公开(公告)号：US5523841A

公开(公告)日：1996-06-04

申请号：US357090

申请日：1994-12-15

申请人： Kei Nara ,  Toshio Matsuura

发明人： Kei Nara ,  Toshio Matsuura

IPC分类号： G03F9/00 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G01B9/02

CPC分类号： G03F7/70716 ,  G01B11/002

摘要： A plurality of interference length (distance) measuring means which are opposed to a movable mirror are aligned in the direction in which said movable mirror moves at an interval narrower than the length of the mirror surface. These interference length measuring means are switched according to movement of the movable mirror. Thus, the range within which distances from the mirror surface are measured can be made wider than the length of the mirror surface of the movable mirror.

摘要翻译： 与可动镜相对的多个干涉长度（距离）测量装置在所述可移动镜以比镜面的长度窄的间隔移动的方向上对准。 这些干涉长度测量装置根据可移动镜的移动而被切换。 因此，可以使与测量镜面距离的范围比可动镜的镜面的长度更宽。

公开(公告)号：US08456617B2

公开(公告)日：2013-06-04

申请号：US12507275

申请日：2009-07-22

申请人： Kei Nara

发明人： Kei Nara

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the light emitted from the light source and passes through the variable shaped mask. The exposure device further includes a control device (100) which controls the operation timing to change the operation state of the movable mirrors and the pulse application timing of the pulse light emitted from the light source so that they are synchronized.

摘要翻译： 曝光装置包括：发射脉冲光的光源（LS）; 以及可变形掩模（8），其具有多个对准的微型可移动反射镜，并且通过选择性地改变可移动反射镜的操作状态来形成任意图案。 将基板（P）暴露于从光源发射的光并通过可变形掩模。 曝光装置还包括控制装置（100），其控制操作定时以改变可移动反射镜的操作状态和从光源发射的脉冲光的脉冲施加定时以使它们同步。

公开(公告)号：US06437354B1

公开(公告)日：2002-08-20

申请号：US09610306

申请日：2000-07-05

申请人： Kei Nara ,  Hirokazu Kato

发明人： Kei Nara ,  Hirokazu Kato

IPC分类号： H01L21027

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791 ,  G03F9/00 ,  G03F9/70

摘要： Exposure method and scanning-type exposure apparatus expose a substrate with a pattern formed on a mask by synchronously moving the mask and the substrate. The exposure apparatus comprises a detection device and a correction mechanism. The detection device detects a change in a shape of the substrate. The correction mechanism approximates at least two straight lines or curves in accordance with the result of the detection by the detection device to correct the relative position of the mask and the substrate during the synchronous movements.

摘要翻译： 曝光方法和扫描型曝光装置通过同时移动掩模和基底而使掩模上形成的图案曝光基板。 曝光装置包括检测装置和校正机构。 检测装置检测基板的形状的变化。 校正机构根据检测装置的检测结果近似至少两条直线或曲线，以在同步运动期间校正掩模和基板的相对位置。

公开(公告)号：USH1733H

公开(公告)日：1998-06-02

申请号：US539986

申请日：1995-10-06

申请人： Kei Nara ,  Masaichi Murakami ,  Nobutaka Fujimori

发明人： Kei Nara ,  Masaichi Murakami ,  Nobutaka Fujimori

IPC分类号： G03F7/20 ,  G03B27/32 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/70

摘要： An exposure method for transferring a pattern on a mask onto a photosensitive substrate. The exposure method has steps of (1) preparing the mask with a first alignment mark and the substrate with a second alignment mark, a length of the first alignment mark in a scan direction being shorter than a length of the second alignment mark in the same direction; (2) scanning the first and second alignment marks; (3) detecting an intensity of the light which has been emitted from the light source optical system and irradiated the mask and the substrate; (4) calculating an amount of dislocation between the first and second alignment marks in the scan direction; (5) correcting the dislocation between the mask and the substrate; (6) effecting an exposure to transfer the pattern on the mask onto the substrate.

摘要翻译： 用于将掩模上的图案转印到感光基板上的曝光方法。 曝光方法具有以下步骤：（1）制备具有第一对准标记的掩模和具有第二对准标记的基板，第一对准标记在扫描方向上的长度短于其中的第二对准标记的长度 方向; （2）扫描第一和第二对准标记; （3）检测从光源光学系统发射的光的强度并照射掩模和基板; （4）计算扫描方向上的第一和第二对准标记之间的位错量; （5）校正掩模和基板之间的位错; （6）进行曝光以将掩模上的图案转印到基板上。

公开(公告)号：US5726757A

公开(公告)日：1998-03-10

申请号：US719315

申请日：1996-09-25

申请人： Masaki Kato ,  Kinya Kato ,  Kei Nara

发明人： Masaki Kato ,  Kinya Kato ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position. An alignment optical system comprises a light source means for supplying a luminous flux; a scan beam forming optical system for forming, based on the luminous flux, a scan beam at a visual field area on a first substrate with respect to a predetermined optical system; a scanning means for optically scanning, in a predetermined direction, the scan beam formed on the first substrate; a first detection means for detecting a diffracted and reflected light component from a first mark generated when optically scanned with the scan beam formed on the first substrate; and a second detection means for detecting, by way of the predetermined optical system and through a path different from the path through which the diffracted and reflected light component from the first mark is detected, a diffracted and reflected light component from a second mark generated when optically scanned with the scan beam which is formed on the second substrate by way of the predetermined optical system.

摘要翻译： 在曝光装置中，掩模的对准检测光分量和板的对准检测光分量在空间上彼此分离，从而在对掩模位置的检测时几乎不受来自板的光的影响。 对准光学系统包括用于提供光通量的光源装置; 扫描光束形成光学系统，用于基于光通量，相对于预定光学系统在第一基板上的视野区域处形成扫描光束; 扫描装置，用于在预定方向上光扫描形成在第一基板上的扫描光束; 第一检测装置，用于从由形成在第一基板上的扫描光束进行光扫描时产生的第一标记中检测衍射和反射光分量; 以及第二检测装置，用于通过预定的光学系统和通过不同于检测到来自第一标记的衍射和反射光分量的路径的路径来检测来自第二标记的衍射和反射光分量， 通过预定的光学系统用形成在第二基板上的扫描光束进行光学扫描。

公开(公告)号：US5668624A

公开(公告)日：1997-09-16

申请号：US358590

申请日：1994-12-14

申请人： Tsuyoshi Naraki ,  Kei Nara

发明人： Tsuyoshi Naraki ,  Kei Nara

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70058 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70558

摘要： A scan type exposure apparatus has a mask stage for mounting a mask formed with an exposure pattern in a pattern area; a substrate stage for mounting a rectangular photosensitive substrate; a driving unit for moving the mask stage and the substrate stage in synchronism parallel to one side of the rectangular photosensitive substrate; illumination optical systems for illuminating partial areas of the mask with light beams; and projection optical systems for projecting images of the illuminated areas of the mask onto the photosensitive substrate. The projection optical system projects the light beams passing through the exposure pattern area of the illuminated mask on a central area, excluding peripheral areas, of an exposure area of the photosensitive substrate and projects the light beams passing through an area other than the exposure pattern area of the illuminated mask on the peripheral areas. The scan type exposure apparatus also has an exposure quantity control unit for setting an exposure quantity for the peripheral areas larger than an exposure quantity for the central area.

摘要翻译： 扫描型曝光装置具有用于将形成有曝光图案的掩模安装在图案区域中的掩模台; 用于安装矩形感光基板的基板台; 驱动单元，用于与所述矩形感光基板的一侧平行地同步地移动所述掩模台和所述基板台; 照明光学系统，用于用光束照射面罩的部分区域; 以及用于将掩模的照射区域的图像投影到感光基板上的投影光学系统。 投影光学系统将通过照射的掩模的曝光图案区域的光束投射到感光基板的曝光区域的除外围区域的中心区域上，并且突出通过除了曝光图案区域之外的区域 的周边区域上的照明面具。 扫描型曝光装置还具有曝光量控制单元，用于设定比中央区域的曝光量大的周边区域的曝光量。

公开(公告)号：US09172063B2

公开(公告)日：2015-10-27

申请号：US12102509

申请日：2008-04-14

申请人： Tomohide Hamada ,  Kei Nara

发明人： Tomohide Hamada ,  Kei Nara

IPC分类号： B05D5/12 ,  H01L51/56 ,  G02F1/13 ,  H01J9/24 ,  G02F1/1333 ,  H01L27/32 ,  H01L51/00

CPC分类号： H01L51/56 ,  G02F1/1303 ,  G02F2001/133302 ,  G02F2001/133325 ,  H01J9/241 ,  H01J9/242 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0022

摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.

摘要翻译： 一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极， 涂抹器基于标准标记。 提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元， 应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。 提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

公开(公告)号：US08301289B2

公开(公告)日：2012-10-30

申请号：US12753517

申请日：2010-04-02

申请人： Kei Nara ,  Tomohide Hamada

发明人： Kei Nara ,  Tomohide Hamada

IPC分类号： G06F19/00

CPC分类号： G01N21/95607 ,  G01N2021/9513 ,  G01N2021/95615 ,  G02F1/136259

摘要： A defect detecting method of a display device includes a defect counting process that measuring a feature amount for each partial region of a display device (P32), and counting regions which is determined as a defective portion based on the measured feature amount of the region (P36), a process that stopping a manufacturing line of the display device when a number of defects counted at the defect counting process is greater than a first threshold value (P38, P42), a defect density calculating process that calculating a defect density in a predetermined area when the number of defects counted at the defect counting process is smaller than the first threshold value (P38), and a process that stopping the manufacturing line of the display device when the defect density calculated at the defect density calculating process is higher than a second threshold value (P40, P42).

摘要翻译： 显示装置的缺陷检测方法包括测量显示装置的每个部分区域的特征量的缺陷计数处理（P32），并且基于测量的区域的特征量对被确定为缺陷部分的区域进行计数（ P36），当在缺陷计数处理中计数的缺陷数量大于第一阈值（P38，P42）时停止显示装置的生产线的处理，计算缺陷密度的缺陷密度计算处理 当在缺陷计数处理中计数的缺陷数量小于第一阈值（P38）时的预定区域，以及当在缺陷密度计算处理中计算的缺陷密度高于显示装置的制造线时，停止显示装置的制造线的处理 第二阈值（P40，P42）。

公开(公告)号：US06342943B1

公开(公告)日：2002-01-29

申请号：US09088571

申请日：1998-06-02

申请人： Kei Nara

发明人： Kei Nara

IPC分类号： G03B2754

CPC分类号： G03F7/70258 ,  G03F7/70275 ,  G03F7/70358

摘要： An exposure apparatus and methods for making and using the same. The exposure apparatus includes at least one projection optical system which projects illuminating light, a substrate stage which supports a substrate to be exposed by the illuminating light and which includes a first plurality of reference marks. The exposure apparatus also includes a mask stage which supports a mask that includes a mask pattern to be projected onto the substrate by at least one projection optical system. The mask further includes a second plurality of reference marks intended to correspond to the first plurality of reference marks. The second plurality of reference marks is integrally formed with the mask pattern. The projection optical system(s) project illuminating light based on the mask pattern and the second plurality of reference marks to produce a projected image corresponding to the mask pattern and a plurality of projected images corresponding to the second plurality of reference marks. The exposure apparatus also includes an adjustment mechanism which adjusts the position of the projected image on the substrate based on a plurality of positional relationships between the plurality of projected images and the first plurality of reference marks. Also included is a plurality of sensors which detect the positional relationships, and a control device which controls the adjustment mechanism based on the positional relationships to effect a predetermined plurality of positional relationships between the plurality of projected images and the first plurality of reference marks.

摘要翻译： 曝光装置及其制作及使用方法。 曝光装置包括投影照明光的至少一个投影光学系统，支撑要被照明光曝光的基板并包括第一多个参考标记的基板台。 曝光装置还包括掩模台，其通过至少一个投影光学系统支持包括要投影到基板上的掩模图案的掩模。 掩模还包括旨在对应于第一多个参考标记的第二多个参考标记。 第二多个参考标记与掩模图案一体地形成。 投影光学系统基于掩模图案和第二多个参考标记投射照明光，以产生对应于掩模图案的投影图像和对应于第二多个参考标记的多个投影图像。 曝光装置还包括调整机构，其基于多个投影图像与第一多个参考标记之间的多个位置关系来调整投影图像在基板上的位置。 还包括检测位置关系的多个传感器，以及基于位置关系来控制调节机构以实现多个投影图像与第一多个参考标记之间的预定多个位置关系的控制装置。

公开(公告)号：US5985496A

公开(公告)日：1999-11-16

申请号：US837277

申请日：1997-04-11

申请人： Kei Nara ,  Toshio Matsuura

发明人： Kei Nara ,  Toshio Matsuura

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/2002 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.

摘要翻译： 用于通过多个光学系统将光掩模图案曝光到感光基板上的曝光装置包括用于将适合于穿过图案的光束照射到光掩模图案和光学系统到基板上的照明源。 包括用于将光束同时扫描光掩模图案的扫描机构，以将图案转移到基板。 提供了多个照明强度测量装置，用于基本上同时测量通过光学系统的光束的照明强度。