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    Etching method used in fabrications of microstructures
    21.
    发明申请
    Etching method used in fabrications of microstructures 有权
    用于微结构制造中的蚀刻方法

    公开(公告)号：US20050020089A1

    公开(公告)日：2005-01-27

    申请号：US10666002

    申请日：2003-09-17

    Applicant: Hongqin Shi ,  Gregory Schaadt ,  Andrew Huibers ,  Satyadev Patel

    Inventor： Hongqin Shi ,  Gregory Schaadt ,  Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/08 ,  H01L21/00 ,  H01L21/302 ,  H01L21/461

    CPC classification number: H01L21/67069 ,  B81C1/00595 ,  B81C2201/0132 ,  G02B26/0841

    Abstract: The present invention discloses a method and apparatus for removing the sacrificial materials in fabrications of microstructures using a vapor phase etchant recipe having a spontaneous vapor phase chemical etchant. The vapor phase etchant recipe has a mean-free-path corresponding to the minimum thickness of the sacrificial layers between the structural layers of the microstructure. This method is of particular importance in removing the sacrificial layers underneath the structural layers of the microstructure.

    Abstract translation: 本发明公开了一种使用具有自发气相化学蚀刻剂的气相蚀刻剂配方去除微结构制造中的牺牲材料的方法和装置。 气相蚀刻剂配方具有对应于微结构的结构层之间的牺牲层的最小厚度的平均自由程。 该方法在去除微结构结构层下面的牺牲层时尤其重要。

    Performance analyses of micromirror devices
    23.
    发明授权
    Performance analyses of micromirror devices 有权
    微镜器件的性能分析

    公开(公告)号：US07483126B2

    公开(公告)日：2009-01-27

    申请号：US10875760

    申请日：2004-06-23

    Applicant: Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    Inventor： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

    IPC: G01N21/88 ,  G02B26/00

    CPC classification number: G01N21/55 ,  G01N21/95

    Abstract: The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.

    Abstract translation: 本发明提供一种用于通过测量各个微镜对电场驱动力的机电响应来评估微镜阵列器件的产品质量和性能的方法和装置。 根据本发明的微反射镜的机电响应以与操作状态相关联的旋转角度进行描述，例如当微镜阵列器件在二进制编码器中操作时，ON和OFF状态的ON和OFF状态角， 状态模式以及各个微镜对驱动场的响应速度（即，微镜器件从一个状态转移到另一个状态所需的时间间隔）。

    Spatial light modulators with non-uniform pixels
    25.
    发明授权
    Spatial light modulators with non-uniform pixels 有权
    具有不均匀像素的空间光调制器

    公开(公告)号：US07158279B2

    公开(公告)日：2007-01-02

    申请号：US10969503

    申请日：2004-10-19

    Applicant: Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    Inventor： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    IPC: G02B26/00 ,  G02B26/08

    CPC classification number: G02B26/0833 ,  G02B26/0841 ,  H04N9/3114 ,  Y10S359/904

    Abstract: A micromirror array comprises micromirrors of different properties for use particularly in display systems. Micromirrors of different properties can be arranged within the micromirror array according to a predetermined pattern, or randomly. However, it is advantageous to arrange the micromirrors with different properties within the micromirror array neither in complete order nor complete in random.

    Abstract translation: 微镜阵列包括用于特别在显示系统中的不同性质的微镜。 可以根据预定图案或随机地将不同性质的微镜布置在微镜阵列内。 然而，有利的是在微镜阵列内布置具有不同特性的微反射镜，既不是完全顺序的也不是随机完成的。

    Micromirror having offset addressing electrode
    26.
    发明授权
    Micromirror having offset addressing electrode 有权
    具有偏移寻址电极的微镜

    公开(公告)号：US07113322B2

    公开(公告)日：2006-09-26

    申请号：US10947005

    申请日：2004-09-21

    Applicant: Satyadev Patel

    Inventor： Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: The micromirror device of the present invention comprises a reflective deflectable mirror plate and an addressing electrode provided for deflecting the mirror plate, wherein the addressing electrode is displaced along a direction perpendicular to the length of the hinge such that a portion of the addressing electrode is extended beyond the mirror plate.

    Abstract translation: 本发明的微反射镜装置包括反射偏转镜板和用于偏转镜板的寻址电极，其中寻址电极沿垂直于铰链长度的方向移位，使得寻址电极的一部分延伸 超越镜面板。

    Micromirror and post arrangements on substrates
    27.
    发明授权
    Micromirror and post arrangements on substrates 有权

    公开(公告)号：US07042622B2

    公开(公告)日：2006-05-09

    申请号：US10698563

    申请日：2003-10-30

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

    LIGHT BLOCKING LAYERS IN MEMS PACKAGES
    28.
    发明申请
    LIGHT BLOCKING LAYERS IN MEMS PACKAGES 有权
    MEMS封装中的闭锁层

    公开(公告)号：US20060082859A1

    公开(公告)日：2006-04-20

    申请号：US10969258

    申请日：2004-10-19

    Applicant: Andrew Huibers ,  Satyadev Patel ,  Terry Tarn

    Inventor： Andrew Huibers ,  Satyadev Patel ,  Terry Tarn

    IPC: G02B26/00

    CPC classification number: G02B26/0833

    Abstract: Disclosed herein is a micromirror array device package having a light absorbing material disposed within the package for reducing undesired light scattering. The light absorbing material can be deposited as a thin film (or strip, frame, segments or a combination thereof), or as a vertical wall insert between the micromirror array device and a cover substrate of the package.

    Abstract translation: 本文公开了一种微镜阵列器件封装，其具有设置在封装内的光吸收材料，用于减少不期望的光散射。 光吸收材料可以作为薄膜（或条，框架，段或其组合）沉积，或者作为微镜阵列器件和封装的覆盖衬底之间的垂直壁插入物沉积。

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