公开(公告)号：US20130039460A1

公开(公告)日：2013-02-14

申请号：US13467042

申请日：2012-05-09

申请人： Ady Levy ,  Kyle A. Brown ,  Rodney Smedt ,  Gary Bultman ,  Mehrdad Nikoonahad ,  Dan Wack ,  John Fielden ,  Ibrahim Abdul-Halim

发明人： Ady Levy ,  Kyle A. Brown ,  Rodney Smedt ,  Gary Bultman ,  Mehrdad Nikoonahad ,  Dan Wack ,  John Fielden ,  Ibrahim Abdul-Halim

IPC分类号： G01N21/47 ,  G01B11/02 ,  G01N23/201 ,  G01N23/223 ,  G01N23/20 ,  G01B11/06 ,  G01B11/24

CPC分类号： G01N21/27 ,  G01N21/211 ,  G01N21/47 ,  G01N21/636 ,  G01N21/64 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/646 ,  G01N2021/8825 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70658 ,  G03F7/707 ,  G03F7/70708 ,  H01J2237/31701 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including: but not limited to, critical dimension and overlay misregistration; defects and thin film characteristics; critical dimension and defects; critical dimension and thin film characteristics; critical dimension, thin film characteristics and defects; macro defects and micro defects; flatness, thin film characteristics and defects; overlay misregistration and flatness; an implant characteristic and defects; and adhesion and thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

摘要翻译： 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和重叠错位; 缺陷和薄膜特性; 临界尺寸和缺陷; 临界尺寸和薄膜特性; 临界尺寸，薄膜特性和缺陷; 宏观缺陷和微缺陷; 平整度，薄膜特性和缺陷; 重叠错位和平整度; 植入物特征和缺陷; 附着力和厚度。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

公开(公告)号：US20070188745A1

公开(公告)日：2007-08-16

申请号：US11786180

申请日：2007-04-11

申请人： Rodney Smedt

发明人： Rodney Smedt

IPC分类号： G01N21/88

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503

摘要： A system for simultaneously inspecting the frontsides and backsides of semiconductor wafers for defects is disclosed. The system rotates the semiconductor wafer while the frontside and backside surfaces are generally simultaneously optically scanned for defects. Rotation is induced by providing contact between the beveled edges of the semiconductor wafer and roller bearings rotationally driven by a motor. The wafer is supported in a tilted or semi-upright orientation such that support is provided by gravity. This tilted supporting orientation permits both the frontside and the backside of the wafer to be viewed simultaneously by a frontside inspection device and a backside inspection device.

摘要翻译： 公开了一种用于同时检查半导体晶片的前侧和后侧的缺陷的系统。 该系统旋转半导体晶片，而前侧和后侧表面通常同时光学扫描缺陷。 通过在半导体晶片的倾斜边缘和由电动机旋转驱动的滚子轴承之间提供接触而引起旋转。 晶片以倾斜或半直立的方向被支撑，使得通过重力提供支撑。 这种倾斜的支撑方向允许通过前侧检查装置和后侧检查装置同时观察晶片的前侧和后侧。

公开(公告)号：US20050099627A1

公开(公告)日：2005-05-12

申请号：US11016148

申请日：2004-12-17

申请人： Guoheng Zhao ,  Kenneth Gross ,  Rodney Smedt ,  Mehrdad Nikoonahad

发明人： Guoheng Zhao ,  Kenneth Gross ,  Rodney Smedt ,  Mehrdad Nikoonahad

IPC分类号： G01B11/00 ,  G01J4/00

CPC分类号： G01N21/21 ,  G01B11/00 ,  G01N21/4788 ,  G01N21/956

摘要： A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a poly chromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals. At least one of the orientations of the plane of polarization is substantially stationary when the detection takes place. To have as small a footprint as possible, one employs an optical device that includes a first element directing a polychromatic beam of electromagnetic radiation to the structure and a second optical element collecting radiation from the structure where the two elements form an integral unit or are attached together to form an integrated unit. To reduce the footprint, the measurement instrument and the wafer are both moved. In one embodiment, both the apparatus and the wafer undergo translational motion transverse to each other. In a different arrangement, one of the two motions is translational and the other is rotational. Any one of the above-described embodiments may be included in an integrated processing and detection apparatus which also includes a processing system processing the sample, where the processing system is responsive to the output of any one of the above embodiments for adjusting a processing parameter.

公开(公告)号：US5043589A

公开(公告)日：1991-08-27

申请号：US525946

申请日：1990-05-18

申请人： Rodney Smedt ,  Ian Raphael

发明人： Rodney Smedt ,  Ian Raphael

IPC分类号： G01B11/30 ,  G01R31/308 ,  H01L21/00

CPC分类号： H01L21/67271 ,  G01B11/303 ,  G01R31/308

摘要： An improved optical inspection apparatus, especially suited for inspecting semiconductor devices using a single camera. A highly polished mirrored stage is provided with a light source extending upwardly therethrough and providing a pedestal upon which the object to be inspected is centered. A plurality of stationary reflectors are disposed around the stage and function in concert with two separate movable reflectors to provide optical scanning over the appropriate surface portions of the device. A separate movable reflector system is used to maintain a constant focal path length between the device and the camera as the other movable reflectors scan the device, thus ensuring proper focus and measurement accuracy.

摘要翻译： 一种改进的光学检查装置，特别适用于使用单个相机检查半导体器件。 高度抛光的镜面镜台设置有向上延伸穿过的光源，并提供一个基座，待检查的物体在该基座上居中。 多个固定反射器设置在舞台周围并且与两个单独的可移动反射器协同工作，以在装置的适当表面部分上提供光学扫描。 使用单独的可移动反射器系统来保持设备和照相机之间的恒定的焦距路径长度，因为其他可移动反射器扫描设备，从而确保适当的聚焦和测量精度。