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    Pivotable substrate retaining ring
    22.
    发明授权
    Pivotable substrate retaining ring 有权

    公开(公告)号：US11511390B2

    公开(公告)日：2022-11-29

    申请号：US16689655

    申请日：2019-11-20

    Applicant: Applied Materials, Inc.

    Inventor： Steven M. Zuniga ,  Jay Gurusamy ,  Andrew J. Nagengast

    IPC: B24B37/10 ,  B24B37/32 ,  B24B41/06

    Abstract: A carrier head includes a base assembly, a substrate mounting surface connected to the base assembly, and a plurality of segments disposed circumferentially around the substrate mounting surface to provide a retaining ring to surround a substrate mounted on the substrate mounting surface. An inner surface of each of the plurality of segments is configured to engage the substrate, and each segment of the plurality of segments of the retaining ring is pivotally connected to the base assembly such that a lower portion of each segment of the retaining ring is swingable toward and away from the substrate.

    MACHINE LEARNING FOR CLASSIFYING RETAINING RINGS
    23.
    发明申请
    MACHINE LEARNING FOR CLASSIFYING RETAINING RINGS 有权

    公开(公告)号：US20220281052A1

    公开(公告)日：2022-09-08

    申请号：US17678932

    申请日：2022-02-23

    Applicant: Applied Materials, Inc.

    Inventor： Eric Lau ,  Andrew J. Nagengast ,  Charles C. Garretson ,  Huanbo Zhang ,  Zhize Zhu

    IPC: B24B37/005

    Abstract: A method for optimizing polishing includes, for each respective retaining ring of a plurality of retaining rings mounted on a particular carrier head, performing measurements for a bottom surface of the respective retaining ring mounted on the particular carrier head using a coordinate measurement machine and collecting a respective removal profile of a substrate polished using the respective retaining ring. A machine learning model is trained based on the measurements of the bottom surface of the retaining ring and the respective removal profiles.

    POLISHING CARRIER HEAD WITH PIEZOELECTRIC PRESSURE CONTROL
    24.
    发明申请
    POLISHING CARRIER HEAD WITH PIEZOELECTRIC PRESSURE CONTROL 有权

    公开(公告)号：US20210402547A1

    公开(公告)日：2021-12-30

    申请号：US17355038

    申请日：2021-06-22

    Applicant: Applied Materials, Inc.

    Inventor： Brian J. Brown ,  Andrew J. Nagengast ,  Justin Ho Kuen Wong

    IPC: B24B37/005 ,  B24B37/32

    Abstract: A carrier head for holding a substrate in a polishing system includes a housing, a first flexible membrane secured to the housing to form one or more pressurizable chambers to apply pressure through a central membrane portion of the first flexible membrane to a central portion of a substrate, and a plurality of independently operable piezoelectric actuators supported by the housing, the plurality of piezoelectric actuators positioned radially outward of the central membrane portion and at different angular positions so as to independently adjust pressure on a plurality of angular zones in an annular outer region of the substrate surrounding the central portion of the substrate.

    DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING
    25.
    发明申请
    DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING 有权

    公开(公告)号：US20210053183A1

    公开(公告)日：2021-02-25

    申请号：US16711369

    申请日：2019-12-11

    Applicant: Applied Materials, Inc.

    Inventor： Steven M. Zuniga ,  Jay Gurusamy ,  Andrew J. Nagengast

    IPC: B24B37/32 ,  B24B37/005

    Abstract: A carrier head for chemical mechanical polishing includes a base assembly and a membrane assembly connected to the base assembly. The membrane assembly includes a membrane support, an inner membrane secured to the membrane support, wherein the inner membrane forms a plurality of individually pressurizable inner chambers between an upper surface of the membrane and the membrane support, and an outer membrane secured to the membrane support and extending below the inner membrane, the outer membrane having an inner surface and an outer surface, wherein the outer membrane defines a lower pressurizable chamber between the inner surface of the outer membrane and a lower surface of the inner membrane, wherein the inner surface is positioned for contact by a lower surface of the inner membrane upon pressurization of one or more of the plurality of chambers, and wherein the outer surface is configured to contact a substrate.

    Retaining Ring Having Inner Surfaces with Facets
    27.
    发明申请
    Retaining Ring Having Inner Surfaces with Facets 有权
    带有内表面的保持环

    公开(公告)号：US20150303070A1

    公开(公告)日：2015-10-22

    申请号：US14259089

    申请日：2014-04-22

    Applicant: Applied Materials, Inc.

    Inventor： Jeonghoon Oh ,  Steven M. Zuniga ,  Andrew J. Nagengast ,  Samuel Chu-Chiang Hsu ,  Gautam Shashank Dandavate

    IPC: H01L21/321 ,  B24B41/06 ,  B24B37/04

    CPC classification number: H01L21/3212 ,  B24B37/04 ,  B24B37/32 ,  B24B41/06

    Abstract: A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.

    Abstract translation: 保持环包括大致环形体。 主体包括顶表面，底表面，外表面和外表面，外表面在外顶部周边处连接到顶表面，底表面连接到外底边周边，内表面在内顶部周边连接到顶表面， 底部表面处于内底部周边。 内表面包括七个或更多个平面。 相邻的平面小平面连接在角落处。 内底部周边包括连接在拐角处的平面的平直边缘。

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