公开(公告)号：US20080236618A1

公开(公告)日：2008-10-02

申请号：US11730296

申请日：2007-03-30

申请人： Duane Outka ,  Jason Augustino ,  Armen Avoyan ,  Stephen Whitten ,  Hong Shih ,  Yan Fang

发明人： Duane Outka ,  Jason Augustino ,  Armen Avoyan ,  Stephen Whitten ,  Hong Shih ,  Yan Fang

IPC分类号： B08B3/10 ,  B08B3/08

CPC分类号： B08B3/04 ,  H01J37/32862

摘要： Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.

摘要翻译： 清洁等离子体处理室部件的方法包括将部件的表面与清洁溶液接触，同时避免清洁溶液损坏其它表面或部件区域。 要清洁的示例性等离子体处理室部件是具有硅构件的弹性体接合电极组件，其具有等离子体暴露的硅表面，背衬构件和在硅表面和背衬构件之间的弹性体接合材料。

公开(公告)号：US20110097900A1

公开(公告)日：2011-04-28

申请号：US12607659

申请日：2009-10-28

申请人： Jason Augustino ,  Tim Hart

发明人： Jason Augustino ,  Tim Hart

IPC分类号： H01L21/306 ,  B32B3/02 ,  F17D3/00

CPC分类号： H01J37/32467 ,  Y10T137/8359

摘要： A five-sided quartz window configured to be mounted on a degas chamber as a UV-transmissive window. The quartz window is made of synthetic quartz and has a uniform thickness. The shape of the quartz window is defined by an upper surface, a lower surface and a sidewall therebetween. The sidewall has five straight sections interconnected by five arcuate sections. The quartz window has four arcuate recesses extending into the sidewall.

摘要翻译： 五面石英窗构造成安装在脱气室作为紫外线透射窗。 石英窗由合成石英制成，厚度均匀。 石英窗的形状由上表面，下表面和侧壁之间限定。 侧壁具有由五个弧形部分相互连接的五个直线部分。 石英窗有四个弧形凹槽延伸到侧壁。

公开(公告)号：US07767028B2

公开(公告)日：2010-08-03

申请号：US12073651

申请日：2008-03-07

申请人： Jason Augustino ,  Charles Rising

发明人： Jason Augustino ,  Charles Rising

IPC分类号： B08B7/00 ,  B08B7/04 ,  B08B3/04 ,  B08B9/023 ,  B08B9/027

CPC分类号： C23C14/564 ,  C23C16/4405

摘要： Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

摘要翻译： 用于清洁硅电极组件表面的装置，其控制或消除电极组件接合材料的可能的化学侵蚀，并且消除在酸处理期间与待清洁部件的直接操作接触，喷雾冲洗，吹干，烘烤和装袋。 该装置的方面包括一种套件，其包括用于保持电极组件的电极载体，用于允许接触电极组件的处理台，将电极组件夹持在电极载体中的蜘蛛板，将氮气供应到 在电极的酸洗期间电极组件的背面，向电极面供水的水冲洗板，用于供应氮气以干燥电极组件的吹干板和烘烤架，以在烘烤期间支撑电极组件 将清洁的电极组件放置在袋中。

公开(公告)号：US20090321018A1

公开(公告)日：2009-12-31

申请号：US12164288

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： H01J37/32 ,  H01L21/00

CPC分类号： H01J37/32541 ,  H01J37/32009 ,  H01J37/32605 ,  H01L21/67069

摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。 外周接合电极载体包括载体框架和多个往复电极支撑件。 多组分电极位于载体框架的电极容纳孔中。 电极的背板包括围绕其周边形成的多个安装凹部。 往复式电极支撑件可以往复运动进入和离开安装凹槽。 考虑到更广泛和更窄范围的另外的实施例。

公开(公告)号：US20080092920A1

公开(公告)日：2008-04-24

申请号：US11640975

申请日：2006-12-19

申请人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

发明人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

IPC分类号： B08B3/12

CPC分类号： C23C16/4407 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12

摘要： Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided.

摘要翻译： 提供了清洁电极组件的背板或包括背板和电极板的电极组件的方法。 该方法可用于清洁由各种材料制成的背板和电极板，例如硅电极板和石墨和铝背板。 背板和电极组件可以是新的，使用的或翻新的。 还提供了可用于清洁方法的冲洗夹具。