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公开(公告)号：US20180253010A1
公开(公告)日：2018-09-06
申请号：US15971073
申请日：2018-05-04
Applicant: Gigaphoton Inc.
Inventor： Hirokazu HOSODA , Tamotsu ABE
CPC classification number: G03F7/70033 , G03F7/20 , H01J37/32339 , H05G2/008
Abstract: An extreme ultraviolet light generating apparatus, may include: a chamber, in which extreme ultraviolet light is generated by plasma being generated in the interior thereof; a window provided in a wall of the chamber; a light source provided at the exterior of the chamber, configured to output illuminating light to the interior of the chamber via the window; a light sensor, configured to detect the illuminating light which is output to the interior of the chamber via the window; a shielding member having an opening that the illuminating light may pass through, that shields the window from emissions from the plasma, provided in the interior of the chamber; and a mirror provided along an optical path of the illuminating light in the interior of the chamber between the window and the shielding member, having a reflective surface that reflects the illuminating light, constituted by a surface of a metal layer.
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公开(公告)号：US20180146536A1
公开(公告)日：2018-05-24
申请号：US15860137
申请日：2018-01-02
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Tamotsu ABE , Osamu WAKABAYASHI , Tatsuya YANAGIDA
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
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公开(公告)号：US20170055336A1
公开(公告)日：2017-02-23
申请号：US15347716
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在蚀刻气体通过的室的蚀刻气体引入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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公开(公告)号：US20170215267A1
公开(公告)日：2017-07-27
申请号：US15480400
申请日：2017-04-06
Applicant: GIGAPHOTON INC.
Inventor： Tamotsu ABE , Yoshifumi UENO , Hirokazu HOSODA , Takashi SAITO
Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
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公开(公告)号：US20170064800A1
公开(公告)日：2017-03-02
申请号：US15347241
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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Patent Agency Ranking
6.发明申请公开(公告)号：US20160135276A1
公开(公告)日：2016-05-12
申请号：US14995636
申请日：2016-01-14
Applicant: Gigaphoton Inc.
Inventor： Tamotsu ABE , Osamu WAKABAYASHI
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.
Abstract translation: 极紫外光发生装置可以包括：腔室; 目标产生单元，被配置为将目标输出到所述室内的预定区域; 配置成将脉冲激光束集中到所述预定区域的聚焦光学系统; 以及多个散射光检测器，每个散射光检测器被配置为检测由脉冲激光束照射的来自目标的散射光。 所述极紫外光发生装置还可以包括：光路变换器，被配置为改变所述脉冲激光束的光路; 以及光路控制器，被配置为基于多个散射光检测器的检测结果来控制光路变换器。
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公开(公告)号：US20140034759A1
公开(公告)日：2014-02-06
申请号：US13953350
申请日：2013-07-29
Applicant: GIGAPHOTON INC.
Inventor： Takayuki YABU , Tamotsu ABE
IPC: G03F7/20
CPC classification number: G03F7/2004 , B05B5/0255 , B05B5/0531 , B05B12/02 , G03F7/70033 , H05G2/003
Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
Abstract translation: 目标供给方法使用包括具有喷嘴的目标产生单元，具有压力传感器和致动器的压力控制单元，电极，潜在施加单元和定时器的目标供给装置; 此外，该方法包括：通过致动器将目标产生单元内的压力升高到设定压力，在检测到内部的压力的情况下，通过潜在施加单元在电极和目标材料之间施加不同的电位 目标产生单元中途升高到设定压力，并且通过潜在施加单元向目标材料施加恒定的第一电位和第一脉冲电压，以在检测到的情况下用静电力提取目标材料 目标产生单元内的压力已升至设定压力。
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公开(公告)号：US20140001369A1
公开(公告)日：2014-01-02
申请号：US13958112
申请日：2013-08-02
Applicant: Gigaphoton Inc.
Inventor： Toshihiro NISHISAKA , Yukio WATANABE , Tamotsu ABE , Osamu WAKABAYASHI
IPC: H05G2/00
CPC classification number: H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
Abstract translation: 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。
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公开(公告)号：US20180240562A1
公开(公告)日：2018-08-23
申请号：US15953774
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Tamotsu ABE , Kenichi MIYAO , Tooru ABE
CPC classification number: G21K1/062 , G03F7/20 , G03F7/70033 , G03F7/70525 , G03F7/7055 , G03F7/7085 , H05G2/008
Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
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公开(公告)号：US20170094767A1
公开(公告)日：2017-03-30
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Shinji NAGAI , Yoshifumi UENO , Tamotsu ABE
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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