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公开(公告)号：US10725390B2
公开(公告)日：2020-07-28
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US11086239B2
公开(公告)日：2021-08-10
申请号：US16981813
申请日：2019-03-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Miao Yu , Petrus Martinus Gerardus Johannes Arts , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Maarten Holtrust , Han Henricus Aldegonda Lempens , Ferdy Migchelbrink , Theodorus Wilhelmus Polet , Gheorghe Tanasa
IPC: G03F7/20
Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.
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公开(公告)号：US09429853B2
公开(公告)日：2016-08-30
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.
Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。
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公开(公告)号：US20190146352A1
公开(公告)日：2019-05-16
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US10209629B2
公开(公告)日：2019-02-19
申请号：US15824686
申请日：2017-11-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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Patent Agency Ranking
公开(公告)号：US20160370713A1
公开(公告)日：2016-12-22
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US20150309420A1
公开(公告)日：2015-10-29
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Abstract translation: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US09857695B2
公开(公告)日：2018-01-02
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US10802410B2
公开(公告)日：2020-10-13
申请号：US15299240
申请日：2016-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Marcel Beckers , Stefan Philip Christiaan Belfroid , Ferdy Migchelbrink , Sergei Shulepov
IPC: G03F7/20
Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.
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公开(公告)号：US10216100B2
公开(公告)日：2019-02-26
申请号：US15738701
申请日：2016-06-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G01N21/00 , G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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