公开(公告)号：US11908656B2

公开(公告)日：2024-02-20

申请号：US17497761

申请日：2021-10-08

Applicant: ASML Netherlands B.V.

Inventor： Han Willem Hendrik Severt ,  Jan-Gerard Cornelis Van Der Toorn ,  Ronald Van Der Wilk ,  Allard Eelco Kooiker

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0206 ,  H01J2237/04756 ,  H01J2237/24592

Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.

公开(公告)号：US11694870B2

公开(公告)日：2023-07-04

申请号：US17351043

申请日：2021-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis Van Der Toorn ,  Paulus Martinus Hubertus Vissers

IPC: H01J37/20 ,  H02G11/00

CPC classification number: H01J37/20 ,  H02G11/00 ,  H01J2237/0262 ,  H01J2237/2007

Abstract: The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.

公开(公告)号：US10451973B2

公开(公告)日：2019-10-22

申请号：US14871795

申请日：2015-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC: G02B27/52 ,  G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  H01L21/67

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

公开(公告)号：US20150168850A1

公开(公告)日：2015-06-18

申请号：US14624167

申请日：2015-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。