GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATION SYSTEM

    公开(公告)号:US20220186358A1

    公开(公告)日:2022-06-16

    申请号:US17688613

    申请日:2022-03-07

    Applicant: ENTEGRIS, INC.

    Abstract: The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during au ion implantation procedure.

    REMOTE DELIVERY OF CHEMICAL REAGENTS
    23.
    发明申请
    REMOTE DELIVERY OF CHEMICAL REAGENTS 审中-公开
    远程输送化学试剂

    公开(公告)号:US20160172164A1

    公开(公告)日:2016-06-16

    申请号:US14906537

    申请日:2014-07-21

    Applicant: Entegris, Inc.

    Abstract: Fluid storage and dispensing systems and methods for remote delivery of fluids are described, for providing fluid from a source vessel at lower voltage to one or more fluid-utilizing tools at higher voltage, so that the fluid crosses the associated voltage gap without arcing, discharge, premature ionization, or other anomalous behavior, and so that when multiple fluid-utilizing tools are supplied by the remote source vessel, fluid is efficiently supplied to each of the multiple tools at suitable pressure level during the independent operation of others of the multiple vessels.

    Abstract translation: 描述用于远程输送流体的流体存储和分配系统和方法,用于将来自较低电压的源容器的流体提供给在较高电压下的一个或多个流体利用工具,使得流体跨过相关联的电压间隙而没有电弧,放电 过早电离或其他异常行为,并且当多个流体利用工具由远程源容器供应时,在多个容器的其他人的独立操作期间,以适当的压力水平将流体有效地供给到多个工具中的每一个 。

Patent Agency Ranking