公开(公告)号：US08034517B2

公开(公告)日：2011-10-11

申请号：US11933421

申请日：2007-11-01

申请人： Chun-Chieh Tsao ,  Shu-Chin Lee ,  Hsiang-Lin Lin

发明人： Chun-Chieh Tsao ,  Shu-Chin Lee ,  Hsiang-Lin Lin

IPC分类号： G02B5/20 ,  G03F1/00

CPC分类号： G02B5/201 ,  G02B5/223 ,  G02F1/133516

摘要： A manufacturing method of a color filter comprising the following steps is provided. At first, a transparent substrate is provided. Next, a black matrix is formed on the transparent substrate to define a plurality of pixel areas on the transparent substrate. Then, an isolation layer is formed and patterned on the black matrix and then Red/Green/Blue color filter inks are filled into each of the pixel areas separately by inkjet printing. After that, the color filter inks are dried to form color filter units and optionally the isolation layer can further be patterned to form plenty of photo spacers on the black matrix. The isolation layers prevented the color filter inks from spilling out of the pixel areas and color mixing problems during color filter inkjet fabrication. Besides, it is characterized that the color filter units can be formed with even thickness.

摘要翻译： 提供了一种包括以下步骤的滤色器的制造方法。 首先，提供透明基板。 接下来，在透明基板上形成黑矩阵，以在透明基板上限定多个像素区域。 然后，在黑矩阵上形成并图案化隔离层，然后通过喷墨打印将红/绿/蓝滤色器墨水分别填充到每个像素区域中。 之后，将滤色器油墨干燥以形成滤色器单元，并且任选地隔离层可进一步图案化以在黑色矩阵上形成大量的光隔离物。 隔离层防止滤色器墨水在滤色器喷墨制造期间溢出像素区域和混色问题。 此外，其特征在于可以形成均匀厚度的滤色器单元。

公开(公告)号：US07839462B2

公开(公告)日：2010-11-23

申请号：US12204809

申请日：2008-09-05

申请人： Hsiang-Lin Lin

发明人： Hsiang-Lin Lin

IPC分类号： G02F1/136 ,  G02F1/343

CPC分类号： H01L27/124 ,  G02F1/134363 ,  G02F1/13439 ,  G02F2001/136295

摘要： A pixel structure of a liquid crystal display panel and the method thereof is provided. The gate electrode and data line of the pixel structure are formed by a first patterned conductive layer, the scan line is formed by a second patterned conductive layer, and the common electrode and the pixel electrode are formed on a substrate. The common electrode, the pixel electrode, and the insulating layer disposed therebetween compose a storage capacitor. Also, the pixel or the common electrode has a slit structure.

摘要翻译： 提供了一种液晶显示面板的像素结构及其方法。 像素结构的栅电极和数据线由第一图案化导电层形成，扫描线由第二图案化导电层形成，并且公共电极和像素电极形成在基板上。 公共电极，像素电极和设置在其间的绝缘层组成存储电容器。 此外，像素或公共电极具有狭缝结构。

公开(公告)号：US07781776B2

公开(公告)日：2010-08-24

申请号：US12190887

申请日：2008-08-13

申请人： Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Han-Tu Lin

发明人： Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Han-Tu Lin

IPC分类号： H01L21/30

CPC分类号： H01L27/1288 ,  H01L27/124

摘要： An active device array substrate and its fabricating method are provided. According to the subject invention, the elements of an array substrate such as the thin film transistors, gate lines, gate pads, data lines, data pads and storage electrodes, are provided by forming a patterned first metal layer, an insulating layer, a patterned semiconductor layer and a patterned metal multilayer. Furthermore, the subject invention uses the means of selectively etching certain layers. Using the aforesaid means, the array substrate of the subject invention has some layers with under-cut structures, and thus, the number of the time-consuming and complicated mask etching process involved in the production of an array substrate can be reduced. The subject invention provides a relatively simple and time-saving method for producing an array substrate.

摘要翻译： 提供一种有源器件阵列衬底及其制造方法。 根据本发明，诸如薄膜晶体管，栅极线，栅极焊盘，数据线，数据焊盘和存储电极之类的阵列基板的元件通过形成图案化的第一金属层，绝缘层，图案化 半导体层和图案化金属多层。 此外，本发明使用选择性蚀刻某些层的方法。 使用上述方法，本发明的阵列基板具有一些具有欠切割结构的层，因此可以减少与制造阵列基板有关的耗时且复杂的掩模蚀刻工艺的数量。 本发明提供了用于制造阵列基板的相对简单且省时的方法。

公开(公告)号：US07751002B2

公开(公告)日：2010-07-06

申请号：US12190601

申请日：2008-08-13

申请人： Shih-Chia Hsu ,  Ying-Ru Chen ,  Hsiang-Lin Lin ,  Ching-Huan Lin

发明人： Shih-Chia Hsu ,  Ying-Ru Chen ,  Hsiang-Lin Lin ,  Ching-Huan Lin

IPC分类号： G02F1/1335

CPC分类号： G02F1/133555 ,  G02F1/136213 ,  G02F1/136286

摘要： A pixel structure of a transflective LCD panel includes a substrate, a data line and a scan, a thin film transistor containing an extending electrode, a first common electrode and a second common electrode, a transmissive pixel electrode, and a reflective pixel electrode forming a first coupling capacitor with the extending electrode and a second coupling capacitor with the second common electrode. The first and second common electrodes and the data line overlap with each other in an overlapping area, wherein the first common electrode is disposed between the second common electrode and the data line.

摘要翻译： 半透射型LCD面板的像素结构包括基板，数据线和扫描，包含延伸电极的薄膜晶体管，第一公共电极和第二公共电极，透射像素电极和反射像素电极，形成 第一耦合电容器与延伸电极和第二耦合电容器与第二公共电极。 第一和第二公共电极和数据线在重叠区域彼此重叠，其中第一公共电极设置在第二公共电极和数据线之间。

公开(公告)号：US07713797B2

公开(公告)日：2010-05-11

申请号：US12177882

申请日：2008-07-23

申请人： Hsiang-Lin Lin ,  Chun-Chieh Tsao

发明人： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： G02F1/133555 ,  G02F1/136227 ,  H01L27/124 ,  H01L27/1248

摘要： A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.

摘要翻译： 一种像素结构，包括栅极，栅极电介质层，具有设置在栅极上方的沟道区域的图案化半导体层，具有设置在栅极上方的蚀刻停止层和多个凸起的图案化电介质层，具有 提供反射像素电极，源极和漏极，外涂层电介质层和顺序地设置在基板上的透明像素电极。 源极和漏极分别覆盖沟道区域的部分。 反射像素电极连接漏极并覆盖凸块以形成不平坦的表面。 设置在由栅极，栅极电介质层，图案化半导体层，源极和漏极构成的晶体管上的外涂层电介质层具有暴露反射像素电极的一部分的接触开口。 透明像素电极通过接触开口电连接到反射像素电极。

公开(公告)号：US20090173943A1

公开(公告)日：2009-07-09

申请号：US12102027

申请日：2008-04-14

申请人： Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

发明人： Wei-Sheng Yu ,  Kuo-Lung Fang ,  Hsiang-Lin Lin ,  Hsien-Chieh Tseng ,  Han-Tu Lin

IPC分类号： H01L33/00

CPC分类号： H01L27/124 ,  H01L27/1248 ,  H01L27/1288

摘要： An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.

摘要翻译： 设置在基板上的有源矩阵阵列结构包括第一图案化导电层，图案化栅极绝缘层，图案化半导体层，第二图案化导电层，图案化外涂层和透明导电层。 图案化栅极绝缘层具有暴露第一图案化导电层的一部分的第一开口。 图案化的半导体层设置在图案化的栅极绝缘层上。 第二图案化导电层设置在图案化的半导体层上。 图案化的外涂层具有暴露第一图案化导电层的一部分和第二图案化导电层的一部分的第二开口。 透明导电层完全设置在基板上。 设置在第一开口和第二开口中的透明导电层在基板和图案化外涂层之间的位置处断开。

公开(公告)号：US20090108259A1

公开(公告)日：2009-04-30

申请号：US12040281

申请日：2008-02-29

申请人： Hsiang-Lin Lin ,  Ching-Huan Lin

发明人： Hsiang-Lin Lin ,  Ching-Huan Lin

IPC分类号： H01L27/12 ,  H01L21/84

CPC分类号： H01L27/1288 ,  G02F1/134363 ,  G02F2001/134372 ,  H01L27/1214 ,  H01L27/124

摘要： A pixel structure of a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the pixel structure are provided. Compared to the conventional method of using seven photolithography-etching processes for manufacturing a pixel structure, the method of the present invention uses only six photolithography-etching processes that save manufacturing costs and time. Furthermore, the pixel structure thereby only comprises two insulating layers, and thus, the light transmittance thereof can be increased in comparison to the conventional pixel structure comprising three insulating layers.

摘要翻译： 提供了一种边缘场切换液晶显示器（FFS-LCD）的像素结构以及像素结构的制造方法。 与使用七个光刻蚀刻工艺用于制造像素结构的常规方法相比，本发明的方法仅使用六个光刻蚀刻工艺，其节省制造成本和时间。 此外，像素结构由此仅包括两个绝缘层，因此与包括三个绝缘层的常规像素结构相比，其透光率可以增加。

公开(公告)号：US20080237594A1

公开(公告)日：2008-10-02

申请号：US11863283

申请日：2007-09-28

申请人： Hsiang-Lin Lin ,  Sung-Kao Liu

发明人： Hsiang-Lin Lin ,  Sung-Kao Liu

IPC分类号： H01L29/04 ,  H01L21/00

CPC分类号： G02F1/136227 ,  G02F1/136213 ,  G02F2001/13606 ,  G02F2001/136218

摘要： A method of manufacturing a pixel structure is provided. A first patterned conductive layer including a gate and a data line is formed on a substrate. A gate insulating layer is formed to cover the first patterned conductive layer and a semiconductor channel layer is formed on the gate insulating layer above the gate. A second patterned conductive layer including a scan line, a common line, a source and a drain is formed on the gate insulating layer and the semiconductor channel layer. The scan line is connected to the gate and the common line is located above the data line. The source and drain are located on the semiconductor channel layer, and the source is connected to the data line. A passivation layer is formed on the substrate to cover the second patterned conductive layer. A pixel electrode connected to the drain is formed on the passivation layer.

摘要翻译： 提供了一种制造像素结构的方法。 在基板上形成包括栅极和数据线的第一图案化导电层。 形成栅极绝缘层以覆盖第一图案化导电层，并且在栅极上方的栅极绝缘层上形成半导体沟道层。 包括扫描线，公共线，源极和漏极的第二图案化导电层形成在栅极绝缘层和半导体沟道层上。 扫描线连接到栅极，公共线位于数据线上方。 源极和漏极位于半导体沟道层上，源极连接到数据线。 在衬底上形成钝化层以覆盖第二图案化导电层。 连接到漏极的像素电极形成在钝化层上。

公开(公告)号：US20080199638A1

公开(公告)日：2008-08-21

申请号：US11707577

申请日：2007-02-15

申请人： Hsiang-Lin Lin ,  Chun-Chieh Tsao

发明人： Hsiang-Lin Lin ,  Chun-Chieh Tsao

IPC分类号： C09K19/02 ,  G03F1/00

CPC分类号： G03F7/40 ,  G02F1/133504 ,  G02F1/133555 ,  G02F2201/123 ,  G03F7/0007 ,  H01R13/6675 ,  H02J7/0068 ,  Y10T307/625 ,  Y10T428/1068

摘要： A method for producing a light reflecting structure in a transflective or reflective liquid crystal display uses one or two masks for masking a photoresist layer in a back-side exposing process. The pattern on the masks is designed to produce rod-like structures or crevices and holes on exposed and developed photoresist layer. After the exposed photoresist is developed, a heat treatment process or a UV curing process is used to soften the photoresist layer so that the reshaped surface is more or less contiguous but uneven. A reflective coating is then deposited on the uneven surface. One or more intermediate layers can be made between the masks, between the lower mask and the substrate, and between the upper masks and the photoresist layers. The masks and the intermediate layers can be made in conjunction with the fabrication of the liquid crystal display panel.

摘要翻译： 在半反射或反射型液晶显示器中制造光反射结构的方法使用一个或两个掩模来掩模背面曝光工艺中的光致抗蚀剂层。 掩模上的图案被设计成在曝光和显影的光致抗蚀剂层上产生棒状结构或缝隙和孔。 曝光的光致抗蚀剂显影后，使用热处理工艺或UV固化工艺来软化光致抗蚀剂层，使得整形表面或多或少地连续但不均匀。 然后将反射涂层沉积在不平坦表面上。 可以在掩模之间，下掩模和基板之间以及上掩模和光致抗蚀剂层之间形成一个或多个中间层。 掩模和中间层可以与液晶显示面板的制造相结合。

公开(公告)号：US08339559B2

公开(公告)日：2012-12-25

申请号：US13466195

申请日：2012-05-08

申请人： Liu-Chung Lee ,  Hsiang-Lin Lin ,  Kuo-Yu Huang

发明人： Liu-Chung Lee ,  Hsiang-Lin Lin ,  Kuo-Yu Huang

IPC分类号： G02F1/136 ,  G02F1/1333 ,  G02F1/1343 ,  H01L29/04 ,  H01L29/10 ,  H01L31/00 ,  H01L27/14 ,  H01L29/15 ,  H01L31/036

CPC分类号： G02F1/13458 ,  G02F1/136227 ,  G02F2001/136218 ,  H01L27/124 ,  H01L27/1255 ,  H01L27/1288

摘要： A liquid crystal display unit structure and the manufacturing method thereof are provided. The liquid crystal display unit structure comprises a patterned first metal layer with a first data line segment and a gate line on a substrate; a patterned dielectric layer covering the first data line and the gate line having a plurality of first openings and a second opening therein, a patterned etch stop layer having a first portion located above the first data line segment and a second portion; a patterned second metal layer including a common electrode line, a second data line segment, a source electrode and a drain electrode, wherein the first portion of the patterned etch stop layer is between the first data line segment and the common line; a patterned passivation layer and a patterned transparent conductive layer.

摘要翻译： 提供了一种液晶显示单元结构及其制造方法。 液晶显示单元结构包括在基板上具有第一数据线段和栅极线的图案化第一金属层; 覆盖第一数据线的图案化介电层和具有多个第一开口和第二开口的栅极线，具有位于第一数据线段上方的第一部分的图案化蚀刻停止层和第二部分; 图案化的第二金属层，包括公共电极线，第二数据线段，源电极和漏电极，其中图案化蚀刻停止层的第一部分在第一数据线段和公共线之间; 图案化钝化层和图案化的透明导电层。