公开(公告)号：US11972194B2

公开(公告)日：2024-04-30

申请号：US18089848

申请日：2022-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Roshni Biswas ,  Rafael C. Howell ,  Cuiping Zhang ,  Ningning Jia ,  Jingjing Liu ,  Quan Zhang

IPC: G06F30/30 ,  G03F7/00 ,  G03F7/20 ,  G06F30/392 ,  G06F30/398 ,  G06F119/18

CPC classification number: G06F30/398 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70625 ,  G06F30/392 ,  G06F2119/18

Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

公开(公告)号：US11586114B2

公开(公告)日：2023-02-21

申请号：US16973377

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Duan-Fu Stephen Hsu ,  Christoph Rene Konrad Cebulla Hennerkes ,  Rafael C. Howell ,  Zhan Shi ,  Xiaoyang Jason Li ,  Frank Staals

IPC: G03F7/20

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

公开(公告)号：US20190155165A1

公开(公告)日：2019-05-23

申请号：US16257423

申请日：2019-01-25

Applicant: ASML Netherlands B.V.

Inventor： Xiaofeng LIU ,  Rafael C. Howell

IPC: G03F7/20

CPC classification number: G03F7/70125 ,  G03F7/2008 ,  G03F7/70116 ,  G03F7/705 ,  G03F7/70508

Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.

公开(公告)号：US10191384B2

公开(公告)日：2019-01-29

申请号：US14766703

申请日：2014-02-04

Applicant: ASML Netherlands B.V.

Inventor： Xiaofeng Liu ,  Rafael C. Howell

IPC: G03F7/20

Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.