公开(公告)号：US20240063091A1

公开(公告)日：2024-02-22

申请号：US17891735

申请日：2022-08-19

申请人： Intel Corporation

发明人： Adel Elsherbini ,  Feras Eid ,  Scot Kellar ,  Yoshihiro Tomita ,  Rajiv Mongia ,  Kimin Jun ,  Shawna Liff ,  Wenhao Li ,  Johanna Swan ,  Bhaskar Jyoti Krishnatreya ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Lei Jiang ,  Xavier Brun ,  Mohammad Enamul Kabir ,  Haris Khan Niazi ,  Jiraporn Seangatith ,  Thomas Sounart

IPC分类号： H01L23/473 ,  H01L23/00 ,  H01L25/065 ,  H01L23/367 ,  H01L23/373

CPC分类号： H01L23/473 ,  H01L24/08 ,  H01L25/0652 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L23/3677 ,  H01L23/3675 ,  H01L23/3732 ,  H01L23/3738 ,  H01L2924/3511 ,  H01L2224/08145 ,  H01L2224/08121 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2924/182 ,  H01L2924/186

摘要： Microelectronic devices, assemblies, and systems include a multichip composite device having one or more chiplets bonded to a base die and an inorganic dielectric material adjacent the chiplets and over the base die. The multichip composite device is coupled to a structural member that is made of or includes a heat conducting material, or has integrated fluidic cooling channels to conduct heat from the chiplets and the base die.

公开(公告)号：US20220102305A1

公开(公告)日：2022-03-31

申请号：US17032469

申请日：2020-09-25

申请人： Intel Corporation

发明人： Bhaskar Jyoti Krishnatreya ,  Nagatoshi Tsunoda ,  Shawna M. Liff ,  Sairam Agraharam

IPC分类号： H01L23/00 ,  H01L25/065 ,  H01L23/367 ,  H01L23/31 ,  H01L23/538 ,  H01L21/48 ,  H01L21/56 ,  H01L25/00

摘要： Disclosed herein are structures and techniques related to singulation of microelectronic components with direct bonding interfaces. For example, in some embodiments, a microelectronic component may include: a surface, wherein conductive contacts are at the surface; a trench at a perimeter of the surface; and a burr in the trench.

公开(公告)号：US12119317B2

公开(公告)日：2024-10-15

申请号：US17032469

申请日：2020-09-25

申请人： Intel Corporation

发明人： Bhaskar Jyoti Krishnatreya ,  Nagatoshi Tsunoda ,  Shawna M. Liff ,  Sairam Agraharam

IPC分类号： H01L23/00 ,  H01L21/48 ,  H01L21/56 ,  H01L23/31 ,  H01L23/367 ,  H01L23/538 ,  H01L25/00 ,  H01L25/065

CPC分类号： H01L24/08 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/565 ,  H01L23/3128 ,  H01L23/367 ,  H01L23/5383 ,  H01L23/5386 ,  H01L24/05 ,  H01L24/80 ,  H01L25/0652 ,  H01L25/50 ,  H01L2224/05147 ,  H01L2224/08145 ,  H01L2224/0823 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2225/06541 ,  H01L2225/06586

摘要： Disclosed herein are structures and techniques related to singulation of microelectronic components with direct bonding interfaces. For example, in some embodiments, a microelectronic component may include: a surface, wherein conductive contacts are at the surface; a trench at a perimeter of the surface; and a burr in the trench.

公开(公告)号：US20240063147A1

公开(公告)日：2024-02-22

申请号：US17891704

申请日：2022-08-19

申请人： Intel Corporation

发明人： Adel Elsherbini ,  Mohammad Enamul Kabir ,  Johanna Swan ,  Omkar Karhade ,  Kimin Jun ,  Feras Eid ,  Shawna Liff ,  Xavier Brun ,  Bhaskar Jyoti Krishnatreya ,  Tushar Talukdar ,  Haris Khan Niazi

IPC分类号： H01L23/00 ,  H01L25/065 ,  H01L21/56 ,  H01L23/31 ,  H01L23/29

CPC分类号： H01L23/564 ,  H01L24/08 ,  H01L24/24 ,  H01L25/0652 ,  H01L24/19 ,  H01L21/56 ,  H01L23/3107 ,  H01L23/291 ,  H01L2224/08145 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2924/37001 ,  H01L2224/24145 ,  H01L24/73 ,  H01L2224/73259 ,  H01L2224/24225 ,  H01L2224/73209 ,  H01L2224/2499

摘要： Techniques and mechanisms to mitigate corrosion to via structures of a composite chiplet. In an embodiment, a composite chiplet comprises multiple integrated circuit (IC) components which are each in a different respective one of multiple levels. One or more conductive vias extend through an insulator layer in a first level of the multiple levels. An annular structure of the composite chiplet extends vertically through the insulator layer, and surrounds the one or more conductive vias in the insulator layer. The annular structure mitigates an exposure of the one or more conductive vias to moisture which is in a region of the insulator layer that is not surrounded by the annular structure. In another embodiment, the annular structure further surrounds an IC component which extends in the insulator layer.

公开(公告)号：US20240063076A1

公开(公告)日：2024-02-22

申请号：US17891727

申请日：2022-08-19

申请人： Intel Corporation

发明人： Mohammad Enamul Kabir ,  Bhaskar Jyoti Krishnatreya ,  Kimin Jun ,  Adel Elsherbini ,  Tushar Talukdar ,  Feras Eid ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Xavier Brun

IPC分类号： H01L23/367 ,  H01L23/00 ,  H01L23/373 ,  H01L23/48 ,  H01L25/065

CPC分类号： H01L23/367 ,  H01L24/08 ,  H01L23/3736 ,  H01L23/373 ,  H01L23/3732 ,  H01L23/481 ,  H01L24/32 ,  H01L24/29 ,  H01L25/0657 ,  H01L2224/08145 ,  H01L2224/32225 ,  H01L2224/29147 ,  H01L2224/29124 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/29193 ,  H01L2224/29186

摘要： Microelectronic devices, assemblies, and systems include a multichip composite device having one or more integrated circuit dies bonded to a base die, a conformal thermal heat spreading layer on the top and sidewalls of the integrated circuit dies, and an inorganic dielectric material on a portion of the conformal thermal heat spreading layer, laterally adjacent the integrated circuit dies, and over the base die. The conformal thermal heat spreading layer includes a high thermal conductivity material to provide a thermal pathway for the integrated circuit dies during operation.

公开(公告)号：US20240063179A1

公开(公告)日：2024-02-22

申请号：US17821009

申请日：2022-08-19

申请人： Intel Corporation

发明人： Adel A. Elsherbini ,  Krishna Vasanth Valavala ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Debendra Mallik ,  Feras Eid ,  Xavier Francois Brun ,  Bhaskar Jyoti Krishnatreya

IPC分类号： H01L25/065 ,  H01L25/00 ,  H01L23/00 ,  H01L21/56

CPC分类号： H01L25/0652 ,  H01L25/50 ,  H01L24/20 ,  H01L24/08 ,  H01L21/568 ,  H01L24/19 ,  H01L24/06 ,  H01L2224/221 ,  H01L2224/211 ,  H01L2224/08225 ,  H01L2224/19 ,  H01L2224/0612 ,  H01L2224/06181 ,  H01L24/13 ,  H01L2224/13025 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2924/381

摘要： Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a dielectric layer having one or more conductive traces and a surface; a microelectronic subassembly on the surface of the dielectric layer, the microelectronic subassembly including a first die and a through-dielectric via (TDV) surrounded by a dielectric material, wherein the first die is at the surface of the dielectric layer; a second die and a third die on the first die and electrically coupled to the first die by interconnects having a pitch of less than 10 microns, and wherein the TDV is electrically coupled at a first end to the dielectric layer and at an opposing second end to the second die; and a substrate on and coupled to the second and third dies; and an insulating material on the surface of the dielectric layer and around the microelectronic subassembly.

公开(公告)号：US20240061194A1

公开(公告)日：2024-02-22

申请号：US17821019

申请日：2022-08-19

申请人： Intel Corporation

发明人： Adel A. Elsherbini ,  David Hui ,  Haris Khan Niazi ,  Wenhao Li ,  Bhaskar Jyoti Krishnatreya ,  Henning Braunisch ,  Shawna M. Liff ,  Jiraporn Seangatith ,  Johanna M. Swan ,  Krishna Vasanth Valavala ,  Xavier Francois Brun ,  Feras Eid

IPC分类号： G02B6/42

CPC分类号： G02B6/4274 ,  G02B6/4204

摘要： Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include an interconnect die in a first layer surrounded by a dielectric material; a processor integrated circuit (processor IC) and an integrated circuit (IC) in a second layer, the second layer on the first layer, wherein the interconnect die is electrically coupled to the processor IC and the IC by first interconnects having a pitch of less than 10 microns between adjacent first interconnects; a photonic integrated circuit (PIC) and a substrate in a third layer, the third layer on the second layer, wherein the PIC has an active surface, and wherein the active surface of the PIC is coupled to the IC by second interconnects having a pitch of less than 10 microns between adjacent second interconnects; and a fiber connector optically coupled to the active surface of the PIC.

公开(公告)号：US20240063180A1

公开(公告)日：2024-02-22

申请号：US17891654

申请日：2022-08-19

申请人： Intel Corporation

发明人： Kimin Jun ,  Adel Elsherbini ,  Omkar Karhade ,  Bhaskar Jyoti Krishnatreya ,  Mohammad Enamul Kabir ,  Jiraporn Seangatith ,  Tushar Talukdar ,  Shawna Liff ,  Johanna Swan ,  Feras Eid

IPC分类号： H01L25/065 ,  H01L25/00 ,  H01L21/48 ,  H01L23/13 ,  H01L23/31

CPC分类号： H01L25/0652 ,  H01L25/50 ,  H01L21/4857 ,  H01L23/13 ,  H01L23/3185 ,  H01L24/05

摘要： Quasi-monolithic multi-die composites including a primary fill structure within a space between adjacent IC dies. A fill material layer, which may have inorganic composition, may be bonded to a host substrate and patterned to form a primary fill structure that occupies a first portion of the host substrate. IC dies may be bonded to regions of the host substrate within openings where the primary fill structure is absent to have a spatial arrangement complementary to the primary fill structure. The primary fill structure may have a thickness substantially matching that of IC dies and/or be co-planar with a surface of one or more of the IC dies. A gap fill material may then be deposited within remnants of the openings to form a secondary fill structure that occupies space between the IC dies and the primary fill structure.

公开(公告)号：US20240063071A1

公开(公告)日：2024-02-22

申请号：US17891880

申请日：2022-08-19

申请人： Intel Corporation

发明人： Jeffery Bielefeld ,  Adel Elsherbini ,  Bhaskar Jyoti Krishnatreya ,  Feras Eid ,  Gauri Auluck ,  Kimin Jun ,  Mohammad Enamul Kabir ,  Nagatoshi Tsunoda ,  Renata Camillo-Castillo ,  Tristan A. Tronic ,  Xavier Brun

IPC分类号： H01L23/31 ,  H01L25/065 ,  H01L23/00 ,  H01L23/367 ,  H01L23/498 ,  H01L21/48 ,  H01L21/56 ,  H01L25/00

CPC分类号： H01L23/3128 ,  H01L25/0655 ,  H01L24/08 ,  H01L23/367 ,  H01L23/49827 ,  H01L23/49838 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L24/80 ,  H01L25/50 ,  H01L2224/08225 ,  H01L2224/80895 ,  H01L2224/80896

摘要： Multi-die composite structures including a multi-layered inorganic dielectric gap fill material within a space between adjacent IC dies. A first layer of fill material with an inorganic composition may be deposited over IC dies with a high-rate deposition process, for example to at least partially fill a space between the IC dies. The first layer of fill material may then be partially removed to modify a sidewall slope of the first layer or otherwise reduce an aspect ratio of the space between the IC dies. Another layer of fill material may be deposited over the lower layer of fill material, for example with the same high-rate deposition process. This dep-etch-dep cycle may be repeated any number of times to backfill spaces between IC dies. The multi-layer fill material may then be globally planarized and the IC die package completed and/or assembled into a next-level of integration.

公开(公告)号：US20240063066A1

公开(公告)日：2024-02-22

申请号：US17891665

申请日：2022-08-19

申请人： Intel Corporation

发明人： Omkar G. Karhade ,  Tomita Yoshihiro ,  Adel A. Elsherbini ,  Bhaskar Jyoti Krishnatreya ,  Tushar Talukdar ,  Haris Khan Niazi ,  Yi Shi ,  Batao Zhang ,  Wenhao Li ,  Feras Eid

IPC分类号： H01L23/04 ,  H01L25/065 ,  H01L23/18 ,  H01L23/00 ,  H01L23/48 ,  H01L23/46 ,  H01L23/367

CPC分类号： H01L23/041 ,  H01L25/0652 ,  H01L23/18 ,  H01L24/08 ,  H01L23/481 ,  H01L23/46 ,  H01L23/367 ,  H01L2224/08145 ,  H01L2224/05599 ,  H01L24/05 ,  H01L2224/80379 ,  H01L24/80 ,  H01L2224/16227 ,  H01L24/16 ,  H01L2224/32225 ,  H01L24/32 ,  H01L2224/73204 ,  H01L24/73 ,  H01L2224/131 ,  H01L24/13 ,  H01L2224/29099 ,  H01L24/29

摘要： Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die having a surface; a template structure having a first surface and an opposing second surface, wherein the first surface of the template structure is coupled to the surface of the first die, and wherein the template structure includes a cavity at the first surface and a through-template opening extending from a top surface of the cavity to the second surface of the template structure; and a second die within the cavity of the template structure and electrically coupled to the surface of the first die by interconnects having a pitch of less than 10 microns between adjacent interconnects.