公开(公告)号：US20150277223A1

公开(公告)日：2015-10-01

申请号：US14668335

申请日：2015-03-25

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Tomoki NAGAI

IPC: G03F7/004 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/0002 ,  C08F297/026 ,  C08K5/42 ,  C08L53/00 ,  G03F7/0035 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/36 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/31133 ,  H01L21/31138

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物和溶剂。 嵌段共聚物包括在嵌段共聚物的主链的至少一个末端具有反应性基团的基团。 图案形成方法包括使用该组合物直接或间接地在基底上提供定向的自组装膜。 定向自组装膜包括包括多个相的相分离结构。 去除定向自组装膜的多个相的一部分。

公开(公告)号：US20150225601A1

公开(公告)日：2015-08-13

申请号：US14620935

申请日：2015-02-12

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Tomoki NAGAI

IPC: C09D153/00 ,  B05D3/02 ,  B05D3/06 ,  B05D3/10

CPC classification number: C09D153/00 ,  B05D1/185 ,  C08F212/08 ,  C08F230/08 ,  C08F297/026 ,  G03F7/0002

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物和溶剂。 嵌段共聚物能够通过定向自组装形成相分离结构。 嵌段共聚物包括第一嵌段和第二嵌段。 第一块包括包含至少两个硅原子的第一重复单元。 第二块包括不包括硅原子的第二重复单元。 构成第一重复单元的原子的原子量之和不大于700。

公开(公告)号：US20150191829A1

公开(公告)日：2015-07-09

申请号：US14591323

申请日：2015-01-07

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Kaori SAKAI ,  Tomoki NAGAI

IPC: C23F1/02

CPC classification number: C23F1/02 ,  C08F297/02 ,  C09D153/00 ,  C23F1/12 ,  G03F7/0002 ,  H01L21/3081 ,  C08L83/04 ,  C08L25/08

Abstract: A pattern-forming method includes providing a metal-containing film directly or indirectly on a substrate. A directed self-assembling film is provided directly or indirectly on the metal-containing film such that a plurality of phases of the directed self-assembling film is formed. At least a part of the plurality of phases of the directed self-assembling film is removed such that a pattern of the directed self-assembling film is formed. The metal-containing film and the substrate are sequentially etched using the pattern of the directed self-assembling film as a mask.

Abstract translation: 图案形成方法包括直接或间接地在基底上提供含金属的膜。 直接或间接地在含金属膜上提供定向自组装膜，从而形成定向自组装膜的多个相。 定向自组装膜的多个相的至少一部分被去除，从而形成定向自组装膜的图案。 使用定向自组装膜的图案作为掩模，依次蚀刻含金属膜和基板。