公开(公告)号：US20190352495A1

公开(公告)日：2019-11-21

申请号：US16525687

申请日：2019-07-30

Applicant: FUJIFILM Corporation

Inventor： Ryosuke KATO ,  Takashi KAWASHIMA ,  Yoshinori TAGUCHI

IPC: C08L33/10 ,  C08L33/06 ,  C08K3/22 ,  C08K5/3475 ,  C08K5/1575 ,  C08K5/1535 ,  C08L33/02 ,  C08L47/00 ,  C08G61/12 ,  G02B1/04 ,  C08J3/24

Abstract: A composition includes: a compound represented by the following Formula (1); a pigment; and a solvent. In a case where a film having a thickness of 4.0 m is formed using the composition, a maximum value of a light transmittance of the film in a thickness direction in a wavelength range of 360 nm to 700 nm is lower than 40%. In Formula (1), Z1 represents an (m+n)-valent linking group, Y1 and Y2 each independently represent a single bond or a linking group, A represents a group including a pigment adsorption portion, P1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 3 to 21, at least one of Z1, A1, or P1 includes a photocurable group.

公开(公告)号：US20150293283A1

公开(公告)日：2015-10-15

申请号：US14751245

申请日：2015-06-26

Applicant: FUJIFILM Corporation

Inventor： Yuki NARA ,  Seongmu BAK ,  Toshihide EZOE ,  Takashi KAWASHIMA ,  Seiichi HITOMI

IPC: G02B5/20 ,  H04N5/335 ,  H04N5/33 ,  G02B1/04 ,  H01L27/146

CPC classification number: G02B5/208 ,  G02B1/04 ,  G02B13/003 ,  G03B11/00 ,  H01L27/14621 ,  H01L27/14638 ,  H01L27/14685 ,  H04N5/2254 ,  H04N5/33 ,  H04N5/335 ,  C08L63/00 ,  C08L101/14

Abstract: A near-infrared blocking filter includes a near-infrared absorbing substance, has a film thickness of 300 μm or less, and has a visible light transmissivity in a wavelength range of 450 nm to 550 nm of 85% or more, a light transmissivity at a wavelength of 800 nm is 20% or less, and a light transmissivity at a wavelength of 850 nm is 20% or less.

Abstract translation: 近红外阻挡滤光器包括近红外线吸收物质，膜厚度为300μm以下，在450nm〜550nm的波长范围内的可见光透过率为85％以上，透过率为 800nm的波长为20％以下，波长850nm的透光率为20％以下。

公开(公告)号：US20220390658A1

公开(公告)日：2022-12-08

申请号：US17867327

申请日：2022-07-18

Applicant: FUJIFILM Corporation

Inventor： Masaomi MAKINO ,  Takashi KAWASHIMA

IPC: G02B5/20 ,  C09D17/00 ,  C09B11/12 ,  C09D11/322 ,  H01L27/146 ,  C09B67/46 ,  G02F1/1335

Abstract: Provided are a coloring resin composition including a resin, a coloring material, and an organic solvent, in which the resin includes a resin A including a repeating unit (A) represented by Formula (a), where, in Formula (a), La1 represents a trivalent group, Ara1 represents an aromatic hydrocarbon group having a substituent, the substituent is a group having a structure in which a bonding portion with the aromatic hydrocarbon group is an ester bond or an amide bond, in the ester bond, an atom on a side different from an oxygen atom in the ester bond is on a side of the bonding portion with the aromatic hydrocarbon group, and in the amide bond, an atom on a side different from a nitrogen atom in the amide bond is on a side of the bonding portion with the aromatic hydrocarbon group; a film formed of the coloring resin composition; a color filter; a solid-state imaging element; and an image display device.

公开(公告)号：US20220145009A1

公开(公告)日：2022-05-12

申请号：US17585551

申请日：2022-01-27

Applicant: FUJIFILM Corporation

Inventor： Masaomi MAKINO ,  Takashi KAWASHIMA

IPC: C08G73/10 ,  C08K5/00 ,  G02B1/04 ,  C08K5/33

Abstract: Provided are a coloring resin composition including a resin, a coloring material, and a solvent, in which the resin is a polyimide or polyimide precursor including a repeating unit represented by Formula (1-1) or Formula (1-2), and a content of the coloring material is 30 mass % or more with respect to a total solid content of the composition; a film; a color filter; a solid-state imaging element; and an image display device.

公开(公告)号：US20210364917A1

公开(公告)日：2021-11-25

申请号：US17386440

申请日：2021-07-27

Applicant: FUJIFILM Corporation

Inventor： Minoru UEMURA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Kei YAMAMOTO ,  Takashi KAWASHIMA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C317/28 ,  C07C317/44 ,  C07D327/06 ,  C07C255/17 ,  C07D333/46 ,  C07C311/16 ,  C07C25/02 ,  C07D317/72

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+  (I)

公开(公告)号：US20210318616A1

公开(公告)日：2021-10-14

申请号：US17344967

申请日：2021-06-11

Applicant: FUJIFILM Corporation

Inventor： Daisuke ASAKAWA ,  Takashi KAWASHIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/40 ,  G03F7/32

Abstract: According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a resin P having a repeating unit represented by General Formula (P1) and a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided. Mp represents a single bond or a divalent linking group. Lp represents a divalent linking group. Xp represents O, S, or NRN1. RN1 represents a hydrogen atom or a monovalent organic group. Rp represents a monovalent organic group.

公开(公告)号：US20210088905A1

公开(公告)日：2021-03-25

申请号：US17106170

申请日：2020-11-29

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Minoru UEMURA ,  Takashi KAWASHIMA ,  Akiyoshi GOTO ,  Kei YAMAMOTO ,  Kazuhiro MARUMO ,  Keiyu OU

IPC: G03F7/039 ,  G03F7/038 ,  C08L33/10 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of −1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than −1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.

公开(公告)号：US20210072642A1

公开(公告)日：2021-03-11

申请号：US16953305

申请日：2020-11-19

Applicant: FUJIFILM Corporation

Inventor： Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Takashi KAWASHIMA ,  Yasufumi OISHI ,  Keita KATO

IPC: G03F7/039 ,  G03F7/038 ,  C08F20/18 ,  C08F26/06

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.

公开(公告)号：US20180292586A1

公开(公告)日：2018-10-11

申请号：US16008209

申请日：2018-06-14

Applicant: FUJIFILM Corporation

Inventor： Seiichi HITOMI ,  Takashi KAWASHIMA ,  Keisuke ARIMURA ,  Takahiro OKAWARA

IPC: G02B5/22 ,  C08L101/02 ,  C08L33/10 ,  C08L43/04 ,  C08K5/01 ,  H01L27/146 ,  G02B5/28 ,  C08K5/54

Abstract: Provided are a near infrared absorbing composition with which a cured film having excellent solvent resistance and thermal shock resistance can be manufactured, a near infrared cut filter, a method of manufacturing a near infrared cut filter, a solid image pickup element, a camera module, and an image display device. The near infrared absorbing composition includes: a resin A that satisfies the following condition a1; an infrared absorber B; and a solvent D. At least the resin A has a crosslinking group, or the near infrared absorbing composition further includes a compound C having a crosslinking group that is different from the resin A. condition a1: in a case where the resin A does not have a crosslinking group, a glass transition temperature of the resin A measured by differential scanning calorimetry is 0° C. to 100° C., and in a case where the resin A has a crosslinking group, a glass transition temperature of a resin having a structure in which a portion which forms a crosslinking bond in the crosslinking group of the resin A is substituted with a hydrogen atom is 0° C. to 100° C., the glass transition temperature being measured by differential scanning calorimetry.

公开(公告)号：US20170102483A1

公开(公告)日：2017-04-13

申请号：US15389546

申请日：2016-12-23

Applicant: FUJIFILM Corporation

Inventor： Takashi KAWASHIMA ,  Keisuke ARIMURA

IPC: G02B1/04 ,  C08K5/56 ,  H04N5/238 ,  G02B5/22 ,  G02B5/20

CPC classification number: G02B1/04 ,  C08K5/56 ,  G02B5/208 ,  G02B5/22 ,  H01L27/14618 ,  H01L27/14625 ,  H04N5/2257 ,  H04N5/238 ,  C08L25/06 ,  C08L33/26 ,  C08L33/08 ,  C08L33/10

Abstract: Provided are a near infrared ray absorbent composition which can form a cured film having excellent heat resistance while maintaining high near infrared ray shielding properties, and a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module using the near infrared ray absorbent composition. The near infrared ray absorbent composition contains a compound having a partial structure represented by M-X, and a near infrared ray absorbent compound, and a content of the compound having a partial structure represented by M-X is greater than or equal to 15 mass % with respect to a total solid content of the near infrared ray absorbent composition. Here, M is an atom selected from Si, Ti, Zr, and Al, X is one type selected from a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O═C(Ra)(Rb), Ra and Rb each independently represent a monovalent organic group, and in a case in which X is O═C(Ra)(Rb), X is bonded to M by an unshared electron pair of an oxygen atom of a carbonyl group.