Bidirectional Semiconductor Device for Protection against Electrostatic Discharges
    21.
    发明申请
    Bidirectional Semiconductor Device for Protection against Electrostatic Discharges 有权
    用于防止静电放电的双向半导体器件

    公开(公告)号:US20140197448A1

    公开(公告)日:2014-07-17

    申请号:US14155891

    申请日:2014-01-15

    Abstract: An integrated circuit is produced on a bulk semiconductor substrate in a given CMOS technology and includes a semiconductor device for protection against electrostatic discharges. The semiconductor device has a doublet of floating-gate thyristors coupled in parallel and head-to-tail. Each thyristor has a pair of electrode regions. The two thyristors respectively have two separate gates and a common semiconductor gate region. The product of the current gains of the two transistors of each thyristor is greater than 1. Each electrode region of at least one of the thyristors has a dimension, measured perpendicularly to the spacing direction of the two electrodes of the corresponding pair, which is adjusted so as to impart to the thyristor an intrinsic triggering voltage less than the breakdown voltage of a transistor to be protected, and produced in the CMOS technology.

    Abstract translation: 在给定的CMOS技术中在体半导体衬底上制造集成电路,并且包括用于防止静电放电的半导体器件。 半导体器件具有并联和头对尾耦合的双栅极晶闸管。 每个晶闸管都有一对电极区域。 两个晶闸管分别具有两个单独的栅极和公共半导体栅极区域。 每个晶闸管的两个晶体管的电流增益的乘积大于1.至少一个晶闸管的每个电极区域具有垂直于相应对的两个电极的间隔方向测量的尺寸,该尺寸被调整 以便使可控硅的本征触发电压小于要保护的晶体管的击穿电压,并且在CMOS技术中产生。

    Power switch
    22.
    发明授权
    Power switch 有权
    开关;电源开关

    公开(公告)号:US08598938B2

    公开(公告)日:2013-12-03

    申请号:US13666727

    申请日:2012-11-01

    CPC classification number: H03K17/063 H01L27/0262

    Abstract: A power switch includes first and second MOS transistors in series between first and second nodes. Both the first and second transistors have a gate coupled to its substrate. First and second resistive elements are coupled between the gate of the first transistor and the first node, and between the gate of the second transistor and the second node, respectively. A triac is coupled between the first and second nodes. The gate of the triac is coupled to a third node common to the first and second transistors. A third MOS transistor has a first conduction electrode coupled to the gate of the first transistor and a second conduction electrode coupled to the gate of the second transistor.

    Abstract translation: 电源开关包括在第一和第二节点之间串联的第一和第二MOS晶体管。 第一和第二晶体管都具有耦合到其衬底的栅极。 第一和第二电阻元件分别耦合在第一晶体管的栅极和第一节点之间,以及第二晶体管的栅极和第二节点之间。 三端双向可控硅开关元件耦合在第一和第二节点之间。 三端双向可控硅开关元件的栅极耦合到第一和第二晶体管共同的第三节点。 第三MOS晶体管具有耦合到第一晶体管的栅极的第一导电电极和耦合到第二晶体管的栅极的第二导电电极。

    Bidirectional Semiconductor Device for Protection Against Electrostatic Discharges, Usable on Silicon on Insulator
    23.
    发明申请
    Bidirectional Semiconductor Device for Protection Against Electrostatic Discharges, Usable on Silicon on Insulator 有权
    用于防止静电放电的双向半导体器件,可用于绝缘体上的硅

    公开(公告)号:US20130214326A1

    公开(公告)日:2013-08-22

    申请号:US13768730

    申请日:2013-02-15

    CPC classification number: H01L29/7424 H01L27/0262 H01L29/87

    Abstract: A device includes, within a layer of silicon on insulator, a central semiconductor zone including a central region having a first type of conductivity, two intermediate regions having a second type of conductivity opposite to that of the first one, respectively disposed on either side of and in contact with the central region in order to form two PN junctions, two semiconductor end zones respectively disposed on either side of the central zone, each end zone comprising two end regions of opposite types of conductivity, in contact with the adjacent intermediate region, the two end regions of each end zone being mutually connected electrically in order to form the two terminals of the device.

    Abstract translation: 一种器件包括在绝缘体上的硅层内的包括具有第一类型导电性的中心区域的中心半导体区域,具有与第一类型导电性相反的第二类型导电率的第二类型的中间区域分别设置在 并且与中心区域接触以形成两个PN结,两个半导体端部区域分别设置在中心区域的任一侧上,每个端部区域包括与相邻中间区域接触的相反导电类型的两个端部区域, 每个端部区域的两个端部区域相互电连接以形成装置的两个端子。

    Integrated artificial neuron device

    公开(公告)号:US11954589B2

    公开(公告)日:2024-04-09

    申请号:US17572899

    申请日:2022-01-11

    Abstract: An artificial-neuron device includes an integration-generation circuit coupled between an input at which an input signal is received and an output at which an output signal is delivered, and a refractory circuit inhibiting the integrator circuit after the delivery of the output signal. The refractory circuit is formed by a first MOS transistor having a first conduction-terminal coupled to a supply node, a second conduction-terminal coupled to a common node, and a control-terminal coupled to the output, and a second MOS transistor having a first conduction-terminal coupled to the input, a second conduction-terminal coupled to a reference node at which a reference voltage is received, and a control-terminal coupled to the common node. A resistive-capacitive circuit is coupled between the supply node and the reference node and having a tap coupled to the common node, with the inhibition duration being dependent upon a time constant of the resistive-capacitive circuit.

    Integrated circuit with double isolation of deep and shallow trench-isolation type

    公开(公告)号:US11450689B2

    公开(公告)日:2022-09-20

    申请号:US16927510

    申请日:2020-07-13

    Abstract: A silicon-on-insulator semiconductor substrate supports rows extending in a direction. Each row includes complementary MOS transistors and associated contact regions allowing back gate of the complementary MOS transistors to be biased. All transistors and associated contact regions of a given row are mutually isolated by a first trench isolation. Each row is bordered on opposed edges extending parallel to said direction by corresponding second trench isolations that are shallower than the first trench isolation.

    BiMOS transistor
    28.
    发明授权

    公开(公告)号:US11387354B2

    公开(公告)日:2022-07-12

    申请号:US16870116

    申请日:2020-05-08

    Abstract: A BiMOS-type transistor includes a gate region, a channel under the gate region, a first channel contact region and a second channel contact region. The first channel contact region is electrically coupled to the gate region to receive a first potential. The second channel contact region is electrically coupled to receive a second potential.

    Transistor structure
    29.
    发明授权

    公开(公告)号:US11380766B2

    公开(公告)日:2022-07-05

    申请号:US16434920

    申请日:2019-06-07

    Abstract: A transistor includes a quasi-intrinsic region of a first conductivity type that is covered with an insulated gate. The quasi-intrinsic region extends between two first doped regions of a second conductivity type. A main electrode is provided on each of the two first doped regions. A second doped region of a second conductivity type is position in contact with the quasi-intrinsic region, but is electrically and physically separated by a distance from the two first doped regions. A control electrode is provided on the second doped region.

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