摘要:
A system for multiple mode imaging is disclosed. The catadioptric system has an NA greater than 0.65, and preferably greater than 0.9, highly corrected for low and high order monochromatic aberrations. The system employs unique illumination entrances and optics to collect reflected, diffracted, and scattered light over a range of angles. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric elements at any angle from 0 to 85 degrees from vertical. The system may employ a relayed pupil plane, used to select different imaging modes, provide simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.
摘要:
A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric first section (5) having a concave mirror (6) and a beam-deflection device (7), and a dioptric second section (8) that commences after the beam-deflection device. The system is configured such that the intermediate image follows the first lens (17) of the dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflection device helps to avoid imaging aberrations.
摘要:
An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要:
An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.