CRYOGENIC GRINDING OF TANTALUM FOR USE IN CAPACITOR MANUFACTURE
    29.
    发明申请
    CRYOGENIC GRINDING OF TANTALUM FOR USE IN CAPACITOR MANUFACTURE 有权
    用于电容器制造的钽粉的低温研磨

    公开(公告)号:US20160336115A1

    公开(公告)日:2016-11-17

    申请号:US15220345

    申请日:2016-07-26

    Abstract: An electrolytic capacitor comprising an anode comprised of cryogenically milled anode material is described. The cryogenic milling process prepares the active anode material for anode fabrication. The capacitor further comprises a casing of first and second casing members secured to each other to provide an enclosure. A feedthrough electrically insulated from the casing and from the casing and extending there from through a glass-to-metal seal, at least one anode electrically connected within the casing, a cathode, and an electrolyte. The cathode is of a cathode active material deposited on planar faces of the first and second casing members.

    Abstract translation: 描述包括由低温法研磨的阳极材料构成的阳极的电解电容器。 低温研磨工艺制备用于阳极制造的活性阳极材料。 电容器还包括彼此固定以提供外壳的第一和第二壳体构件的壳体。 一种馈电线,其与所述壳体和所述壳体电绝缘,并通过玻璃 - 金属密封件延伸,至少一个阳极电连接在所述壳体内,阴极和电解质。 阴极是沉积在第一和第二壳体构件的平面上的阴极活性材料。

    SHIELDED THREE-TERMINAL FLAT-THROUGH EMI/ENERGY DISSIPATING FILTER WITH CO-FIRED HERMETICALLY SEALED FEEDTHROUGH
    30.
    发明申请
    SHIELDED THREE-TERMINAL FLAT-THROUGH EMI/ENERGY DISSIPATING FILTER WITH CO-FIRED HERMETICALLY SEALED FEEDTHROUGH 有权
    屏蔽式三端平板式EMI /能量消毒滤波器,具有密集的密封功能

    公开(公告)号:US20160151635A1

    公开(公告)日:2016-06-02

    申请号:US14556239

    申请日:2014-12-01

    Abstract: A hermetic terminal assembly for an AIMD includes a shielded three-terminal flat-through EMI energy dissipating filter and a hermetically sealed feedthrough configured to be attachable to the ferrule or AIMD housing. The flat-through filter includes a first shield plate, an active electrode plate, and a second shield plate where the shield plates are electrically coupled to a metallization which in turn is coupled either to the ferrule or AIMD housing. The feedthrough includes an alumina substrate comprised of at least 96% alumina and a via hole with a substantially closed pore and substantially pure platinum fill. The platinum fill forms a tortuous and mutually conformal knitline or interface between the alumina substrate and the platinum fill, wherein the platinum fill is electrically coupled to at least one active electrode plate in non-conductive relationship to the at least one first and second shield plates.

    Abstract translation: 用于AIMD的密封端子组件包括屏蔽的三端子平通EMI消散滤波器和被配置为可附接到套圈或AIMD壳体的密封馈通。 平通过滤器包括第一屏蔽板,有源电极板和第二屏蔽板,其中屏蔽板电耦合到金属化,金属化层又连接到套圈或AIMD壳体。 馈通包括由至少96%的氧化铝组成的氧化铝衬底和具有基本上闭孔的通孔和基本上纯的铂填充物。 铂填充物在氧化铝基底和铂填充物之间形成曲折且相互共形的编织物或界面,其中铂填充物与非至少一个第一和第二屏蔽板的非导电关系电耦合到至少一个有源电极板 。

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