

公开(公告)日：2013-08-15

申请号：US13468152

申请日：2012-05-10

申请人： Hyun Je CHO ,  Deuk Man KIM ,  Seok Mo CHOI ,  Cheon Woo KIM ,  Jung Kwon SON ,  Tae Won HWANG

发明人： Hyun Je CHO ,  Deuk Man KIM ,  Seok Mo CHOI ,  Cheon Woo KIM ,  Jung Kwon SON ,  Tae Won HWANG

IPC分类号： H05B6/06 ,  H05B6/22

CPC分类号： F27B14/063 ,  H05B3/24

摘要： A low temperature melting furnace using an external cooling passage includes a wall including a plurality of metal sectors, each metal sector including a cooling passage formed along a longitudinal direction thereof, and an extension tube provided outwardly from the wall and connected to the cooling passage.

摘要翻译： 使用外部冷却通道的低温熔炉包括包括多个金属扇区的壁，每个金属扇区包括沿着其纵向方向形成的冷却通道，以及从壁向外设置并连接到冷却通道的延伸管。

公开(公告)号：US20130208756A1

公开(公告)日：2013-08-15

申请号：US13468113

申请日：2012-05-10

申请人： Hyun Je CHO ,  Deuk Man KIM ,  Seok Mo CHOI ,  Cheon Woo KIM ,  Jung Kwon SON ,  Tae Won HWANG

发明人： Hyun Je CHO ,  Deuk Man KIM ,  Seok Mo CHOI ,  Cheon Woo KIM ,  Jung Kwon SON ,  Tae Won HWANG

IPC分类号： H05B6/06

CPC分类号： F27B14/063 ,  F23M5/08

摘要： A low temperature melting furnace having improved cooling flow includes a wall including a plurality of metal sectors, wherein a metal sector includes a first metal sector and a second metal sector, which are formed in one unit, and a cooling passage through which a cooling water flows is formed in each of the first metal sector and the second metal sector, the first metal sector and the second metal sector being connected to each other through a connection unit.

摘要翻译： 具有改善的冷却流的低温熔炉包括包括多个金属扇区的壁，其中金属扇区包括形成在一个单元中的第一金属扇区和第二金属扇区，以及冷却通道 流动形成在第一金属扇区和第二金属扇区中的每一个中，第一金属扇区和第二金属扇区通过连接单元彼此连接。

公开(公告)号：US07029747B2

公开(公告)日：2006-04-18

申请号：US10648403

申请日：2003-08-27

申请人： Hyun Huh ,  Sang-Mok Lee ,  Kee-Cheon Song ,  Seung-geun Kim ,  Do-Kwon Son

发明人： Hyun Huh ,  Sang-Mok Lee ,  Kee-Cheon Song ,  Seung-geun Kim ,  Do-Kwon Son

IPC分类号： B32B3/26 ,  B32B7/02 ,  B24B1/00 ,  C09K3/14 ,  B24D11/00

CPC分类号： B24B37/205 ,  B24D3/32 ,  Y10T428/24372 ,  Y10T428/24405 ,  Y10T428/24612 ,  Y10T428/24983 ,  Y10T428/249978 ,  Y10T428/24998 ,  Y10T428/249988 ,  Y10T428/2984

摘要： An integral polishing pad includes an elastic support layer and a polishing layer, which is formed on the elastic support layer and has a higher hardness than the elastic support layer. The elastic support layer and the polishing layer are made from materials chemically compatible with each other so that a structural border between the elastic support layer and the polishing layer does not exist. In addition, the integral polishing pad also includes a transparent region, which is transparent to a light source used to detect the surface state of an object being polished and integrated with the other elements of the integral polishing pad. The integral polishing pad has high planarization efficiency and uniform properties, and thus can be reliably used for polishing. In addition, the integral polishing pad prevents a congestion of a polishing slurry and facilitates delivery of the polishing slurry. The integral polishing pad does not need an adhesive for connecting elements or a process for bonding the elements, thereby simplifying manufacturing processes.

摘要翻译： 整体抛光垫包括弹性支撑层和抛光层，其形成在弹性支撑层上并且具有比弹性支撑层更高的硬度。 弹性支撑层和抛光层由彼此化学相容的材料制成，使得弹性支撑层和抛光层之间的结构边界不存在。 此外，整体抛光垫还包括对于用于检测待抛光物体的表面状态的光源透明的透明区域，并与整体抛光垫的其它元件集成。 整体抛光垫具有高的平坦化效率和均匀的性能，因此可以可靠地用于抛光。 此外，整体抛光垫防止抛光浆料的挤塞并且有利于抛光浆料的输送。 整体抛光垫不需要用于连接元件的粘合剂或用于粘合元件的工艺，从而简化了制造工艺。

公开(公告)号：US20050260928A1

公开(公告)日：2005-11-24

申请号：US10648403

申请日：2003-08-27

申请人： Hyun Huh ,  Sang-Mok Lee ,  Kee-Cheon Song ,  Seung-Geun Kim ,  Do-Kwon Son

发明人： Hyun Huh ,  Sang-Mok Lee ,  Kee-Cheon Song ,  Seung-Geun Kim ,  Do-Kwon Son

IPC分类号： B24B1/00 ,  B24B37/07 ,  B24B37/20 ,  B24B37/22 ,  B24B37/24 ,  B24D3/00 ,  B24D3/32 ,  B24D11/00 ,  H01L21/304

CPC分类号： B24B37/205 ,  B24D3/32 ,  Y10T428/24372 ,  Y10T428/24405 ,  Y10T428/24612 ,  Y10T428/24983 ,  Y10T428/249978 ,  Y10T428/24998 ,  Y10T428/249988 ,  Y10T428/2984

摘要： An integral polishing pad includes an elastic support layer and a polishing layer, which is formed on the elastic support layer and has a higher hardness than the elastic support layer. The elastic support layer and the polishing layer are made from materials chemically compatible with each other so that a structural border between the elastic support layer and the polishing layer does not exist. In addition, the integral polishing pad also includes a transparent region, which is transparent to a light source used to detect the surface state of an object being polished and integrated with the other elements of the integral polishing pad. The integral polishing pad has high planarization efficiency and uniform properties, and thus can be reliably used for polishing. In addition, the integral polishing pad prevents a congestion of a polishing slurry and facilitates delivery of the polishing slurry. The integral polishing pad does not need an adhesive for connecting elements or a process for bonding the elements, thereby simplifying manufacturing processes.

摘要翻译： 整体抛光垫包括弹性支撑层和抛光层，其形成在弹性支撑层上并且具有比弹性支撑层更高的硬度。 弹性支撑层和抛光层由彼此化学相容的材料制成，使得弹性支撑层和抛光层之间的结构边界不存在。 此外，整体抛光垫还包括对于用于检测待抛光物体的表面状态的光源透明的透明区域，并与整体抛光垫的其它元件集成。 整体抛光垫具有高的平坦化效率和均匀的性能，因此可以可靠地用于抛光。 此外，整体抛光垫防止抛光浆料的挤塞并且有利于抛光浆料的输送。 整体抛光垫不需要用于连接元件的粘合剂或用于粘合元件的工艺，从而简化了制造工艺。