公开(公告)号：US09079384B2

公开(公告)日：2015-07-14

申请号：US13371359

申请日：2012-02-10

Applicant: Chun-Hao Tung ,  EnkhAmgalan Dorjgotov ,  Masato Kuwabara ,  Sunggu Kang ,  Cheng Chen ,  John Z. Zhong

Inventor： Chun-Hao Tung ,  EnkhAmgalan Dorjgotov ,  Masato Kuwabara ,  Sunggu Kang ,  Cheng Chen ,  John Z. Zhong

IPC: G06F3/041 ,  B32B37/14 ,  B32B37/12

CPC classification number: G06F3/041 ,  B32B37/12 ,  B32B2457/208 ,  G02B1/11 ,  G02B1/111 ,  G06F2203/04103 ,  Y10T156/10 ,  Y10T428/24942

Abstract: Touch sensor panels typically include a plurality of layers that can be stacked on top of each other. When the touch sensor panel is used in a bright environment, incident light can hit the interfaces between those layers of the stackup having mismatched refractive indices and can reflect off those interfaces. The light reflected from those interfaces can give rise to the appearance of fringes on the touch sensor panel, which can be visually distracting. In order to reduce the appearance of these fringes, embodiments of the disclosure are directed to the addition of an index matching passivation layer between a conductive layer of traces and an adhesive layer in the touch sensor panel stackup.

Abstract translation: 触摸传感器面板通常包括可堆叠在彼此之上的多个层。 当触摸传感器面板在明亮的环境中使用时，入射光可以击中具有不匹配折射率的叠层的那些层之间的界面，并且可以反射出这些界面。 从这些接口反射的光可以引起触摸传感器面板上的边缘的外观，这可以在视觉上分散注意力。 为了减少这些条纹的外观，本发明的实施例涉及在触摸传感器面板叠层中的迹线的导电层和粘合剂层之间添加折射率匹配钝化层。

公开(公告)号：US20140065321A1

公开(公告)日：2014-03-06

申请号：US13602029

申请日：2012-08-31

Applicant: Wonsuk Chung ,  Chun-Hao Tung ,  Yu-Chun Tseng ,  Sunggu Kang ,  John Z. Zhong ,  Siddharth Mohapatra

Inventor： Wonsuk Chung ,  Chun-Hao Tung ,  Yu-Chun Tseng ,  Sunggu Kang ,  John Z. Zhong ,  Siddharth Mohapatra

IPC: H05K3/00

CPC classification number: H05K3/0052 ,  H05K3/0032 ,  H05K3/28 ,  H05K2203/0228

Abstract: The described embodiments relate generally to the singulation of circuits and more particularly to a method of cutting of a polymer substrate that is overlaid with a conductive element and a passivation layer. In one embodiment, the passivation layer is applied selectively to the polymer substrate in an area covering the conductive element and extending at least a first distance past an outer edge of the conductive element. Then, a cutting operation is performed along a cutting path located a second distance from an outer edge of the passivation layer. The second distance is a minimum distance between the edge of the passivation layer and the cutting path that prevents a load applied at the second distance from causing a stress crack in the passivation layer.

Abstract translation: 所描述的实施例大体上涉及电路的单个化，更具体地涉及切割覆盖有导电元件和钝化层的聚合物衬底的方法。 在一个实施例中，钝化层在覆盖导电元件的区域中选择性地施加到聚合物衬底，并且延伸至少通过导电元件的外边缘的第一距离。 然后，沿着距离钝化层的外边缘第二距离的切割路径执行切割操作。 第二距离是钝化层的边缘与切割路径之间的最小距离，该距离防止在第二距离施加的载荷在钝化层中引起应力裂纹。

公开(公告)号：US07776497B2

公开(公告)日：2010-08-17

申请号：US12547765

申请日：2009-08-26

Applicant: Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Shigekazu Horino

Inventor： Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Shigekazu Horino

IPC: G03F1/00

CPC classification number: G03F1/32 ,  G03F1/54

Abstract: A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.

Abstract translation: 提供了包括透明衬底，非透射层，第一透射层和第二透射层的掩模。 透明基板具有第一区域，第二区域和第三区域。 非透射层设置在透明基板的第一区域中。 第一透射层设置在透明基板的第二区域和第三区域中。 第二发送层设置在第三区域的第一发送层上。

公开(公告)号：US20100141608A1

公开(公告)日：2010-06-10

申请号：US12331430

申请日：2008-12-09

Applicant: Lili HUANG ,  Shih Chang Chang ,  Neal Oldham ,  Steve Porter Hotelling ,  John Z. Zhong ,  Chun-Hao Tung

Inventor： Lili HUANG ,  Shih Chang Chang ,  Neal Oldham ,  Steve Porter Hotelling ,  John Z. Zhong ,  Chun-Hao Tung

IPC: G06F3/041

CPC classification number: G06F3/044

Abstract: Index matching for touch screens is provided. An index matching stackup for a touch screen can be formed including a substantially transparent substrate, a substantially transparent conductive layer disposed in a pattern, and an index matching layer for improving an optical uniformity of the touch screen. The index matching layer can also be designed to operate as a dual-function layer. In one dual-function design, the index matching layer design performs both index matching and passivating the conductive layer. In another dual-function design, the index matching layer performs both index matching and adhesion of layers. The index matching layer can also be designed to serve all three functions of index matching, passivating, and adhering.

Abstract translation: 提供触摸屏索引匹配。 可以形成用于触摸屏的折射率匹配叠层，其包括基本上透明的基板，以图案设置的基本上透明的导电层以及用于改善触摸屏的光学均匀性的折射率匹配层。 索引匹配层也可以被设计为作为双功能层来操作。 在一个双功能设计中，索引匹配层设计执行索引匹配和钝化导电层。 在另一个双功能设计中，索引匹配层执行索引匹配和层的粘附。 索引匹配层也可以设计为满足索引匹配，钝化和粘贴的所有三个功能。

公开(公告)号：US07704647B2

公开(公告)日：2010-04-27

申请号：US11444546

申请日：2006-05-31

Applicant: Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Horino Shigekazu

Inventor： Chun-Hao Tung ,  Chia-Tsung Lee ,  Hsien-Kai Tseng ,  Horino Shigekazu

IPC: G03F1/00

CPC classification number: G03F1/32 ,  G03F1/54

Abstract: A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.

Abstract translation: 提供了一种掩模及其制造方法。 首先设置具有三个区域的透明基板。 在透明基板的第一区域中形成非透光层。 然后，在透明基板上形成第一光致抗蚀剂层，第一光致抗蚀剂层露出透明基板的第二区域。 接下来，在透明基板和第一光致抗蚀剂层上形成第一透光层。 最后，去除第一光致抗蚀剂层。 同时去除第一光致抗蚀剂层上的第一透射层，并且保留透明基板的第二区域中的第一透射层，并露出透明基板的第三区域。 在本发明的掩模制造方法中使用剥离处理来形成透射层。