公开(公告)号：US10410914B2

公开(公告)日：2019-09-10

申请号：US15313515

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Sander Frederik Wuister ,  Andre Bernardus Jeunink ,  Emiel Peeters

IPC: H01L21/768 ,  G03F7/00 ,  C30B1/04 ,  C30B29/58 ,  G03F7/20 ,  G03F7/30 ,  B81C1/00 ,  C09K13/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/308

Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.

公开(公告)号：US10018926B2

公开(公告)日：2018-07-10

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena Cortie ,  Christianus Wilhelmus Johannes Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Siegfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03B27/32 ,  G03B27/52 ,  H02K41/02 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

公开(公告)号：US09658528B2

公开(公告)日：2017-05-23

申请号：US14610516

申请日：2015-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

IPC: G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

公开(公告)号：US09606458B2

公开(公告)日：2017-03-28

申请号：US14430507

申请日：2013-09-12

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Dekkers ,  Andre Bernardus Jeunink ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Michael Jozef Mathijs Renkens ,  Carolus Johannes Catharina Schoormans ,  Peter Hoekstra

IPC: G03B27/68 ,  G03F7/20 ,  G01D5/244 ,  G01D18/00 ,  G01D5/347

CPC classification number: G03F7/70775 ,  G01D5/2449 ,  G01D5/34707 ,  G01D18/00 ,  G01D18/008 ,  G03F7/70516

Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

公开(公告)号：US20150145172A1

公开(公告)日：2015-05-28

申请号：US14610516

申请日：2015-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

Abstract translation: 压印光刻模板设置有对准标记，其中对准标记由具有不同于压印光刻模板的折射率的折射率的介电材料形成，所述电介质材料具有使得其提供相位的厚度 通过电介质材料的取向辐射与未通过电介质材料的对准辐射之间的差异。