Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A panel for a display device includes a display area and a peripheral area. The display area comprises a plurality of pixels each comprising a switching element and gate lines and data lines connected to the pixels. The peripheral area comprises a plurality of gate driving integrated circuit regions, a plurality of data driving integrated circuit regions, a plurality of repair lines disposed along the edge of the panel, connecting pads connected to both ends of the repair lines, a test line connected to at least one connecting pad, and a test pad connected to the test line. A test method for detecting disconnection of the data lines is also provided.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode and a pair of redundant electrodes on the first and the second portions of the lower conductive film, respectively, the redundant electrodes exposing a part of the second portion of the lower conductive film; removing the exposed part of the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; depositing a gate insulating layer and a semiconductor layer in sequence on the gate line; depositing a lower conductive film and an upper conductive film on the semiconductor layer; photo-etching the upper conductive film, the lower conductive film, and the semiconductor layer; depositing a passivation layer; photo-etching the passivation layer to expose first and second portions of the upper conductive film; removing the first and the second portions of the upper conductive film to expose first and second portions of the lower conductive film; forming a pixel electrode on the first portion of the lower conductive film; removing the second portion of the lower conductive film to expose a portion of the semiconductor layer; and forming a columnar spacer on the exposed portion of the semiconductor layer.
Abstract:
A touch display substrate includes a first data line, a first gate line, a first pixel electrode, a second gate line, a second pixel electrode, a sensor data line and a first sensor electrode. The first data line extends along a first direction. The first gate line extends along a second direction. The first pixel electrode is electrically connected to the first data line and the first gate line. The second gate line is substantially parallel with the first gate line. The second pixel electrode is adjacent to the first pixel electrode and electrically connected to the first data line and the second gate line. The sensor data line is adjacent to the second pixel electrode and substantially parallel to the first data line. The first sensor electrode is electrically connected to the sensor data line.
Abstract:
The present invention relates to a transition metal catalyst composition which can exhibit high reactivity in a polymerization reaction of a polyolefin and can easily control characteristics such as chemical structure, molecular weight distribution, mechanical properties, and the like of a synthesized polyolefin, and a method of preparing a polyolefin using the catalyst composition.
Abstract:
The present description relates to an olefin block copolymer preferably useful to form nonslip pads due to excellences in elasticity and heat resistance, and a sheet-shaped molded body comprising the olefin block copolymer The olefin block copolymer includes a plurality of blocks or segments, each of which includes an ethylene or propylene repeating unit and an α-olefin repeating unit at different weight fractions. The olefin block copolymer satisfies a defined relationship when a load of 5 to 10 kg is applied to a sheet-shaped molded body of the block copolymer for 12 hours or longer at a temperature of 60° C. or higher, and then removed.
Abstract:
The present invention relates to a novel post metallocene-type ligand compound, to a metal compound containing the ligand compound, to a catalytic composition containing the metal compound, and to a method for preparing same, as well as to a method for preparing olefin polymers using the catalytic composition. The present invention provides a catalyst for preparing special polyolefin-based polymers having excellent activity.
Abstract:
A thin film transistor array panel comprises a repair line disposed in a peripheral area of a display area and being configured to repair when at least one of a gate line and a data line are disconnected, and a detour line disposed in the peripheral area and comprising at least one resistor having higher resistance than a remaining portion of the detour line, wherein both ends of the detour line are connected to the repair line to protect the array panel.