Abstract:
Provided is a 4-oxoquinoline compounds of the formula (I) (I) wherein A is selected from diradicals of the formulae (A.1), (A.2), (A.3), (A.4), (A.5) and (A.6), (A.1) (A.2) (A.3) (A.4) (A.5) (A.6) wherein R1, R2a, R2b, R3, R3a, if present R4a, R4b, R 5a, R5b, R6a, R6b, R6c, R6d, Rn1, Rn2, Rn3, Rn4, Rm5, Rm6, Rm7, Rm8, R7, R8a, R9 and R9a are as defined in the claims and in the description. Also provided is a method for their preparation and their use.
Abstract:
Provided are graphene nanoribbons with controlled zig-zag edge and cove edge configuration and methods for preparing such graphene nanoribbons. The nanoribbons are selected from the following formulae.
Abstract:
The present invention relates to a graphene nanoribbon, comprising a repeating unit which comprises at least one modification, wherein the modification is selected from a heteroatomic substitution, a vacancy, a sp3 hybridization, a Stone-Wales defect, an inverse Stone-Wales defect, a hexagonal sp2 hybridized carbon network ring size modification, and any combination thereof.
Abstract:
The present invention relates to a process for edge-halogenation of a graphene material; wherein the graphene material, which is selected from graphene, a graphene nanoribbon, a graphene molecule, or a mixture thereof, is reacted with a halogen-donor compound in the presence of a Lewis acid, so as to obtain an edge-halogenated graphene material.
Abstract:
The present invention relates to a graphene nanoribbon, comprising a repeating unit which comprises at least one modification, wherein the modification is selected from a heteroatomic substitution, a vacancy, a sp3 hybridization, a Stone-Wales defect, an inverse Stone-Wales defect, a hexagonal sp2 hybridized carbon network ring size modification, and any combination thereof.
Abstract:
Provided are graphene nanoribbon precursors comprising repeated units of the general formula (I) in which R1, R2 are each H, halogen, —OH, —NH2, —CN, —NO2 or a hydrocarbyl radical which has 1 to 40 carbon atoms and may be linear or branched, saturated or unsaturated and mono- or poly-substituted by halogen (F, Cl, Br, I), —OH, —NH2, —CN, and/or —NO2, where one or more CH2 groups may also be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR—, in which R is an optionally substituted C1C40-hydrocarbyl radical, or an optionally substituted aryl, alkylaryl or alkoxyaryl radical.