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公开(公告)号：US20100327855A1
公开(公告)日：2010-12-30
申请号：US12490905
申请日：2009-06-24
CPC分类号： H03K17/9505 , B05D5/083 , B23K37/047 , B23K2101/006 , C09D127/18 , Y10T428/3154
摘要： A non-stick coating application for high heat welding environments comprised of a fluorinated polymer combined with acidified graphite to which a hardening agent, such as alumina, may be added in some embodiments.
摘要翻译： 在一些实施方案中，可以添加含氟聚合物与酸化石墨组合的高热焊接环境的不粘涂层应用，其中可以添加硬化剂，例如氧化铝。
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公开(公告)号：US07476474B2
公开(公告)日：2009-01-13
申请号：US11340384
申请日：2006-01-25
摘要： A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.
摘要翻译： 描述了一种光掩模组件，其具有用于在光掩模基板上方支撑透明防护薄膜的框架，限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成，其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫，从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶，干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米2 /分钟，平均孔径在0.001微米至10微米之间，热膨胀系数在0.01ppm /℃和 10 ppm /°C
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公开(公告)号：US20060141371A1
公开(公告)日：2006-06-29
申请号：US11340384
申请日：2006-01-25
申请人： Rahul Ganguli , Troy Robinson , D. Meixner
发明人： Rahul Ganguli , Troy Robinson , D. Meixner
摘要： A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.
摘要翻译： 描述了一种光掩模组件，其具有用于在光掩模基板上方支撑透明防护薄膜的框架，限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成，其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫，从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶，干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa，平均孔径在0.001微米至10微米之间，并且热膨胀系数 在0.01ppm /℃和10ppm /℃之间。
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公开(公告)号：US6099792A
公开(公告)日：2000-08-08
申请号：US234738
申请日：1999-01-21
申请人： Rahul Ganguli , Fikret Kirkbir , Douglas Meyers
发明人： Rahul Ganguli , Fikret Kirkbir , Douglas Meyers
IPC分类号： C03B8/02 , B01J3/00 , C01B13/32 , C01B33/152 , C01B33/158 , C01B33/16 , C01F7/02 , C01G17/02 , C01G19/02 , C01G21/02 , C01G23/053 , C01G25/02 , C01G30/00 , C03C1/00 , C03C3/06 , C04B35/111 , C04B35/14 , C04B35/46 , C04B35/622 , C04B35/624 , C04B38/00
CPC分类号： C04B35/62655 , B22C1/183 , C01B33/1585 , C01B33/163 , C03C1/006 , C03C3/06 , C04B35/111 , C04B35/14 , C04B35/46 , C04B35/624 , C04B35/62605 , C03C2201/31 , C03C2201/3476 , C03C2203/26 , C04B2235/3224 , C04B2235/3287
摘要： A sol-gel process for producing dry porous gel monoliths, e.g., silica glass monoliths, in which the successive process steps of gelling, aging and drying all occur within a mold formed of a porous material, e.g., graphite. The mold is inert to the gel solution and it has sufficient strength to withstand the temperatures and pressures encountered during the process, yet it has sufficient porosity to facilitate the escape of liquid from the gel pores directly through the mold, itself. The mold and gel thereby can remain within a sealed autoclave during these process steps, and mechanical handling of the mold and the gel are minimized. This substantially enhances the process' efficiency. Alternatively, the mold can have a non-porous inner skin.
摘要翻译： 用于生产干多孔凝胶整料（例如石英玻璃整料）的溶胶 - 凝胶方法，其中连续的胶凝，老化和干燥的工艺步骤全部发生在由多孔材料例如石墨形成的模具内。 模具对凝胶溶液是惰性的，并且其具有足够的强度以承受在该过程中遇到的温度和压力，但是其具有足够的孔隙率以便于液体从凝胶孔直接通过模具自身逸出。 因此，在这些工艺步骤期间，模具和凝胶可以保持在密封的高压釜内，并且模具和凝胶的机械处理最小化。 这大大提高了工艺的效率。 或者，模具可以具有无孔内皮。
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公开(公告)号：US08741435B2
公开(公告)日：2014-06-03
申请号：US12772007
申请日：2010-04-30
CPC分类号： C09D5/14 , A01N59/16 , C09D5/1618 , C09D5/1668 , C09D7/62 , Y10T428/249974 , Y10T428/31544 , A01N25/08 , A01N25/24 , A01N2300/00
摘要： According to various embodiments, a coating mixture is capable of being applied on a substrate. The coating mixture includes acidified graphite particles, a suspension of polytetrafluoroethylene resin in water, and silver ion doped microporous particles. When the coating mixture is applied to a surface of the substrate, the coating resists growth of microorganisms.
摘要翻译： 根据各种实施方案，涂料混合物能够施加在基材上。 涂料混合物包括酸化石墨颗粒，聚四氟乙烯树脂在水中的悬浮液和银离子掺杂微孔颗粒。 当将涂料混合物施加到基材的表面时，该涂层抵抗微生物的生长。
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公开(公告)号：US07014961B2
公开(公告)日：2006-03-21
申请号：US10646356
申请日：2003-08-22
摘要： A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.
摘要翻译： 描述了一种光掩模组件，其具有用于在光掩模基板上方支撑透明防护薄膜的框架，限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成，其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫，从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶，干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa，平均孔径在0.001微米至10微米之间，并且热膨胀系数 在0.01ppm /℃和10ppm /℃之间。
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公开(公告)号：US06669892B2
公开(公告)日：2003-12-30
申请号：US10006983
申请日：2001-12-04
申请人： Rahul Ganguli , Steven Colbern
发明人： Rahul Ganguli , Steven Colbern
IPC分类号： C04B35624
CPC分类号： C04B35/624 , C04B35/14 , C04B35/62218 , C04B35/64
摘要： A new method is disclosed for producing thin plates by sintering a thin gel plate (e.g., silica) made using a sol-gel process, which substantially eliminates warpage of the plate during the sintering step. Sintering a sol-gel based silica plate to a dense glass typically causes significant shrinkage, and this can cause the plate to curl, especially around its edges. This phenomenon is referred to as warpage. In the method of the invention, the sintering step is performed while the gel plate is mounted on a support surface, separated by a thin layer of refractory powder. At the high sintering temperature, the powder partially fuses and sticks to both the gel plate and the support surface, which prevents non-uniform stresses in the gel plate from warping the plate.
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公开(公告)号：US5858457A
公开(公告)日：1999-01-12
申请号：US937407
申请日：1997-09-25
IPC分类号： B01J29/04 , B01D71/02 , B01J29/03 , C01B37/00 , C01B37/02 , C01B39/02 , C04B38/00 , C04B41/45 , C09C1/30 , C23C18/12 , B05D5/06
CPC分类号： C09C1/3063 , B01D67/0048 , B01D67/0083 , B01D71/024 , B01D71/025 , B01J29/0308 , C01B37/00 , C01B37/02 , C04B38/0054 , C04B41/009 , C04B41/4582 , C09C1/3045 , C23C18/1216 , C23C18/1254 , B01D2323/08 , B01D2323/14 , B01D2323/50 , B01D2325/023 , B01D2325/26 , C01P2002/72 , C04B2111/00801 , C04B2111/0081
摘要： This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.
摘要翻译： 本发明包括一种形成孔径在大约0.8-20nm范围内的负载膜薄膜族的方法，其表现出高度有序的微结构和孔隙率，其衍生自在膜沉积期间形成的有序胶束或液晶有机 - 无机前体结构。 在连续涂布操作中，在几秒钟内形成光学透明的100-500nm厚的薄膜，其具有独特的微结构范围和单一孔径。 这些膜的应用包括传感器，膜，低介电常数中间层，抗反射涂层和光学主机。
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