STORAGE DEVICE AND STORAGE SYSTEM
    22.
    发明申请

    公开(公告)号:US20210149568A1

    公开(公告)日:2021-05-20

    申请号:US17121024

    申请日:2020-12-14

    Abstract: According to one embodiment, a storage device includes a stage on which a semiconductor wafer can be mounted, wherein data is capable of being read from the semiconductor wafer or data is capable of being written to the semiconductor wafer. The storage device further includes a plurality of probe pins for reading or writing data, and a controller connected the probe pins. The semiconductor wafer includes electrodes connectable to the probe pins, a first memory area that can store user data, and a second memory area that can store identification information for identification of the semiconductor wafer and a check code for checking integrity of the identification information. The controller is capable of reading the identification information and the check code from the second memory area.

    SEMICONDUCTOR MEMORY DEVICE
    23.
    发明申请

    公开(公告)号:US20220130754A1

    公开(公告)日:2022-04-28

    申请号:US17438728

    申请日:2019-03-19

    Abstract: A semiconductor memory device including: plural first conductive layers stacked on a substrate; plural second conductive layers each stacked between the first conductive layers; a pillar that extends in a stacking direction of the first and second conductive layers and forms plural memory cells at intersections of the first and second conductive layers in a region where first and second conductive layers are arranged; a first contact plug that extends in the stacking direction of the first and second conductive layers and is connected to the first conductive layers in the region where the first and second conductive layers are arranged; and a second contact plug that extends in the stacking direction of the first and second conductive layers and is connected to the second conductive layers in the region where the first conductive layers and second conductive layers are arranged.

    SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STORAGE DEVICE

    公开(公告)号:US20220085036A1

    公开(公告)日:2022-03-17

    申请号:US17190348

    申请日:2021-03-02

    Abstract: A semiconductor storage device includes first wiring layers stacked along a first direction, a first pillar including a first semiconductor layer and extending along the first direction through the first wiring layers, a second wiring layer disposed above the first pillar in the first direction and extending along a second direction perpendicular to the first direction, a semiconductor-containing layer including a first portion disposed on an upper end of the first pillar in the first direction, a second portion contacting the first portion and formed along the second wiring layer, and a third portion contacting an upper end of the second portion and extending along a third direction perpendicular to the first direction and crossing the second direction, and a first insulating layer between each of the first and second portions of the semiconductor-containing layer and the second wiring layer. An upper surface of the third portion contains a metal.

    SEMICONDUCTOR STORAGE DEVICE
    25.
    发明申请

    公开(公告)号:US20220068961A1

    公开(公告)日:2022-03-03

    申请号:US17188575

    申请日:2021-03-01

    Abstract: A semiconductor storage device includes first and second stacks, and first to fourth semiconductor layers. The first stack includes first conductive layers and first insulating layers alternately stacked in a first direction. The first semiconductor layer extends through the first stack. The second semiconductor layer extends in a second direction above the first stack and connected to the first semiconductor layer. The second stack includes second conductive layers and second insulating layers alternately stacked in the first direction. The first and second stacks are arranged in a third direction. The third semiconductor layer extends through the second stack. The fourth semiconductor layer extends in the second direction above the second stack and connected to the third semiconductor layer. A third conductive layer is in contact with upper surfaces of the second and fourth semiconductor layers. The second and fourth semiconductor layers are separated from each other in the third direction.

    SEMICONDUCTOR STORAGE DEVICE
    26.
    发明申请

    公开(公告)号:US20210296239A1

    公开(公告)日:2021-09-23

    申请号:US17172470

    申请日:2021-02-10

    Abstract: A semiconductor storage device includes a semiconductor substrate and a conductive layer separated from the semiconductor substrate in a first direction. The conductive layer extends in a second direction parallel to the semiconductor substrate. A semiconductor layer extends in the first direction through the conductive layer. A first contact extends in the first direction and is connected to a surface of the conductive layer facing away from the semiconductor substrate. A first insulating layer extends in the first direction, and a second insulating layer extends along the first insulating layer in the first direction. Each of the first and second insulating layers entirely overlaps with the first contact when viewed in the first direction.

    SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20210265386A1

    公开(公告)日:2021-08-26

    申请号:US17006656

    申请日:2020-08-28

    Abstract: A semiconductor storage device includes a stacked body, a first columnar portion, a second columnar portion, and second insulating layers. The stacked body includes a plurality of conductive layers and a plurality of first insulating layers alternately stacked in a first direction. The first columnar portion being in a first region, and the second columnar portion being in a second region. The first columnar penetrates the stacked body in the first direction and includes a semiconductor layer. The second columnar portion penetrates the stacked body in the first direction and includes an insulating layer thereon. The second insulating layers are between the second columnar portion and either the conductive layers or the first insulating layers. The insulating layer on the second columnar portion. The second insulating layers are between the insulating layer on the second columnar portion and one of the conductive layers or the first insulating layers.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210074638A1

    公开(公告)日:2021-03-11

    申请号:US17015868

    申请日:2020-09-09

    Abstract: In one embodiment, a semiconductor device includes a substrate including two element regions that extend in a first direction parallel to a surface of the substrate and are adjacent to each other in a second direction crossing the first direction. The device further includes an interconnection layer provided above the substrate. The device further includes an insulator provided between the substrate and the interconnection layer. The device further includes a plug extending in the second direction and in a third direction crossing the first and second directions in the insulator, provided on each of the element regions, and electrically connected to the element regions and the interconnection layer.

    SEMICONDUCTOR MEMORY DEVICE
    29.
    发明申请

    公开(公告)号:US20210043640A1

    公开(公告)日:2021-02-11

    申请号:US16986853

    申请日:2020-08-06

    Abstract: According to one embodiment, a semiconductor memory device includes: a plurality of first insulating layers; a plurality of first interconnect layers stacked alternately with the first insulating layers; a plurality of second interconnect layers arranged adjacently to the first interconnect layers; and a separation region including a plurality of first portions provided between the first interconnect layers and the second interconnect layers, and a plurality of second portions protruding from an outer periphery of each of the first portions. The second portions are linked to each other. The first interconnect layers and the second interconnect layers are separated from each other by the first portions and the linked second portions.

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