摘要:
The present invention provides a glass member including a photocatalyst layer and a heat reflecting layer, the glass member having high photocatalytic activity and exhibiting a low reflectance and a colorless or pale blue reflection color tone or a bluish green or green reflection color tone. The glass member is produced by laminating an antistripping layer made of silicon oxide or the like, a crystalline undercoat layer made of zirconium oxide or the like and a photocatalyst layer made of titanium oxide or the like on the other surface of a glass substrate having a heat reflecting layer formed on one surface thereof. The heat reflecting layer is formed such that the other surface of the glass substrate has a reflection chromaticity (a*, b*) satisfying −4≦a*≦2 and −5≦b*≦0 and a visible light reflectance of 10% or less, the crystalline undercoat layer is allowed to have a thickness ranging from 2 to 28 nm, and the photocatalyst layer is allowed to have a thickness ranging from 2 to 20 nm, whereby the glass member having a colorless or pale blue reflection color tone can be produced. Likewise, the heat reflecting layer is formed such that the reflection chromaticity (a*, b*) satisfies −15≦a*≦−2 and −10≦b*≦10 and the visible light reflectance is 13% or less, the crystalline undercoat layer is allowed to have a thickness ranging from 2 to 28 nm, and the photocatalyst layer is allowed to have a thickness ranging from 2 to 14 nm, whereby the glass member having a bluish green or green reflection color tone can be produced.
摘要翻译:本发明提供一种玻璃构件,其包含光催化剂层和热反射层,该玻璃构件具有高的光催化活性并且具有低反射率和无色或浅蓝色反射色调或蓝绿色或绿色反射色调。 玻璃构件通过层压由氧化硅等制成的防夹层,由氧化锆等制成的结晶底涂层和由氧化钛等制成的光催化剂层而制成,在玻璃基板的另一表面上具有 在其一个表面上形成热反射层。 热反射层形成为使得玻璃基板的另一个表面具有满足-4 <= a * <= 2和-5 <= b * <= 0的反射色度(a *,b *)和可见光 反射率为10%以下,使结晶性底涂层的厚度为2〜28nm,使光催化剂层的厚度范围为2〜20nm,由此玻璃构件具有无色或浅色 可以产生蓝色反射色调。 同样地,热反射层形成为使得反射色度(a *,b *)满足-15 <= a * <= - 2和-10 <= b * <= 10,可见光反射率为13% 使得结晶底涂层的厚度为2〜28nm,使光催化剂层的厚度为2〜14nm,由此,具有蓝绿色或绿色反射色调的玻璃构件可以 生产。
摘要:
The present invention provides a method for forming a titanium compound film on a substrate by a sputtering process by use of, in place of a conventional metallic titanium target, a titanium target containing a metal (such as tin or zinc) having two or more times higher sputtering yield in an argon atmosphere than titanium; an article coated with a titanium compound film; and a sputtering target for use in the film coating. The content of tin or zinc in the titanium target containing tin or zinc is preferably in the range of 1 to 45 at %, and further a third metal may be added. These can remove drawbacks in that the film has a low film formation rate and a high output power cannot be applied due to the occurrence of arcing in forming a titanium compound film on the surface of a substrate, such as plate-shaped glass, by a reactive sputtering process.
摘要:
The optical device having a predetermined surface profile of the invention is fabricated by forming a multi-layered dielectric film on the surface of a solid composition layer having a glass transition temperature of not lower than 100° C. The solid composition layer is formed by molding and curing a polymerizable organic group-having fluid composition. The curing may be effected through photopolymerization or thermal polymerization of the polymerizable organic group in the composition, and a predetermined surface profile is transferred onto the composition layer from the mold used. The cured composition is released from the mold, and this is coated with a multi-layered dielectric film.
摘要:
There may be used a film-forming apparatus having a substrate 4 that is rotatable around the center of one rotating axis 10 in the vertical direction situated in an inner cylinder 12, and a plurality (four in FIG. 2) of target units each comprising the pair of targets 2A, 2B (2B is under 2A serially arranged in the vertical direction inside an outer cylinder 13 opposite the surface 4a of the substrate 4, which are arranged in parallel in the circumferential direction of the inner wall of the outer cylinder 13. By employing a method whereby voltage is applied while alternatively reversing the polarity to each of the targets 2A, 2B, it is possible to form a coating on the surface of a substrate by glow discharge sputtering, to accomplish destaticizing while the sputtering can be carried out using a small in-line or bell jar apparatus with small space.