Zero-misalignment via-pad structures

    公开(公告)号:US10187998B2

    公开(公告)日:2019-01-22

    申请号:US15621403

    申请日:2017-06-13

    Abstract: A photoresist is deposited on a seed layer on a substrate. A first region of the photoresist is removed to expose a first portion of the seed layer to form a via-pad structure. A first conductive layer is deposited onto the first portion of the seed layer. A second region of the photoresist adjacent to the first region is removed to expose a second portion of the seed layer to form a line. A second conductive layer is deposited onto the first conductive layer and the second portion of the seed layer.

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