公开(公告)号：US07833871B2

公开(公告)日：2010-11-16

申请号：US11916687

申请日：2006-09-12

申请人： Ryusuke Kawakami ,  Kenichirou Nishida ,  Norihito Kawaguchi ,  Miyuki Masaki ,  Atsushi Yoshinouchi

发明人： Ryusuke Kawakami ,  Kenichirou Nishida ,  Norihito Kawaguchi ,  Miyuki Masaki ,  Atsushi Yoshinouchi

IPC分类号： H01L21/331 ,  H01L21/8222

CPC分类号： H01L21/02675 ,  B23K26/0613 ,  B23K26/0732 ,  H01L21/0268 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285 ,  H01L27/1296

摘要： A laser annealing method for executing laser annealing by irradiating a semiconductor film formed on a surface of a substrate with a laser beam, the method including the steps of, generating a linearly polarized rectangular laser beam whose cross section perpendicular to an advancing direction is a rectangle with an electric field directed toward a long-side direction of the rectangle or an elliptically polarized rectangular laser beam having a major axis directed toward a long-side direction, causing the rectangular laser beam to be introduced to the surface of the substrate, and setting a wavelength of the rectangular laser beam to a length which is about a desired size of a crystal grain in a standing wave direction.

摘要翻译： 一种激光退火方法，用于通过用激光束照射形成在衬底的表面上的半导体膜来执行激光退火，所述方法包括以下步骤：产生线性偏振矩形激光束，其垂直于前进方向的截面为矩形 具有朝向矩形的长边方向的电场或具有指向长边方向的长轴的椭圆偏振矩形激光束，使矩形激光束被引入到基板的表面，并且设定 矩形激光束的波长长度大约为驻波方向的晶粒的期望尺寸。

公开(公告)号：US06890839B2

公开(公告)日：2005-05-10

申请号：US10257460

申请日：2002-01-15

申请人： Norihito Kawaguchi ,  Kenichiro Nishida ,  Mikito Ishii ,  Takehito Yagi ,  Miyuki Masaki ,  Atsushi Yoshinouchi ,  Koichiro Tanaka

发明人： Norihito Kawaguchi ,  Kenichiro Nishida ,  Mikito Ishii ,  Takehito Yagi ,  Miyuki Masaki ,  Atsushi Yoshinouchi ,  Koichiro Tanaka

IPC分类号： A61B18/20 ,  B23K26/06 ,  B23K26/073 ,  H01L21/268 ,  H01S3/00 ,  H01L21/00 ,  H01L21/20 ,  H01L21/26 ,  H01L21/331

CPC分类号： H01S3/005 ,  B23K26/0732

摘要： An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.

摘要翻译： 本发明的一个目的是提供能够执行均匀的束发射的激光退火方法和装置。 通过本发明，可以实现对样品的均匀波束施加，因为可以在具有高斯分布的光束的光学系统中产生线性横截面配置，而通过将光束从 即使当来自激光光源的光束的光束图案具有不均匀的强度分布时，通过旋转装置以规定角度的激光光源。

公开(公告)号：US06621636B2

公开(公告)日：2003-09-16

申请号：US10026340

申请日：2001-12-21

申请人： Koichiro Tanaka ,  Setsuo Nakajima ,  Takehito Yagi ,  Mikito Ishii ,  Kenichiro Nishida ,  Norihito Kawaguchi ,  Miyuki Masaki ,  Atsushi Yoshinouchi

发明人： Koichiro Tanaka ,  Setsuo Nakajima ,  Takehito Yagi ,  Mikito Ishii ,  Kenichiro Nishida ,  Norihito Kawaguchi ,  Miyuki Masaki ,  Atsushi Yoshinouchi

IPC分类号： G02B2710

CPC分类号： G02B27/108 ,  G02B27/145

摘要： A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.

公开(公告)号：US06894839B2

公开(公告)日：2005-05-17

申请号：US10081975

申请日：2002-02-22

申请人： Yoshikazu Sugiyama ,  Miyuki Masaki ,  Takehito Yagi

发明人： Yoshikazu Sugiyama ,  Miyuki Masaki ,  Takehito Yagi

IPC分类号： G03F7/20 ,  G02B1/12 ,  G02B27/10

CPC分类号： G02B1/12

摘要： An illumination optical system has superior image formation capabilities, and can radiate a linear beam with excellent illumination uniformity and a narrow line width having a large aspect ratio; the illumination optical system comprises an afocal beam expander system which expands an beam illuminated from a laser light source; a linear beam-forming lens system having at least refractive power in a second direction which is substantially at a right angle to at least a first direction, the linear beam-forming lens system converting the beam, illuminated from said beam expander system, to a linear beam having its long side in said first direction; a lens array section having a plurality of element lenses, arranged along said first direction; and a condenser optical system which illuminates a processed face by reconnecting images of said linear beam from each of said element lenses thereon.

摘要翻译： 照明光学系统具有优异的图像形成能力，并且可以辐射具有优异照明均匀性的线性束和具有大纵横比的窄线宽度; 该照明光学系统包括一个放大从激光光源照射的光束的无焦束扩束器系统; 线性波束成形透镜系统，其至少在第二方向上具有与至少第一方向成直角的折射力，所述线性波束成形透镜系统将从所述光束扩展器系统照射的光束转换成 线性光束在所述第一方向上具有长边; 具有沿着所述第一方向布置的多个元件透镜的透镜阵列部分; 以及聚光器光学系统，其通过从其中的每个所述元件透镜重新连接所述线性光束的图像照亮经处理的面。