公开(公告)号：US11749556B2

公开(公告)日：2023-09-05

申请号：US17481978

申请日：2021-09-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/6875 ,  G03F7/707 ,  G03F7/70341

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US10551746B2

公开(公告)日：2020-02-04

申请号：US15774165

申请日：2016-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Benjamin Cunnegonda Henricus Smeets ,  Mark Constant Johannes Baggen

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.

公开(公告)号：US10114299B2

公开(公告)日：2018-10-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Mark Constant Johannes Baggen ,  Gerard Johannes Boogaard ,  Nicolaas Rudolf Kemper ,  Sander Kerssemakers ,  Robertus Mathijs Gerardus Rijs ,  Frank Johannes Jacobus Van Boxtel ,  Erwin Antonius Henricus Franciscus Van Den Boogaert ,  Marc Wilhelmus Maria Van Der Wijst ,  Martinus Van Duijnhoven ,  Jessica Henrica Anna Verdonschot ,  Hendrikus Herman Marie Cox

IPC: G10K11/168 ,  G03F7/20 ,  G10K11/16

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

公开(公告)号：US12249535B2

公开(公告)日：2025-03-11

申请号：US18354227

申请日：2023-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: H01L21/687 ,  G03F7/00

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US11898601B2

公开(公告)日：2024-02-13

申请号：US17407778

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander Tromp ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt ,  Jan Pieter Van De Poel ,  Mark Constant Johannes Baggen

IPC: F16C32/06 ,  H01L21/683 ,  F16C29/02 ,  G03F7/00 ,  G03F7/20

CPC classification number: F16C32/0611 ,  F16C29/025 ,  F16C32/0607 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708 ,  H01L21/6831 ,  H01L21/6833

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

公开(公告)号：US11139196B2

公开(公告)日：2021-10-05

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US11098759B2

公开(公告)日：2021-08-24

申请号：US16735131

申请日：2020-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander Tromp ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt ,  Jan Pieter Van De Poel ,  Mark Constant Johannes Baggen

IPC: H01L21/683 ,  G03F7/20 ,  F16C32/06 ,  F16C29/02

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

公开(公告)号：US10527092B2

公开(公告)日：2020-01-07

申请号：US15513086

申请日：2015-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander Tromp ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt ,  Jan Pieter Van De Poel ,  Mark Constant Johannes Baggen

IPC: F16C32/06 ,  G03F7/20 ,  F16C29/02 ,  H01L21/683

Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.