公开(公告)号：US20080092920A1

公开(公告)日：2008-04-24

申请号：US11640975

申请日：2006-12-19

申请人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

发明人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

IPC分类号： B08B3/12

CPC分类号： C23C16/4407 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12

摘要： Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided.

摘要翻译： 提供了清洁电极组件的背板或包括背板和电极板的电极组件的方法。 该方法可用于清洁由各种材料制成的背板和电极板，例如硅电极板和石墨和铝背板。 背板和电极组件可以是新的，使用的或翻新的。 还提供了可用于清洁方法的冲洗夹具。

公开(公告)号：US20110180117A1

公开(公告)日：2011-07-28

申请号：US13081210

申请日：2011-04-06

申请人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

发明人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

IPC分类号： B08B3/00

CPC分类号： C23C16/4407 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12

摘要： Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided.

摘要翻译： 提供了清洁电极组件的背板或包括背板和电极板的电极组件的方法。 该方法可用于清洁由各种材料制成的背板和电极板，例如硅电极板和石墨和铝背板。 背板和电极组件可以是新的，使用的或翻新的。 还提供了可用于清洁方法的冲洗夹具。

公开(公告)号：US08215321B2

公开(公告)日：2012-07-10

申请号：US13081210

申请日：2011-04-06

申请人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

发明人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

IPC分类号： B08B3/00

CPC分类号： C23C16/4407 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12

摘要： Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided, the flushing fixture comprising a base plate comprising a recessed inner portion including and an upper surface configured to support the backing plate or the electrode assembly, and a cover plate configured to cover the base plate, the cover plate including at least one liquid passage through which a flushing liquid is introduced into an interior of the flushing fixture defined by the base plate and cover plate.

摘要翻译： 提供了清洁电极组件的背板或包括背板和电极板的电极组件的方法。 该方法可用于清洁由各种材料制成的背板和电极板，例如硅电极板和石墨和铝背板。 背板和电极组件可以是新的，使用的或翻新的。 还提供了可用于清洁方法的冲洗夹具，该冲洗夹具包括一个底板，该底板包括一凹入的内部部分和一个上表面，该上表面构造成支撑背板或电极组件;以及盖板， 基板，盖板包括至少一个液体通道，通过该液体通道将冲洗液体引入由基板和盖板限定的冲洗夹具的内部。

公开(公告)号：US07942973B2

公开(公告)日：2011-05-17

申请号：US11640975

申请日：2006-12-19

申请人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

发明人： Hong Shih ,  Yaobo Yin ,  Jason Augustino ,  Catherine Zhou ,  Armen Avoyan

IPC分类号： B08B3/12

CPC分类号： C23C16/4407 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12

摘要： A method for cleaning an electrode assembly comprising a backing plate bonded to an electrode plate for a plasma processing assembly, the method including the steps of contacting the backing plate and electrode plate with a solvent; spraying the backing plate and electrode plate with water; ultrasonically cleaning the electrode assembly; enclosing the electrode assembly in a flushing fixture defined by a base plate having a plurality of liquid passages and a cover plate configured to cover the base plate, the cover plate including at least one liquid passage; and flushing the electrode assembly in the flushing fixture by introducing a flushing liquid under pressure through said at least one liquid passage in the cover plate.

摘要翻译： 一种用于清洁电极组件的方法，其包括结合到等离子体处理组件的电极板的背板，所述方法包括以下步骤：使所述背板和电极板与溶剂接触; 用水喷涂背板和电极板; 超声波清洗电极组件; 将电极组件封闭在由具有多个液体通道的底板限定的冲洗夹具中，以及构造成覆盖基板的盖板，盖板包括至少一个液体通道; 以及通过在压力下引入冲洗液体通过所述盖板中的所述至少一个液体通道来冲洗所述冲洗夹具中的电极组件。

公开(公告)号：US20090321018A1

公开(公告)日：2009-12-31

申请号：US12164288

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： H01J37/32 ,  H01L21/00

CPC分类号： H01J37/32541 ,  H01J37/32009 ,  H01J37/32605 ,  H01L21/67069

摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。 外周接合电极载体包括载体框架和多个往复电极支撑件。 多组分电极位于载体框架的电极容纳孔中。 电极的背板包括围绕其周边形成的多个安装凹部。 往复式电极支撑件可以往复运动进入和离开安装凹槽。 考虑到更广泛和更窄范围的另外的实施例。

公开(公告)号：US08276604B2

公开(公告)日：2012-10-02

申请号：US12164288

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： H05H1/34 ,  H01J37/02 ,  H01J37/32 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01J37/32541 ,  H01J37/32009 ,  H01J37/32605 ,  H01L21/67069

摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。 外周接合电极载体包括载体框架和多个往复电极支撑件。 多组分电极位于载体框架的电极容纳孔中。 电极的背板包括围绕其周边形成的多个安装凹部。 往复式电极支撑件可以往复运动进入和离开安装凹槽。 考虑到更广泛和更窄范围的另外的实施例。

公开(公告)号：US20090322199A1

公开(公告)日：2009-12-31

申请号：US12164285

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： H01J19/42

CPC分类号： H01J37/32568 ,  H01J37/32091 ,  H01J37/32605

摘要： A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 提供的载体组件包括背面安装的电极载体和电极安装硬件。 背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制定位在孔中的电极的横向移动的侧壁结构。 电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。 电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推靠在侧壁突起上，以限制电极在电极容纳孔中的轴向移动。 考虑到更广泛和更窄范围的另外的实施例。

公开(公告)号：US08171877B2

公开(公告)日：2012-05-08

申请号：US12164285

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： B05C13/00 ,  B05C13/02 ,  B05C21/00 ,  C23C16/00 ,  C23C16/50 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32568 ,  H01J37/32091 ,  H01J37/32605

摘要： A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 提供的载体组件包括背面安装的电极载体和电极安装硬件。 背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制定位在孔中的电极的横向移动的侧壁结构。 电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。 电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推靠在侧壁突起上，以限制电极在电极容纳孔中的轴向移动。 考虑到更广泛和更窄范围的另外的实施例。

公开(公告)号：US08221552B2

公开(公告)日：2012-07-17

申请号：US11730296

申请日：2007-03-30

申请人： Duane Outka ,  Jason Augustino ,  Armen Avoyan ,  Stephen Whitten ,  Hong Shih ,  Yan Fang

发明人： Duane Outka ,  Jason Augustino ,  Armen Avoyan ,  Stephen Whitten ,  Hong Shih ,  Yan Fang

IPC分类号： B08B17/02 ,  B08B3/04 ,  B08B5/02 ,  B08B1/04

CPC分类号： B08B3/04 ,  H01J37/32862

摘要： Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.

摘要翻译： 清洁等离子体处理室部件的方法包括将部件的表面与清洁溶液接触，同时避免清洁溶液损坏其它表面或部件区域。 要清洁的示例性等离子体处理室部件是具有硅构件的弹性体接合电极组件，其具有等离子体暴露的硅表面，背衬构件和在硅表面和背衬构件之间的弹性体接合材料。

公开(公告)号：US20120013242A9

公开(公告)日：2012-01-19

申请号：US12164285

申请日：2008-06-30

申请人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

发明人： Jason Augustino ,  Armen Avoyan ,  Yan Fang ,  Duane Outka ,  Hong Shih ,  Stephen Whitten

IPC分类号： H01J19/42

CPC分类号： H01J37/32568 ,  H01J37/32091 ,  H01J37/32605

摘要： A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.

摘要翻译： 提供的载体组件包括背面安装的电极载体和电极安装硬件。 背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制定位在孔中的电极的横向移动的侧壁结构。 电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。 电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推靠在侧壁突起上，以限制电极在电极容纳孔中的轴向移动。 考虑到更广泛和更窄范围的另外的实施例。