公开(公告)号：US20050231372A1

公开(公告)日：2005-10-20

申请号：US10812083

申请日：2004-03-30

Applicant: Richard Parsons

Inventor： Richard Parsons

IPC: G08B13/14 ,  H01L21/00

CPC classification number: H01L21/67294 ,  H01L21/67069

Abstract: A method and apparatus for encoding a part in a semiconductor tool with a unique radio frequency response to an external radio frequency excitation. The method and apparatus remotely read the identifying radio frequency characteristic of a component of a semiconductor process tool.

Abstract translation: 一种用于对具有对外部射频激励的独特无线电频率响应的半导体工具中的部分进行编码的方法和装置。 该方法和装置远程读取半导体处理工具的部件的识别射频特性。

公开(公告)号：US20050145334A1

公开(公告)日：2005-07-07

申请号：US11020127

申请日：2004-12-27

Applicant: Richard Parsons

Inventor： Richard Parsons

IPC: H05H1/00 ,  C23C16/505 ,  C23F1/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46

CPC classification number: H01J37/32935 ,  H01J37/32963

Abstract: A RF sensor for sensing and analyzing parameters of plasma processing. The RF sensor is provided with a plasma processing tool and an antenna for receiving RF energy radiated from the plasma processing tool. The antenna is located proximate to the plasma processing tool so as to be non-invasive. Additionally, the RF sensor may be configured for wideband reception of multiple harmonics of the RF energy that is radiated from the plasma processing tool. Further, the RF sensor may be coupled to a high pass filter and a processor for processing the received RF energy. Additionally, the antenna may be located within an enclosure with absorbers to reduce the interference experienced by the RF sensor. Additionally, a tool control may be coupled to the processor to provided to adjust and maintain various parameters of plasma processing according to the information provided by the received RF energy.

Abstract translation: 一种用于感测和分析等离子体处理参数的RF传感器。 RF传感器设置有等离子体处理工具和用于接收从等离子体处理工具辐射的RF能量的天线。 天线位于等离子体处理工具附近，以便是非侵入性的。 此外，RF传感器可以被配置为宽带接收从等离子体处理工具辐射的RF能量的多个谐波。 此外，RF传感器可以耦合到高通滤波器和用于处理所接收的RF能量的处理器。 此外，天线可以位于具有吸收器的外壳内，以减少RF传感器所经历的干扰。 另外，工具控制可以耦合到处理器以提供以根据由所接收的RF能量提供的信息调整和维持等离子体处理的各种参数。

公开(公告)号：US06351683B1

公开(公告)日：2002-02-26

申请号：US09508105

申请日：2000-04-19

Applicant: Wayne Johnson ,  Richard Parsons

Inventor： Wayne Johnson ,  Richard Parsons

IPC: G06F1900

CPC classification number: H01J37/32082 ,  H01J37/32137 ,  H01J37/32146 ,  H01J37/32155 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/332 ,  H01J2237/334

Abstract: A system and method for monitoring the conditions in a gas plasma processing system while varying or modulating the RF power supplied to the system, so that resulting signals of the electrical circuits of the system provide information regarding operational parameters of the system or the state of a process. Significant improvements in sensitivity and accuracy over conventional techniques are thereby achieved. In addition, the plasma processing system can be thoroughly tested and characterized before delivery, to allow more accurate monitoring of and greater control over a process, thereby improving quality control/assurance of substrates being produced by the system. The information obtained by the modulation technique can be displayed on a monitor screen, in order to allow an operator to accurately monitor the system/process and diagnose any problems with the system/process.

Abstract translation: 一种用于在改变或调制提供给系统的RF功率的同时监视气体等离子体处理系统中的状况的系统和方法，使得系统的电路的结果信号提供关于系统的操作参数或状态的信息 处理。 从而实现了与常规技术相比，灵敏度和精度的显着改善。 此外，等离子体处理系统可以在交货之前被彻底测试和表征，以允许对工艺进行更准确的监控和更大的控制，从而改善由系统生产的基板的质量控制/保证。 通过调制技术获得的信息可以显示在监视器屏幕上，以便操作者准确地监视系统/过程并诊断系统/处理中的任何问题。