公开(公告)号：US09195153B2

公开(公告)日：2015-11-24

申请号：US13692865

申请日：2012-12-03

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G03B27/52 ,  G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US20130128256A1

公开(公告)日：2013-05-23

申请号：US13692865

申请日：2012-12-03

申请人： Joeri LOF ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri LOF ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G03F9/00

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

摘要翻译： 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US07795603B2

公开(公告)日：2010-09-14

申请号：US12318036

申请日：2008-12-19

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G01N21/86 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

摘要翻译： 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US07482611B2

公开(公告)日：2009-01-27

申请号：US11371235

申请日：2006-03-09

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G01N21/86 ,  A61N5/00 ,  G03B27/42 ,  G02B1/06

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US20090184270A1

公开(公告)日：2009-07-23

申请号：US12318036

申请日：2008-12-19

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G01N21/86

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

摘要翻译： 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US08344341B2

公开(公告)日：2013-01-01

申请号：US12853030

申请日：2010-08-09

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G01N21/86 ,  A61N5/00 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US07193232B2

公开(公告)日：2007-03-20

申请号：US10705816

申请日：2003-11-12

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G01N21/86 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

摘要翻译： 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。

公开(公告)号：US20140071420A1

公开(公告)日：2014-03-13

申请号：US13903885

申请日：2013-05-28

申请人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

发明人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。

公开(公告)号：US08208123B2

公开(公告)日：2012-06-26

申请号：US10927531

申请日：2004-08-27

申请人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

发明人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC分类号： G03B27/54

CPC分类号： G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US20110126406A1

公开(公告)日：2011-06-02

申请号：US13020399

申请日：2011-02-03

申请人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

发明人： Hubert Adriaan VAN MIERLO ,  Erik Leonardus Ham ,  Hendricus Johannes Maria Meijer ,  Hendrik Antony Johannes Neerhof ,  Joost Jeroen Ottens ,  Johannes Adrianus Petrus Leijtens ,  Marco Le Kluse ,  Jan Hopman ,  Johannes Hubertus Josephina Moors

IPC分类号： H01B13/00

CPC分类号： H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.

摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。