公开(公告)号：US20130119232A1

公开(公告)日：2013-05-16

申请号：US13662264

申请日：2012-10-26

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: G01J1/26 ,  G21K5/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

公开(公告)号：US20240044710A1

公开(公告)日：2024-02-08

申请号：US18482411

申请日：2023-10-06

Applicant: GIGAPHOTON INC.

Inventor： Natsuhiko KOUNO ,  Masato MORIYA

IPC: G01J3/45 ,  G01J3/18

CPC classification number: G01J3/45 ,  G01J3/18

Abstract: A deterioration evaluation method of a line sensor includes detecting an interference fringe of pulse laser light using the line sensor; calculating, based on a signal value obtained from each of a plurality of sensor channels included in a sensor channel range being at least a part of the line sensor in accordance with light intensity of the interference fringe, an evaluation value which is an index of deterioration for each of the sensor channels or each group of the sensor channels, and storing the evaluation value in a storage device; and determining a deterioration state of the line sensor based on the evaluation value.

公开(公告)号：US20150334814A1

公开(公告)日：2015-11-19

申请号：US14327401

申请日：2014-07-09

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G02B19/00 ,  H01S3/00

CPC classification number: H05G2/008 ,  B23K26/06 ,  G02B19/009 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2316

Abstract: A device is provided for controlling a laser beam. The device may include a first wavefront adjuster provided in a beam path of a laser beam outputted from a laser apparatus, a beam delivery unit provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster provided in a beam path of the laser beam from the beam delivery unit, a beam monitor provided in a beam path of the laser beam from the second wavefront adjuster, and a controller configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

Abstract translation: 提供了一种用于控制激光束的装置。 该装置可以包括设置在从激光装置输出的激光束的光束路径中的第一波前调整器，设置在来自第一波前调整器的激光束的光束路径中的光束传递单元，设置在光束中的第二波前调整器 来自光束传送单元的激光束的路径，设置在来自第二波前调整器的激光束的光束路径中的光束监视器，以及控制器，被配置为基于光束监视器的检测结果来控制第一和第二波前调整器 。 还提供了包括该装置的极紫外光装置。

公开(公告)号：US20150123018A1

公开(公告)日：2015-05-07

申请号：US14590833

申请日：2015-01-06

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: G01J1/4257 ,  G01J1/0429 ,  G01J1/429 ,  G01J1/44 ,  G01J9/00 ,  G03F7/70258 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。

公开(公告)号：US20130240762A1

公开(公告)日：2013-09-19

申请号：US13873001

申请日：2013-04-29

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYSHI ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Akira ENDO ,  Akira SUMITANI

IPC: G21K5/04

CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

公开(公告)号：US20130126762A1

公开(公告)日：2013-05-23

申请号：US13742276

申请日：2013-01-15

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Hiroshi KOMORI ,  Takeshi ASAYAMA

IPC: H05G2/00

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.

Abstract translation: 能够防止在室内移动的碎屑减少EUV收集镜等的光学元件的反射率或透射率的极端紫外线光源装置，能够长时间稳定地产生极紫外光。 该装置包括：目标供给单元，用于将目标供给到室内的预定位置; 用于将激光束施加到所述靶以产生第一等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集从第一等离子体辐射的极紫外光; 气体供应单元，用于将气体供应到所述室中; 用于激发气体以在产生第一等离子体的区域周围产生第二等离子体的激励单元; 以及排气单元，用于排出室并将从第一等离子体发射的碎屑喷射到室外。