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    Laser annealing apparatus
    1.
    发明授权
    Laser annealing apparatus 有权
    激光退火装置

    公开(公告)号：US08575515B2

    公开(公告)日：2013-11-05

    申请号：US13002010

    申请日：2009-06-17

    申请人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Jun Izawa ,  Miyuki Masaki ,  Masaru Morita

    发明人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Jun Izawa ,  Miyuki Masaki ,  Masaru Morita

    IPC分类号： B23K26/00 ,  B23K26/02 ,  H01L21/268

    CPC分类号： H01L21/268 ,  B23K26/0853 ,  B23K26/127 ,  B23K26/128 ,  B23K26/147 ,  B23K26/702 ,  B23K2103/56 ,  H01L21/02532 ,  H01L21/02675 ,  H01L21/67115

    摘要： A laser annealing apparatus is provided that is capable of reducing irradiation unevenness of laser light caused by a refraction phenomenon of the laser light due to fluctuation in the temperature of inert gas. The laser annealing apparatus includes a gas supply unit for supplying inert gas G to at least a laser irradiation area of a workpiece, and a gas temperature controller for regulating the temperature of the inert gas G. The gas temperature controller controls the temperature of the inert gas G supplied to the laser irradiation area so as to decrease a temperature difference between the temperature of the inert gas G and the atmospheric temperature of a space (a room R) that is disposed outside the supply area of the inert gas so the temperature controlled inert gas surrounds the optical path of the laser light.

    摘要翻译： 提供一种激光退火装置，其能够减少由于惰性气体的温度波动引起的激光的折射现象引起的激光的照射不均匀性。 激光退火装置包括用于向工件的至少激光照射区域供给惰性气体G的气体供给单元和用于调节惰性气体G的温度的气体温度控制器。气体温度控制器控制惰性气体的温度 气体G供应到激光照射区域，以便降低惰性气体G的温度与设置在惰性气体的供给区域之外的空间（室R）的气氛温度之间的温度差，从而控制温度 惰性气体围绕激光的光路。

    LASER ANNEALING METHOD AND APPARATUS
    2.
    发明申请
    LASER ANNEALING METHOD AND APPARATUS 有权
    激光退火方法和装置

    公开(公告)号：US20120168421A1

    公开(公告)日：2012-07-05

    申请号：US13418653

    申请日：2012-03-13

    申请人： Norihito KAWAGUCHI ,  Ryusuke KAWAKAMI ,  Kenichiro NISHIDA ,  Miyuki MASAKI ,  Masaru MORITA

    发明人： Norihito KAWAGUCHI ,  Ryusuke KAWAKAMI ,  Kenichiro NISHIDA ,  Miyuki MASAKI ,  Masaru MORITA

    IPC分类号： H05B7/18

    CPC分类号： B23K26/0608 ,  B23K26/0676 ,  B23K26/0738 ,  B23K26/082 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268

    摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.

    摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。

    Laser annealing method and apparatus
    3.
    发明授权
    Laser annealing method and apparatus 有权
    激光退火方法和装置

    公开(公告)号：US08170072B2

    公开(公告)日：2012-05-01

    申请号：US12811818

    申请日：2008-05-30

    申请人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Miyuki Masaki ,  Masaru Morita

    发明人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Miyuki Masaki ,  Masaru Morita

    IPC分类号： H01S3/10

    CPC分类号： B23K26/0608 ,  B23K26/0676 ,  B23K26/0738 ,  B23K26/082 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268

    摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.

    摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。

    LASER ANNEALING METHOD AND LASER ANNEALING DEVICE
    4.
    发明申请
    LASER ANNEALING METHOD AND LASER ANNEALING DEVICE 有权
    激光退火方法和激光退火装置

    公开(公告)号：US20120057613A1

    公开(公告)日：2012-03-08

    申请号：US13222427

    申请日：2011-08-31

    申请人： Kenichiro NISHIDA ,  Ryusuke KAWAKAMI ,  Norihito KAWAGUCHI ,  Miyuki MASAKI

    发明人： Kenichiro NISHIDA ,  Ryusuke KAWAKAMI ,  Norihito KAWAGUCHI ,  Miyuki MASAKI

    IPC分类号： H01S5/026

    CPC分类号： B23K26/0738 ,  B23K26/0608 ,  B23K26/067 ,  B23K26/0732 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285

    摘要： The energy distribution in the short-side direction of a rectangular laser beam applied to an amorphous semiconductor film (amorphous silicon film) is uniformized. It is possible to the energy distribution in the short-side direction of the rectangular laser beam by the use of a cylindrical lens array 26 or a light guide 36 and concentrating optical systems 28 and 44 or by the use of an optical system including a diffracting optical element. Accordingly, since the effective energy range of a laser beam applied to the amorphous semiconductor film is widened and the transport speed of a substrate 3 can be enhanced as much, it is possible to improve the processing ability of the laser annealing.

    摘要翻译： 施加到非晶半导体膜（非晶硅膜）的矩形激光束的短边方向上的能量分布均匀。 可以通过使用柱面透镜阵列26或光导36以及集中光学系统28和44或通过使用包括衍射的光学系统在矩形激光束的短边方向上的能量分布 光学元件。 因此，由于施加到非晶半导体膜的激光束的有效能量范围变宽，能够提高基板3的输送速度，所以能够提高激光退火的处理能力。

    LASER ANNEALING METHOD AND APPARATUS
    5.
    发明申请
    LASER ANNEALING METHOD AND APPARATUS 有权
    激光退火方法和装置

    公开(公告)号：US20110008973A1

    公开(公告)日：2011-01-13

    申请号：US12811818

    申请日：2008-05-30

    申请人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Miyuki Masaki ,  Masaru Morita

    发明人： Norihito Kawaguchi ,  Ryusuke Kawakami ,  Kenichiro Nishida ,  Miyuki Masaki ,  Masaru Morita

    IPC分类号： H01L21/268 ,  B23K26/06 ,  B23K26/067 ,  B23K26/00

    CPC分类号： B23K26/0608 ,  B23K26/0676 ,  B23K26/0738 ,  B23K26/082 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/02691 ,  H01L21/268

    摘要： In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.

    摘要翻译： 在透镜阵列式均化器光学系统的情况下，入射到入射角度和强度的激光束1进入长轴聚光光学系统的大尺寸透镜（长轴聚光透镜22） 通过在长轴透镜阵列20a和20b沿与线性光束（X方向）的长轴方向对应的方向往复运动的同时通过执行激光照射而改变每一次的后侧。 因此，垂直条纹显着减少。 此外，通过进行激光照射来改变进入设置在后侧的短轴聚光光学系统的大尺寸透镜（投影透镜30）的激光束1的入射角度和强度， 短轴透镜阵列26a和26b在与线性光束（Y方向）的短轴方向对应的方向上往复运动。 因此，水平条纹显着减少。

    LASER ANNEALING METHOD AND LASER ANNEALING DEVICE
    6.
    发明申请
    LASER ANNEALING METHOD AND LASER ANNEALING DEVICE 有权
    激光退火方法和激光退火装置

    公开(公告)号：US20100221898A1

    公开(公告)日：2010-09-02

    申请号：US12159259

    申请日：2006-11-07

    申请人： Kenichiro Nishida ,  Ryusuke Kawakami ,  Norihito Kawaguchi ,  Miyuki Masaki

    发明人： Kenichiro Nishida ,  Ryusuke Kawakami ,  Norihito Kawaguchi ,  Miyuki Masaki

    IPC分类号： H01L21/268 ,  B23K26/06

    CPC分类号： B23K26/0738 ,  B23K26/0608 ,  B23K26/067 ,  B23K26/0732 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02691 ,  H01L21/268 ,  H01L27/1285

    摘要： The energy distribution in the short-side direction of a rectangular laser beam applied to an amorphous semiconductor film (amorphous silicon film) is uniformized. It is possible to the energy distribution in the short-side direction of the rectangular laser beam by the use of a cylindrical lens array 26 or a light guide 36 and concentrating optical systems 28 and 44 or by the use of an optical system including a diffracting optical element. Accordingly, since the effective energy range of a laser beam applied to the amorphous semiconductor film is widened and the transport speed of a substrate 3 can be enhanced as much, it is possible to improve the processing ability of the laser annealing.

    摘要翻译： 施加到非晶半导体膜（非晶硅膜）的矩形激光束的短边方向上的能量分布均匀。 可以通过使用柱面透镜阵列26或光导36以及集中光学系统28和44或通过使用包括衍射的光学系统在矩形激光束的短边方向上的能量分布 光学元件。 因此，由于施加到非晶半导体膜的激光束的有效能量范围变宽，能够提高基板3的输送速度，所以能够提高激光退火的处理能力。

    Pneumatic radial tire having at least two zigzag belt layers
    7.
    发明授权
    Pneumatic radial tire having at least two zigzag belt layers 失效
    具有至少两个之字形带束层的气动子午线轮胎

    公开(公告)号：US6058997A

    公开(公告)日：2000-05-09

    申请号：US11758

    申请日：1998-02-25

    申请人： Kenichiro Nishida ,  Kazuyuki Kabe ,  Shuji Takahashi ,  Tsuneo Morikawa ,  Hitoshi Horie

    发明人： Kenichiro Nishida ,  Kazuyuki Kabe ,  Shuji Takahashi ,  Tsuneo Morikawa ,  Hitoshi Horie

    IPC分类号： B60C9/20 ,  B60C9/26 ,  B60C9/18

    CPC分类号： B60C9/263 ,  B60C9/2006 ,  B60C9/2009 ,  Y10T152/10783 ,  Y10T152/10792

    摘要： A pneumatic radial tire has at least two belt layers disposed at a tread portion thereof, wherein the two belt layers are constituted by inclining a strip formed by aligning a plurality of reinforcing cords to a tire circumferential direction and extending it zigzag in the tire circumferential direction so that the strip is turned back from the lower belt layer to the upper belt layer at both end portions of the two belt layers, and zone portions in which the reinforcing cords incline to the right in the tire circumferential direction and the zone portions in which the reinforcing cords incline to the left in the tire circumferential direction are alternately arranged.

    摘要翻译： PCT No.PCT / JP97 / 02587第 371日期：1998年2月25日 102（e）1998年2月25日PCT 1997年7月25日PCT公布。 第WO98 / 04424号公报 日期1998年2月5日充气子午线轮胎在其胎面部分具有至少两个带束层，其中两个带束层通过将通过将多根加强帘线对准轮胎周向形成的条带倾斜而形成，并且以锯齿形延伸 在轮胎周向方向上，使得条带在两个带束层的两个端部处从下带束层转移到上带束层，以及加强帘线在轮胎周向方向上向右倾斜的区域部分，以及 加强帘线在轮胎周向上向左倾斜的区域交替布置。