公开(公告)号：US07308628B2

公开(公告)日：2007-12-11

申请号：US10988541

申请日：2004-11-16

申请人： Wolfgang Spirkl ,  Ralf Arnold

发明人： Wolfgang Spirkl ,  Ralf Arnold

IPC分类号： G01R31/28

CPC分类号： G11C29/022 ,  G01R31/31716 ,  G01R31/318533 ,  G11C29/02

摘要： Transfer switching devices, which supplement unidirectional input switching arrangements or pad circuits are employed to route an internal test signal to the input of an input driver in the unidirectional input switching arrangement and to couple the internal test signal to an internal switching logic unit. The transfer switching devices are controlled via a multiplexer unit, which can be programmed directly using boundary scan registers. The present invention allows all unidirectional pad circuits or input drivers to be tested in the course of a reduced I/O test method for semiconductor circuits, in which testing internal circuits in the semiconductor circuit involves only a subset of the signal connections associated with the input drivers being coupled to a test apparatus.

摘要翻译： 采用补充单向输入切换装置或焊盘电路的转换开关装置将内部测试信号路由到单向输入开关装置中的输入驱动器的输入端，并将内部测试信号耦合到内部开关逻辑单元。 转换开关器件通过多路复用器单元进行控制，该单元可以使用边界扫描寄存器直接编程。 本发明允许在用于半导体电路的减少的I / O测试方法的过程中测试所有单向焊盘电路或输入驱动器，其中半导体电路中的测试内部电路仅涉及与输入相关联的信号连接的子集 驱动器耦合到测试装置。

公开(公告)号：US08264695B2

公开(公告)日：2012-09-11

申请号：US13030748

申请日：2011-02-18

申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

IPC分类号： G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

公开(公告)号：US07936521B2

公开(公告)日：2011-05-03

申请号：US12684600

申请日：2010-01-08

申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

IPC分类号： G02B13/18

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

公开(公告)号：US07139127B2

公开(公告)日：2006-11-21

申请号：US11059803

申请日：2005-02-17

申请人： Ralf Arnold ,  Bernd Kleemann

发明人： Ralf Arnold ,  Bernd Kleemann

IPC分类号： G02B5/18

CPC分类号： G03F7/70316 ,  G02B5/18 ,  G02B5/1809 ,  G02B5/1866 ,  G02B27/0043

摘要： A diffractive optical element contains a multiplicity of binary blazed diffraction structures, which substantially extend mutually parallel in a longitudinal direction. Perpendicularly to the longitudinal direction, the diffraction structures have a width g which is greater than the effective wavelength of electromagnetic radiation for which the diffractive optical element is designed. The diffraction structures respectively comprise a series of individual substructures, which produce a blaze effect and have a maximum extent p in the longitudinal direction which is less than the effective wavelength of the electromagnetic radiation, at least on average over a diffraction structure. In a plan view, the individual substructures respectively have the shape of a closed geometrical surface, which has an extent parallel to the longitudinal direction that varies perpendicularly to the longitudinal direction. Perpendicularly to the longitudinal direction, the surface has a maximum extent which is greater than the effective wavelength.

摘要翻译： 衍射光学元件包含多个二进制闪耀衍射结构，其基本上在纵向上相互平行地延伸。 垂直于纵向方向，衍射结构的宽度g大于设计衍射光学元件的电磁辐射的有效波长。 衍射结构分别包括一系列单独的子结构，其至少在衍射结构上平均产生火焰效应并且在纵向上具有小于电磁辐射的有效波长的最大程度p。 在平面图中，各个子结构分别具有封闭的几何表面的形状，其具有与纵向方向垂直变化的与纵向方向平行的程度。 垂直于纵向方向，表面的最大程度大于有效波长。

公开(公告)号：US20060186896A1

公开(公告)日：2006-08-24

申请号：US11348525

申请日：2006-02-07

申请人： Ralf Arnold ,  Heinz Mattes ,  Klaus Standner

发明人： Ralf Arnold ,  Heinz Mattes ,  Klaus Standner

IPC分类号： G01R27/04

CPC分类号： G01R31/2841

摘要： A test apparatus includes a signal source that generates a radio-frequency test signal and is connected to the input connection of an arrangement. The arrangement simultaneously supplies an electrical radio-frequency signal to a plurality of receivers and via a plurality of distribution lines. Each distribution line includes an end with an output connection that applies the power-matched test signal to a respective external component.

摘要翻译： 测试装置包括产生射频测试信号并连接到装置的输入连接的信号源。 该装置同时向多个接收器和多个分配线提供电射频信号。 每个分配线包括具有将功率匹配测试信号施加到相应外部组件的输出连接的端点。

公开(公告)号：US20060026475A1

公开(公告)日：2006-02-02

申请号：US11189231

申请日：2005-07-26

申请人： Ralf Arnold ,  Gerd Frankowsky ,  Wolfgang Spirkl

发明人： Ralf Arnold ,  Gerd Frankowsky ,  Wolfgang Spirkl

IPC分类号： G01R31/28

CPC分类号： G01R31/3016

摘要： Methods and apparatus for testing a semiconductor device. A testing interface is configured to interface with an external test apparatus and a device under test (DUT). In one embodiment, the testing interface receives test data and a test clock signal from the external test apparatus. The test data is clocked out of the testing interface and to the DUT according to the test clock signal. Further, the test clock signal is delayed by a period of time and then a delayed clock signal is issued to the device. The data previously written to the DUT is read out of the DUT and compared with the test data received from the external test apparatus. The period of time by which the test clock signal is delayed can be varied to achieve a desired timing.

摘要翻译： 用于测试半导体器件的方法和装置。 测试接口被配置为与外部测试设备和被测设备（DUT）接口。 在一个实施例中，测试接口从外部测试装置接收测试数据和测试时钟信号。 测试数据根据测试时钟信号从测试接口输出到DUT。 此外，测试时钟信号被延迟一段时间，然后向设备发出延迟的时钟信号。 先前写入DUT的数据从DUT读出并与从外部测试装置接收的测试数据进行比较。 可以改变测试时钟信号被延迟的时间段以实现期望的时序。