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公开(公告)号：US06424471B1
公开(公告)日：2002-07-23
申请号：US09711256
申请日：2000-11-10
申请人： Willi Ulrich , Helmut Beierl
发明人： Willi Ulrich , Helmut Beierl
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225
摘要： A catadioptric projection objective comprises an object plane, a physical beam splitter, a concave mirror, an image plane, a first objective part, a second objective part, and a third objective part. The first objective part is located between the object plane and the physical beam splitter. The second objective part is located between the physical beam splitter and the concave mirror, and includes at least two divergent lenses. The third objective part is located between the physical beam splitter and the image plane.
摘要翻译： 反射折射投影物镜包括物平面，物理分束器，凹面镜，图像平面，第一物镜部分，第二物镜部分和第三物镜部分。 第一个目标部分位于物平面和物理分束器之间。 第二目标部分位于物理分束器和凹面镜之间，并且包括至少两个发散透镜。 第三目标部分位于物理分束器和图像平面之间。
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公开(公告)号：US20130182234A1
公开(公告)日：2013-07-18
申请号：US13786134
申请日：2013-03-05
申请人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
发明人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。
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公开(公告)号：US07187503B2
公开(公告)日：2007-03-06
申请号：US11011610
申请日：2004-12-15
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有 提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。 束束狭窄收缩的收缩位置位于腰部区域。 在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。 本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。
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公开(公告)号：US07136220B2
公开(公告)日：2006-11-14
申请号：US10805393
申请日：2004-03-22
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译： 一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二 透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。 物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。 分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。
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25.发明申请公开(公告)号：US20050157400A1
公开(公告)日：2005-07-21
申请号：US11079225
申请日：2005-03-15
CPC分类号： G02B17/0892 , G02B3/14 , G02B13/143 , G02B13/18 , G02B17/08 , G03F7/70225 , G03F7/70241 , G03F7/70883 , G03F7/70933
摘要： A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.
摘要翻译： 投影物镜具有至少五个透镜组（G 1至G 5）并且具有多个透镜表面。 至少两个非球面透镜表面被布置成相互相邻。 这些相互相邻布置的透镜表面被表征为双重非球面。 该至少一个双重非球面（21）安装在距物镜的最大透镜直径（D 2）大的图像平面（0'）的最小距离处。
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公开(公告)号：US06903802B2
公开(公告)日：2005-06-07
申请号：US10702501
申请日：2003-11-07
IPC分类号： G02B13/24 , G02B3/14 , G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , H01L21/027 , G03B27/54 , G02B3/00 , G03B27/42
CPC分类号： G02B17/0892 , G02B3/14 , G02B13/143 , G02B13/18 , G02B17/08 , G03F7/70225 , G03F7/70241 , G03F7/70883 , G03F7/70933
摘要： A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.
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公开(公告)号：US06717746B2
公开(公告)日：2004-04-06
申请号：US10152290
申请日：2002-05-22
申请人： Alexander Epple , Helmut Beierl
发明人： Alexander Epple , Helmut Beierl
IPC分类号： G02B1708
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric first section (5) having a concave mirror (6) and a beam-deflection device (7), and a dioptric second section (8) that commences after the beam-deflection device. The system is configured such that the intermediate image follows the first lens (17) of the dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflection device helps to avoid imaging aberrations.
摘要翻译： 一种反射折射投影透镜，被配置用于将形成在物平面（2）中的图案成像到图像平面（4）上同时创建单个实际中间图像（3），具有反射折射率第一部分（5），其具有凹面镜 ）和光束偏转装置（7）以及在光束偏转装置之后开始的屈光度第二部分（8）。 该系统构造成使得中间图像跟随折射部分（8）的第一透镜（17），并且优选地容易接近。 在光束偏转装置的最终反射表面之后的较远的距离处，将折射部分的一对透镜（17,21）之间的中间图像排列有助于避免成像像差。
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公开(公告)号：US20080316456A1
公开(公告)日：2008-12-25
申请号：US12194005
申请日：2008-08-19
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译： 投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统 用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。 第二透镜系统最多有五个透镜。
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公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有 提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。 束束狭窄收缩的收缩位置位于腰部区域。 在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。 本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。
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公开(公告)号：US07006304B2
公开(公告)日：2006-02-28
申请号：US10772310
申请日：2004-02-06
申请人： Alexander Epple , Helmut Beierl
发明人： Alexander Epple , Helmut Beierl
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric imaging group (5) having a concave mirror (6) and a beam-deflector (7), and a dioptric imaging lens group (20) that commences after the beam-deflector. The system is configured such that the intermediate image follows the first lens (17) of a dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflector helps to avoid imaging aberrations.
摘要翻译： 一种反射折射投影透镜，其被配置用于在形成单个实际中间图像（3）的同时，将布置在物平面（2）中的图案成像到图像平面（4）上，具有反射折射成像组（5），其具有凹面镜 ）和光束偏转器（7）以及在光束偏转器之后开始的屈光成像透镜组（20）。 该系统构造成使得中间图像遵循折射部分（8）的第一透镜（17）并且优选地容易接近。 在中心图像之间布置中心图像，两者在光束部分的一对透镜（17,21）之间并且在光束偏转器的最终反射表面之后的较远距离处有助于避免成像像差。
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