-
公开(公告)号：US11827973B2
公开(公告)日：2023-11-28
申请号：US17688613
申请日：2022-03-07
Applicant: ENTEGRIS, INC.
Inventor： Oleg Byl , Ying Tang , Joseph R. Despres , Joseph D. Sweeney , Sharad N. Yedave
IPC: C23C14/48 , C23C14/56 , H01J37/08 , H01J37/317
CPC classification number: C23C14/48 , C23C14/564 , H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/022
Abstract: The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during au ion implantation procedure.
-
公开(公告)号：US20210370259A1
公开(公告)日：2021-12-02
申请号：US17398891
申请日：2021-08-10
Applicant: ENTEGRIS, INC.
Inventor： Lawrence H. Dubois , Donald J. Carruthers , Melissa A. Petruska , Edward A. Sturm , Shaun M. Wilson , Steven M. Lurcott , Bryan C. Hendrix , Joseph D. Sweeney , Michael J. Wodjenski , Oleg Byl , Ying Tang , Joseph R. Despres , Matthew Thomas Marlow , Christopher Scannell , Daniel Elzer , Kavita Murthi
Abstract: Adsorbents of varying types and forms are described, as usefully employed in gas supply packages that include a gas storage and dispensing vessel holding such adsorbent for storage of sorbate gas thereon, and a gas dispensing assembly secured to the vessel for discharging the sorbate gas from the gas supply package under dispensing conditions thereof. Corresponding gas supply packages are likewise described, and various methods of processing the adsorbent, and manufacturing the gas supply packages.
-
公开(公告)号：US20200206717A1
公开(公告)日：2020-07-02
申请号：US15773652
申请日：2016-11-04
Applicant: ENTEGRIS, INC.
Inventor： Lawrence H. Dubois , Donald J. Carruthers , Melissa A. Petruska , Edward A. Sturm , Shaun M. Wilson , Steven M. Lurcott , Bryan C. Hendrix , Joseph D. Sweeney , Michael J. Wodjenski , Oleg Byl , Ying Tang , Joseph R. Despres , Matthew Thomas Marlow , Christopher Scannell , Daniel Elzer , Kavita Murthi
Abstract: Adsorbents of varying types and forms are described, as usefully employed in gas supply packages that include a gas storage and dispensing vessel holding such adsorbent for storage of sorbate gas thereon, and a gas dispensing assembly secured to the vessel for discharging the sorbate gas from the gas supply package under dispensing conditions thereof. Corresponding gas supply packages are likewise described, and various methods of processing the adsorbent, and manufacturing the gas supply packages.
-
公开(公告)号：US20170248275A1
公开(公告)日：2017-08-31
申请号：US15516576
申请日：2015-10-01
Applicant: Entegris, Inc.
Inventor： Joseph R. Despres , Joseph D. Sweeney , Anthony M. Avila
CPC classification number: F17C13/04 , F16K17/00 , F17C1/00 , F17C2201/058 , F17C2205/0111 , F17C2205/0323 , F17C2205/0338 , F17C2205/035 , F17C2205/0391 , F17C2225/0123 , F17C2270/0518 , G05D16/0619 , H01L21/02 , H01L21/306
Abstract: A gas storage and dispensing vessel, including a vessel container definishing a gas storage interior volume, and a valve head regulator assembly secured to the vessel container, the valve head regulator assembly including a single gas pressure regulator disposed in the interior volume of the vessel container, and a valve head including a pneumatic flow control valve, wherein the single regulator is configured with a set point pressure of at least 0.5 MPa, and wherein the interior volume of the vessel container is at least 5 L.
-
公开(公告)号：US10892137B2
公开(公告)日：2021-01-12
申请号：US16564965
申请日：2019-09-09
Applicant: ENTEGRIS, INC.
Inventor： Joseph D. Sweeney , Joseph R. Despres , Ying Tang , Sharad N. Yedave , Edward E. Jones , Oleg Byl
IPC: H01J37/08 , H01J37/317
Abstract: An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.
-
Patent Agency Ranking
6.发明申请公开(公告)号：US20180180225A1
公开(公告)日：2018-06-28
申请号：US15900033
申请日：2018-02-20
Applicant: Entegris, Inc.
Inventor： Joseph R. Despres , Joseph D. Sweeney , Edward E. Jones , Matthew B. Donatucci , Chiranjeevi Pydi , Edward A. Sturm , Barry Lewis Chambers , Gregory Scott Baumgart
CPC classification number: F17C13/12 , F17C13/04 , F17C2201/0104 , F17C2205/0326 , F17C2205/0329 , F17C2205/0335 , F17C2205/0338 , F17C2205/0344 , F17C2205/035 , F17C2205/0382 , F17C2205/0391 , F17C2221/012 , F17C2221/013 , F17C2221/015 , F17C2221/016 , F17C2227/045 , F17C2250/0626 , F17C2270/0518 , Y02E60/321 , Y10T137/7795
Abstract: A fluid supply package comprising a pressure-regulated fluid storage and dispensing vessel, a valve head adapted for dispensing of fluid from the vessel, and an anti-pressure spike assembly adapted to combat pressure spiking in flow of fluid at inception of fluid dispensing.
-
公开(公告)号：US09897257B2
公开(公告)日：2018-02-20
申请号：US14430105
申请日：2013-09-20
Applicant: Entegris, Inc.
Inventor： Joseph R. Despres , Joseph D. Sweeney , Edward E. Jones , Matthew B. Donatucci , Chiranjeevi Pydi , Edward A. Sturm , Barry Lewis Chambers , Gregory Scott Baumgart
CPC classification number: F17C13/12 , F17C13/04 , F17C2201/0104 , F17C2205/0326 , F17C2205/0329 , F17C2205/0335 , F17C2205/0338 , F17C2205/0344 , F17C2205/035 , F17C2205/0382 , F17C2205/0391 , F17C2221/012 , F17C2221/013 , F17C2221/015 , F17C2221/016 , F17C2227/045 , F17C2250/0626 , F17C2270/0518 , Y02E60/321 , Y10T137/7795
Abstract: A fluid supply package comprising a pressure-regulated fluid storage and dispensing vessel, a valve head adapted for dispensing of fluid from the vessel, and an anti-pressure spike assembly adapted to combat pressure spiking in flow of fluid at inception of fluid dispensing.
-
公开(公告)号：US20150308626A1
公开(公告)日：2015-10-29
申请号：US14796723
申请日：2015-07-10
Applicant: Entegris, Inc.
Inventor： Joseph D. Sweeney , Anthony M. Avila , Michael J. Wodjenski , Joseph R. Despres , Thomas H. Baum
IPC: F17D3/01
CPC classification number: F17D3/01 , F17D3/00 , G05D7/0635 , H01J37/3171 , H01J2237/006 , H01J2237/30466 , H01L21/67017 , H01L21/67253 , Y10T137/0324 , Y10T137/86389
Abstract: Apparatus and method for determining endpoint of a fluid supply vessel in which fluid flow is controlled through a flow passage disposed in an interior volume of the fluid supply vessel with a static flow restricting device and a selectively actuatable valve element upon establishing fluid flow. The endpoint determination can be employed to terminate fluid supply from the fluid supply vessel and/or to switch from a fluid-depleted supply vessel to a fresh vessel for continuity or renewal of fluid supply operation. The apparatus and method are suitable for use with fluid-utilizing apparatus such as ion implanters.
Abstract translation: 用于确定流体供应容器的端点的装置和方法，其中通过设置在流体供应容器的内部容积中的流动通道具有静态流动限制装置和在建立流体流动时可选择性致动的阀元件来控制流体流动。 端点确定可以用于终止从流体供应容器供应的流体和/或从流体耗尽的供应容器切换到新鲜的容器，以便连续或更新流体供应操作。 该装置和方法适用于诸如离子注入机之类的流体利用装置。
-
公开(公告)号：US20240379320A1
公开(公告)日：2024-11-14
申请号：US18657535
申请日：2024-05-07
Applicant: ENTEGRIS, INC.
Inventor： Ying Tang , Joseph R. Despres , Nicholas Harris , Edward E. Jones
IPC: H01J37/08 , H01J37/317
Abstract: An ion implantation system and related methods are provided herein. An ion implantation system comprises a gas supply assembly comprising at least one gas supply vessel in fluid communication with an arc chamber. The gas supply assembly is configured to supply a gas component comprising at least one of GeF4, GeH4, H2, a fluorine-containing gas, or any combination thereof. When the gas component is supplied from the at least one gas supply vessel to the arc chamber for implantation into a substrate, a beam current of Ge ions generated from the gas component is greater than a beam current of Ge ions generated from a control gas component.
-
公开(公告)号：US10247363B2
公开(公告)日：2019-04-02
申请号：US15549875
申请日：2016-02-12
Applicant: ENTEGRIS, INC.
Inventor： Joseph D. Sweeney , Edward E. Jones , Joseph R. Despres , Richard S. Ray , Peter C. Van Buskirk , Edward A. Sturm , Chris Scannell
Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.
-
-
-
-
-
-
-
-
-
Search Results
23
records
(took 0.014 seconds)
