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公开(公告)号：US20140327893A1
公开(公告)日：2014-11-06
申请号：US14331003
申请日：2014-07-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。
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公开(公告)号：US11789369B2
公开(公告)日：2023-10-17
申请号：US17560841
申请日：2021-12-23
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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公开(公告)号：US11537038B2
公开(公告)日：2022-12-27
申请号：US17119331
申请日：2020-12-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
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公开(公告)号：US20220113641A1
公开(公告)日：2022-04-14
申请号：US17560841
申请日：2021-12-23
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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25.发明授权公开(公告)号：US10802410B2
公开(公告)日：2020-10-13
申请号：US15299240
申请日：2016-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Marcel Beckers , Stefan Philip Christiaan Belfroid , Ferdy Migchelbrink , Sergei Shulepov
IPC: G03F7/20
Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.
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Patent Agency Ranking
公开(公告)号：US10114299B2
公开(公告)日：2018-10-30
申请号：US15311544
申请日：2015-05-07
Applicant: ASML Netherlands B.V.
Inventor： Günes Nakiboglu , Mark Constant Johannes Baggen , Gerard Johannes Boogaard , Nicolaas Rudolf Kemper , Sander Kerssemakers , Robertus Mathijs Gerardus Rijs , Frank Johannes Jacobus Van Boxtel , Erwin Antonius Henricus Franciscus Van Den Boogaert , Marc Wilhelmus Maria Van Der Wijst , Martinus Van Duijnhoven , Jessica Henrica Anna Verdonschot , Hendrikus Herman Marie Cox
IPC: G10K11/168 , G03F7/20 , G10K11/16
Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.
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公开(公告)号：US20170357161A1
公开(公告)日：2017-12-14
申请号：US15688262
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria ROPS , Nicolaas Rudolf Kemper , Michel Riepen
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
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公开(公告)号：US09766556B2
公开(公告)日：2017-09-19
申请号：US15266453
申请日：2016-09-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Sergei Shulepov
CPC classification number: G03F7/70866 , G03F7/70341 , H01L21/67034
Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
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公开(公告)号：US20220082948A1
公开(公告)日：2022-03-17
申请号：US17531953
申请日：2021-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michael Christiaan Van Der Wekken
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
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公开(公告)号：US10126664B2
公开(公告)日：2018-11-13
申请号：US15483410
申请日：2017-04-10
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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