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21.发明授权Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask 失效化学放大抗蚀剂的透明度和曝光光的敏感性大于248纳米波长和形成掩模的工艺
公开(公告)号：US6030747A
公开(公告)日：2000-02-29
申请号：US124673
申请日：1998-07-29
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/111
摘要： Monomers expressed by the following general formula are polymerized so as to obtain a polymer, and the polymer and a photoacid generator are dissolved in a solvent so as to form a chemically amplified resist layer large in both transparency and sensitivity to ArF excimer laser light and improved in resolution. ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a bridged hydrocarbon group having the carbon number between 7 and 22, m equals 0 or 1, n equals 0 or 1 and R.sup.3 represents a hydrogen atom, a methyl group or an acetyl group.
摘要翻译： 聚合由以下通式表示的单体以获得聚合物，并将聚合物和光致酸产生剂溶解在溶剂中以形成对ArF准分子激光的透明度和灵敏度都大的改进的化学增幅抗蚀剂层，并且改进 在决议。 其中R 1表示氢原子或甲基，R 2表示碳原子数为7〜22的桥连烃基，m为0或1，n为0或1，R 3为氢原子，甲基或乙酰基 组。
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公开(公告)号：US5985522A
公开(公告)日：1999-11-16
申请号：US947100
申请日：1997-10-08
IPC分类号： C07C62/38 , C07C69/73 , C08F20/26 , C08F20/28 , C09D133/04 , C09D133/14 , G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , H01L21/027 , G03C5/00
CPC分类号： C08F20/28 , G03F7/0045 , G03F7/039
摘要： There is provided a photoresist including (a) a resin composed of a polymer having a compound represented with the following general formula [1] within a structural unit thereof, and (b) a photo acid generator. ##STR1## wherein R.sup.1 represents a hydrogen atom, R.sup.2 represents a divalent hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 and R.sup.4 represent a hydrocarbon group having a carbon number of 1 or 2, and R.sup.5 represents one of (a) a hydrocarbon group having a carbon number of 1 to 12, (b) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an alkoxy group having a carbon number of 1 to 12, and (c) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an acyl group having a carbon number of 1 to 13. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist makes it possible to form a fine pattern without resist residue, and has superior thermal stability.
摘要翻译： 提供一种光致抗蚀剂，其包含（a）在其结构单元内由具有由以下通式[1]表示的化合物的聚合物构成的树脂，和（b）光酸产生剂。 其中，R1表示氢原子，R2表示碳原子数为7〜13的碳原子数为2〜20的碳原子数为2〜20的二价烃基，碳原子数为1〜2的烃基， R5表示（a）碳数为1〜12的烃基，（b）碳数为1〜12的烃基，碳原子数为1〜12的烷氧基取代的烃基， （c）碳原子数为1〜12的烃基，碳原子数为1〜13的酰基取代。上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂使得可以形成没有抗蚀剂残留物的精细图案，并且具有优异的热稳定性。
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公开(公告)号：US5770346A
公开(公告)日：1998-06-23
申请号：US763055
申请日：1996-12-10
IPC分类号： C07C62/38 , C07C69/73 , C08F20/26 , C08F20/28 , C09D133/04 , C09D133/14 , G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , H01L21/027
CPC分类号： C08F20/28 , G03F7/0045 , G03F7/039
摘要： There is provided a photoresist including (a) a resin composed of a polymer having a compound represented with the following general formula �1! within a structural unit thereof, and (b) a photo acid generator. ##STR1## wherein R.sup.1 represents a hydrogen atom, R.sup.2 represents a divalent hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 and R.sup.4 represent a hydrocarbon group having a carbon number of 1 or 2, and R.sup.5 represents one of (a) a hydrocarbon group having a carbon number of 1 to 12, (b) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an alkoxy group having a carbon number of 1 to 12, and (c) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an acyl group having a carbon number of 1 to 13. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist makes it possible to form a fine pattern without resist residue, and has superior thermal stability.
摘要翻译： 提供一种光致抗蚀剂，其包含（a）在其结构单元内由具有由以下通式[1]表示的化合物的聚合物构成的树脂，和（b）光酸产生剂。 其中，R1表示氢原子，R2表示碳原子数为7〜13的碳原子数为2的烃基，R3表示碳原子数为4的碳原子数为4的烃基， 数1或2，R5代表（a）碳数为1至12的烃基，（b）碳数为1至12的烃基，并被碳数为烷氧基取代 为1〜12，（c）碳数为1〜12的烃基，碳原子数为1〜13的酰基所取代。上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂使得可以形成没有抗蚀剂残留物的精细图案，并且具有优异的热稳定性。
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24.发明授权(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it 有权（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法公开(公告)号：US08802798B2
公开(公告)日：2014-08-12
申请号：US12230485
申请日：2008-08-29
IPC分类号： C08F24/00 , C08F10/00 , C08F32/08 , C08F118/02 , C08F2/00
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 一种用于光刻的光致抗蚀剂材料，其使用220nm以下的光，其至少包含由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R1，R2，R3和R5各自 氢原子或甲基; R4是酸不稳定基团或脂环族烃基，脂环族烃基或烃基的特定子集之一; R6是氢原子或烃基或脂环烃基的特定子集之一; x，y和z是满足x + y + z = 1,0,0
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25.发明申请(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT 审中-公开（METH）丙烯酸衍生物，具有结构的聚合物和光催化组合物，以及使用其形成图案的方法公开(公告)号：US20110196122A1
公开(公告)日：2011-08-11
申请号：US13088311
申请日：2011-04-15
IPC分类号： C08F222/14
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 这里公开了使用220nm以下的光的光刻胶材料，该光致抗蚀剂材料至少包含由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R1，R2，R3 和R 5各自为氢原子或甲基; R4是酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有羧基或具有3〜 13个碳原子，其具有环氧基; R6为氢原子，碳原子数1〜12的烃基或碳原子数为7〜13的脂环族烃基，具有羧基; x，y和z是满足x + y + z = 1,0,0
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26.发明授权Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide 有权用于光波导形成的光敏树脂组合物，光波导和用于制造光波导的方法公开(公告)号：US07847017B2
公开(公告)日：2010-12-07
申请号：US12092679
申请日：2006-11-01
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
CPC分类号： G02B6/138 , C08F220/28 , C08F220/30 , C08L33/14 , C09D133/14
摘要： The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.
摘要翻译： 本发明的目的是提供一种光波导形成用感光性树脂组合物，其具有低的传输损耗并且可以以低成本形成具有高形状精度的波导图案; 光波导; 以及光波导的制造方法。 本发明提供一种光波导形成用感光性树脂组合物，其至少包含：至少含有具有环氧结构的（甲基）丙烯酸酯结构单元的聚合物和具有内酯结构的（甲基）丙烯酸酯结构单元和/或乙烯基 具有芳族结构的单体结构单元; 以及光固化发生器，其中核心层和包覆层中的一个或两个由固化产物形成。
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27.发明申请POLYMER OPTICAL WAVEGUIDE FORMING MATERIAL, POLYMER OPTICAL WAVEGUIDE AND MANUFACTURING METHOD OF POLYMER OPTICAL WAVEGUIDE 审中-公开聚合物光波导形成材料，聚合物光波导和聚合物光波导的制造方法公开(公告)号：US20100150506A1
公开(公告)日：2010-06-17
申请号：US12594029
申请日：2008-02-29
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
CPC分类号： G02B6/138 , C08F232/08 , C08G59/1444 , C08L63/00 , C09D145/00 , G02B6/1221 , C08L2666/22
摘要： There are provided polymer optical waveguide forming material, a polymer optical waveguide and a manufacturing method of the polymer optical waveguide which reduces transmission loss with good processability. The polymer optical waveguide forming material is comprised of a polymer containing norbornene-based structural units including a hydroxy group; a photoacid generator for generating acid by irradiation of an actinic ray; and a monomer component polymerized by acid generated by said photoacid generator.
摘要翻译： 提供聚合物光波导形成材料，聚合物光波导和聚合物光波导的制造方法，其以良好的加工性降低传输损耗。 聚合物光波导形成材料由含有羟基的降冰片烯类结构单元的聚合物构成; 用于通过光化射线照射产生酸的光致酸产生器; 和由所述光酸产生剂产生的酸聚合的单体组分。
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28.发明授权Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern 失效苯乙烯衍生物，苯乙烯聚合物，感光性树脂组合物和形成图案的方法公开(公告)号：US07439005B2
公开(公告)日：2008-10-21
申请号：US10590804
申请日：2005-02-25
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
CPC分类号： G03F7/0233 , C08F212/32 , C08K5/08 , G03F7/038 , G03F7/0382 , G03F7/0392 , C08L25/18 , C08F212/08 , C08F220/10
摘要： There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared using a polymer at least having a constitutional repeating unit represented by general formula II: wherein R1 represents hydrogen atom or methyl group; R2 to R9 independently represent hydrogen atom, halogen atom or alkyl group having 1 to 4 carbon atoms; X represents —CH═N—, —CONH—, —(CH2)n—CH═N— or —(CH2)n—CONH— and the N atom in X is bonded to a carbon atom in the benzene ring having AO— at an o-position; A represents hydrogen atom or a group being decomposed by an acid; and n represents a positive integer of 1 to 3.
摘要翻译： 公开了一种用于层间绝缘膜，表面保护膜等的感光性树脂组合物，其表现出优异的分辨率并且可以用碱性水溶液显影。 感光性树脂组合物使用至少具有由通式II表示的结构重复单元的聚合物制备，其中R 1表示氢原子或甲基; R 9至R 9独立地表示氢原子，卤素原子或具有1至4个碳原子的烷基; X表示-CH-N-，-CONH-， - （CH 2）n - ， - CH-N - 或 - （CH 2） NON原子，X中的N原子与O位的苯环中的碳原子键合; A表示氢原子或被酸分解的基团; n表示1〜3的正整数。
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29.发明授权(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it 有权（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法公开(公告)号：US07432035B2
公开(公告)日：2008-10-07
申请号：US11713791
申请日：2007-03-05
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 这里公开了使用220nm以下的光进行光刻的光致抗蚀剂材料，其包含至少由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R 1 R 2，R 3，R 5和R 5各自为氢原子或甲基; R 4是酸不稳定基团，具有7-13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7至13个碳原子的脂环族烃基，其具有羧基 ，或具有3〜13个碳原子的烃基，具有环氧基; R 6是氢原子，具有1〜12个碳原子的烃基或具有7〜13个碳原子的脂环族烃基，其具有羧基; x，y和z是满足x + y + z = 1,0,0
是氢原子或甲基，R 9是具有脂环族内酯结构的7-16个碳原子的烃基。 -
30.发明申请(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it 有权（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法公开(公告)号：US20070218403A1
公开(公告)日：2007-09-20
申请号：US11713791
申请日：2007-03-05
IPC分类号： G03C1/73 , C08F118/02
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 这里公开了使用220nm以下的光进行光刻的光致抗蚀剂材料，其包含至少由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R 1 R 2，R 3，R 5和R 5各自为氢原子或甲基; R 4是酸不稳定基团，具有7-13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7至13个碳原子的脂环族烃基，其具有羧基 ，或具有3〜13个碳原子的烃基，具有环氧基; R 6是氢原子，具有1〜12个碳原子的烃基或具有7〜13个碳原子的脂环族烃基，其具有羧基; x，y和z是满足x + y + z = 1,0,0
是氢原子或甲基，R 9是具有脂环族内酯结构的7-16个碳原子的烃基。
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