Light beam scanner with foreign matter removing feature
    22.
    发明授权
    Light beam scanner with foreign matter removing feature 失效
    光束扫描器具有异物去除功能

    公开(公告)号:US5046797A

    公开(公告)日:1991-09-10

    申请号:US322872

    申请日:1989-03-14

    IPC分类号: G02B26/12 G02B27/00

    CPC分类号: G02B27/0006 G02B26/121

    摘要: A light beam scanner which is adapted to reflect optical beams by a rotary polygonal mirror provided adjacent a free end portion of a rotary shaft which is supported rotatably by a bearing, thereby performing scanning, the rotary polygonal mirror is covered with a protective cover, the protective cover being provided with a gas-inlet opening capable of introducing gas into the inside of the protective cover and a gas-outlet opening with the rotary shaft loosely-fitted therein, the gas-outlet opening permitting a discharge of gas from the inside of the protection cover. Accordingly, any deposition of oil mist which may leak from the bearing on the rotary polygonal mirror can be prevented by producing a gas-flow stream which travels from the gas-inlet opening to the gas-outlet opening.

    摘要翻译: 一种光束扫描器,其适于通过旋转多面镜反射光束,所述旋转多面镜邻近由轴承可旋转地支撑的旋转轴的自由端部设置,从而进行扫描,所述旋转多面镜被保护盖覆盖, 保护罩设置有能够将气体引入保护罩的内部的气体入口和带有松动地配合在其中的旋转轴的气体出口,气体出口开口允许从内部排出气体 防护罩。 因此,可以通过产生从气体入口到气体出口开口的气流来防止可能从旋转多面镜上的轴承泄漏的油雾沉积。

    Process for preparing photoconductive particles
    23.
    发明授权
    Process for preparing photoconductive particles 失效
    光电导颗粒的制备方法

    公开(公告)号:US4381338A

    公开(公告)日:1983-04-26

    申请号:US188229

    申请日:1980-09-17

    申请人: Kiyoshi Suzuki

    发明人: Kiyoshi Suzuki

    CPC分类号: H01L31/18 G03G5/08 G03G5/087

    摘要: Photoconductive particles are prepared by the reaction of a water-soluble metal salt with an ion exchange resin having an anion which reacts with the metal ion of the water-soluble metal salt to produce a water insoluble metal compound and the deposition of the water insoluble metal compound resulting from the reaction on the surface of the photoconductive particles.

    摘要翻译: 通过水溶性金属盐与具有与水溶性金属盐的金属离子反应的阴离子的离子交换树脂的反应来制备光导颗粒,以产生水不溶性金属化合物和沉积不溶于水的金属 由光电导表面上的反应产生的化合物。

    Cadmium sulfide for electrophotography
    24.
    发明授权
    Cadmium sulfide for electrophotography 失效
    用于电子照相的硫化镉

    公开(公告)号:US4316947A

    公开(公告)日:1982-02-23

    申请号:US184752

    申请日:1980-09-08

    IPC分类号: C01G11/02 G03G5/08 G03G5/087

    CPC分类号: C01G11/02 G03G5/08

    摘要: Cadium sulfide for electrophotography is produced by reacting hydrogen sulfide with a solution containing cadmium sulfate, sulfuric acid and hydrochloric acid of a low concentration, and then firing the resulting cadmium sulfide without adding a donor impurity other than that derived from the hydrochloric acid.

    摘要翻译: 通过使硫化氢与含有低浓度的硫酸镉,硫酸和盐酸的溶液反应,然后在不添加源自盐酸的供体杂质的情况下烧制所得到的硫化镉而制造电子照相用硫化硫。

    Method of optimizing process recipe of substrate processing system
    25.
    发明授权
    Method of optimizing process recipe of substrate processing system 有权
    基板处理系统工艺配方优化方法

    公开(公告)号:US08082054B2

    公开(公告)日:2011-12-20

    申请号:US12760017

    申请日:2010-04-14

    IPC分类号: G06F19/00

    摘要: The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译: 本发明是一种优化基板处理系统的工艺配方的方法,包括:基板处理装置,其根据处理配方进行待加工基板的成膜处理; 数据处理单元,其执行用于优化处理配方的计算; 和主机; 基板处理装置,数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤:测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时,发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令,将所需数据从基板处理装置发送到数据处理单元,使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方,以及基于计算结果更新基板处理装置中的处理配方。

    Method of optimizing process recipe of substrate processing system
    30.
    发明申请
    Method of optimizing process recipe of substrate processing system 有权
    基板处理系统工艺配方优化方法

    公开(公告)号:US20080086228A1

    公开(公告)日:2008-04-10

    申请号:US11905842

    申请日:2007-10-04

    IPC分类号: G06F19/00

    摘要: The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.

    摘要翻译: 本发明是一种优化基板处理系统的工艺配方的方法,包括:基板处理装置,其根据处理配方进行待加工基板的成膜处理; 数据处理单元,其执行用于优化处理配方的计算; 和主机; 基板处理装置,数据处理单元和主机通过网络彼此连接。 本发明包括以下步骤:测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时,发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令,将所需数据从基板处理装置发送到数据处理单元,使数据处理单元执行处理配方优化计算以计算最佳值 用于实现目标膜厚度的处理配方,以及基于计算结果更新基板处理装置中的处理配方。