公开(公告)号：US09178155B2

公开(公告)日：2015-11-03

申请号：US12576752

申请日：2009-10-09

申请人： Kei Nara ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

发明人： Kei Nara ,  Tomohide Hamada ,  Masaki Kato ,  Tohru Kiuchi

IPC分类号： B05D5/12 ,  B65G47/26 ,  B65G1/133 ,  H01L51/00 ,  H01L51/52 ,  H01L51/56

CPC分类号： H01L51/00 ,  H01L51/52 ,  H01L51/56 ,  H01L2251/5338 ,  Y10T428/24479

摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.

摘要翻译： 在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部 与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US09172063B2

公开(公告)日：2015-10-27

申请号：US12102509

申请日：2008-04-14

申请人： Tomohide Hamada ,  Kei Nara

发明人： Tomohide Hamada ,  Kei Nara

IPC分类号： B05D5/12 ,  H01L51/56 ,  G02F1/13 ,  H01J9/24 ,  G02F1/1333 ,  H01L27/32 ,  H01L51/00

CPC分类号： H01L51/56 ,  G02F1/1303 ,  G02F2001/133302 ,  G02F2001/133325 ,  H01J9/241 ,  H01J9/242 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0022

摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.

摘要翻译： 一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极， 涂抹器基于标准标记。 提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元， 应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。 提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

公开(公告)号：US08301289B2

公开(公告)日：2012-10-30

申请号：US12753517

申请日：2010-04-02

申请人： Kei Nara ,  Tomohide Hamada

发明人： Kei Nara ,  Tomohide Hamada

IPC分类号： G06F19/00

CPC分类号： G01N21/95607 ,  G01N2021/9513 ,  G01N2021/95615 ,  G02F1/136259

摘要： A defect detecting method of a display device includes a defect counting process that measuring a feature amount for each partial region of a display device (P32), and counting regions which is determined as a defective portion based on the measured feature amount of the region (P36), a process that stopping a manufacturing line of the display device when a number of defects counted at the defect counting process is greater than a first threshold value (P38, P42), a defect density calculating process that calculating a defect density in a predetermined area when the number of defects counted at the defect counting process is smaller than the first threshold value (P38), and a process that stopping the manufacturing line of the display device when the defect density calculated at the defect density calculating process is higher than a second threshold value (P40, P42).

摘要翻译： 显示装置的缺陷检测方法包括测量显示装置的每个部分区域的特征量的缺陷计数处理（P32），并且基于测量的区域的特征量对被确定为缺陷部分的区域进行计数（ P36），当在缺陷计数处理中计数的缺陷数量大于第一阈值（P38，P42）时停止显示装置的生产线的处理，计算缺陷密度的缺陷密度计算处理 当在缺陷计数处理中计数的缺陷数量小于第一阈值（P38）时的预定区域，以及当在缺陷密度计算处理中计算的缺陷密度高于显示装置的制造线时，停止显示装置的制造线的处理 第二阈值（P40，P42）。

公开(公告)号：US08432528B2

公开(公告)日：2013-04-30

申请号：US12718450

申请日：2010-03-05

申请人： Kei Nara ,  Tomohide Hamada

发明人： Kei Nara ,  Tomohide Hamada

IPC分类号： G02F1/13

CPC分类号： G02F1/13452 ,  G02F1/1303 ,  G02F1/133305 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136295 ,  H01J9/148 ,  H01L27/3246 ,  H01L27/3248 ,  H01L27/3274 ,  H01L51/0005 ,  H01L51/0022 ,  H01L51/52 ,  H01L51/5206 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/5338 ,  H05B33/10

摘要： A manufacturing apparatus of display element which forms highly reliable drive circuits or thin-film transistors on a flexible substrate, a manufacturing method, and a highly reliable display element are provided. A display element (50) includes a flexible substrate (FB), a first partition wall and second partition wall (BA) formed by pressing the flexible substrate, a lyophobic surface (PJ) formed on surfaces of the first partition wall and the second partition wall, and electrodes (S, P) formed by applying droplets onto a groove portion formed between the first partition wall and second partition wall. It is also possible for a lyophilic surface to be formed on the surface of the groove portion (GR) between the first partition wall and second partition wall (BA).

摘要翻译： 提供了在柔性基板上形成高度可靠的驱动电路或薄膜晶体管的显示元件的制造装置，制造方法和高度可靠的显示元件。 显示元件（50）包括柔性基板（FB），通过按压柔性基板形成的第一分隔壁和第二分隔壁（BA），形成在第一分隔壁和第二分隔壁 壁和电极（S，P），其通过将液滴施加到形成在第一分隔壁和第二分隔壁之间的槽部上而形成。 也可以在第一分隔壁和第二分隔壁（BA）之间的槽部（GR）的表面上形成亲液性表面。

公开(公告)号：US08349672B2

公开(公告)日：2013-01-08

申请号：US12978779

申请日：2010-12-27

申请人： Kei Nara ,  Tomohide Hamada

发明人： Kei Nara ,  Tomohide Hamada

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： H01L21/67225 ,  G03F7/2035 ,  G03F7/70275 ,  G03F7/70791 ,  G03F9/7088 ,  H01L21/67115 ,  H01L27/1285 ,  H01L27/1288 ,  H01L27/1292 ,  H01L29/41733 ,  H01L51/0004

摘要： The thin film transistor manufacturing apparatus comprises a surface modification layer forming means, which forms a surface modification layer on a substrate, an illuminating part, which irradiates light that includes ultraviolet rays, a mask, on which the patterns of the source electrode and the drain electrode are drawn, a projection optical system, which illuminates a mask using light from the illuminating part and projects the pattern of the mask to the substrate as a pattern image, and a coating part, which coats a fluid electrode material to a region in which the surface modification layer has been modified by projection of the pattern image in order to form the source electrode and the drain electrode.

摘要翻译： 薄膜晶体管制造装置包括在基板上形成表面改性层的表面改性层形成装置，照射包括紫外线的光的照明部分，其上源极和漏极的图案的掩模 电极被拉出，投影光学系统使用来自照明部分的光照射掩模并将掩模的图案投影到基板作为图案图像;以及涂覆部分，其将流体电极材料涂覆到其中 通过图案图像的投影来修饰表面改性层，以便形成源电极和漏电极。

公开(公告)号：US08262974B2

公开(公告)日：2012-09-11

申请号：US12721023

申请日：2010-03-10

申请人： Kei Nara ,  Tomohide Hamada

发明人： Kei Nara ,  Tomohide Hamada

IPC分类号： B28B3/12

CPC分类号： G02F1/133305 ,  G02F1/1303 ,  G02F1/136259 ,  G02F1/136286 ,  G02F2001/136295 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0019 ,  H01L51/56 ,  H01L2251/5338

摘要： A manufacturing apparatus of display element is provided in which the position of a drive circuit or thin-film transistor on a flexible substrate roll can be confirmed easily. The manufacturing apparatus of display element (100) is provided with a supply roll (RL) that feeds a flexible, elongated substrate (FB) which has been wound into a roll shape in a first direction; a mold (10) that, by pressing onto the fed elongated substrate, forms at least one first index mark (AM) for one row of display elements and partition walls (BA) for a plurality of display elements (50) that are lined up in a second direction which intersects the first direction; and a droplet applying section (20) that applies droplets onto a groove portion formed between the partition walls.

摘要翻译： 提供一种显示元件的制造装置，其中可以容易地确认柔性基板辊上的驱动电路或薄膜晶体管的位置。 显示元件（100）的制造装置设置有供给辊（RL），其供给沿第一方向卷绕成卷状的柔性细长基板（FB）; 模具（10），其通过按压到所馈送的细长基底上，形成用于一排显示元件的至少一个第一指示标记（AM）和用于多个排列的多个显示元件（50）的分隔壁（BA） 在与第一方向相交的第二方向上; 以及在形成在分隔壁之间的槽部上施加液滴的液滴施加部（20）。

公开(公告)号：US20110276306A1

公开(公告)日：2011-11-10

申请号：US12978976

申请日：2010-12-27

申请人： Tomohide HAMADA ,  Kei Nara

发明人： Tomohide HAMADA ,  Kei Nara

IPC分类号： G06F15/00 ,  C23C16/52

CPC分类号： H01L22/20 ,  G02F1/1303 ,  G02F1/1333 ,  H01L27/3244 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/5338

摘要： The display element manufacturing apparatus has a transporting part, which transports a substrate in a first direction, a first alignment system, which detects fiducial marks, a second alignment system, which is arranged at a prescribed distance from the first alignment system in the first direction and detects fiducial marks, calculating parts, which detect the fiducial marks and calculate the expansion/contraction of the substrate in the first direction or the transport speed of the substrate, and a processing part, which processes a prescribed position of the substrate based on at least one of the expansion/contraction of the substrate in the first direction or the transport speed of the substrate and the fiducial marks.

摘要翻译： 显示元件制造装置具有沿第一方向输送基板的输送部，检测基准标记的第一对准系统，与第一对准系统沿第一方向以规定距离配置的第二对准系统 检测检测基准标记的基准标记，计算部分，并计算基板在基板的第一方向或输送速度上的膨胀/收缩;以及处理部，其基于a处理基板的规定位置 基板在第一方向上的扩张/收缩或基板的传送速度和基准标记中的至少一个。

公开(公告)号：USRE37762E1

公开(公告)日：2002-06-25

申请号：US09247857

申请日：1999-02-11

申请人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

发明人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

摘要翻译： 本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。 如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转 其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。 然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量 根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

公开(公告)号：US09086585B2

公开(公告)日：2015-07-21

申请号：US12978976

申请日：2010-12-27

申请人： Tomohide Hamada ,  Kei Nara

发明人： Tomohide Hamada ,  Kei Nara

IPC分类号： G01C3/16 ,  G01C3/00 ,  G01C3/02 ,  G01C3/18 ,  G02F1/1333 ,  G02F1/13 ,  H01L51/56

CPC分类号： H01L22/20 ,  G02F1/1303 ,  G02F1/1333 ,  H01L27/3244 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/5338

摘要： The display element manufacturing apparatus has a transporting part, which transports a substrate in a first direction, a first alignment system, which detects fiducial marks, a second alignment system, which is arranged at a prescribed distance from the first alignment system in the first direction and detects fiducial marks, calculating parts, which detect the fiducial marks and calculate the expansion/contraction of the substrate in the first direction or the transport speed of the substrate, and a processing part, which processes a prescribed position of the substrate based on at least one of the expansion/contraction of the substrate in the first direction or the transport speed of the substrate and the fiducial marks.

摘要翻译： 显示元件制造装置具有沿第一方向输送基板的输送部，检测基准标记的第一对准系统，与第一对准系统沿第一方向以规定距离配置的第二对准系统 检测检测基准标记的基准标记，计算部分，并计算基板在基板的第一方向或输送速度上的膨胀/收缩;以及处理部，其基于a处理基板的规定位置 基板在第一方向上的扩张/收缩或基板的传送速度和基准标记中的至少一个。