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141 条记录 (耗时 0.035 秒)

    Cathode ray tube having metal film with holes located on upper and side portions of phosphor areas
    21.
    发明授权
    Cathode ray tube having metal film with holes located on upper and side portions of phosphor areas 失效
    阴极射线管，其具有位于荧光体区域的上部和侧部上的孔的金属膜

    公开(公告)号：US06274976B1

    公开(公告)日：2001-08-14

    申请号：US09215455

    申请日：1998-12-17

    申请人： Toshimasa Ishigaki ,  Masahiro Nishizawa ,  Fumio Takahashi ,  Tetsuo Suzuki

    发明人： Toshimasa Ishigaki ,  Masahiro Nishizawa ,  Fumio Takahashi ,  Tetsuo Suzuki

    IPC分类号： H01J2910

    CPC分类号： H01J29/327 ,  H01J29/28

    摘要： A cathode ray tube has a metal film formed to cover phosphor areas of a phosphor layer on an inner wall of a panel portion of an envelope. The metal film is formed over an organic film resin applied to the phosphor layer, the organic film resin is baked and removed so that the metal film covers the phosphor layer, and cracks are formed in the metal film in a greater number on side portions of the phosphor areas than on an upper portion of the phosphor areas. This construction results in a cathode ray tube with a metal film that can prevent a blister phenomenon and a reduction in brightness.

    摘要翻译： 阴极射线管具有形成为覆盖在信封的面板部的内壁上的荧光体层的荧光体区域的金属膜。 金属膜形成在施加到荧光体层上的有机膜树脂上，有机膜树脂被烘烤和去除，使得金属膜覆盖荧光体层，并且在金属膜中在更多数量的侧面上形成裂纹 荧光体区域比荧光体区域的上部。 这种结构产生具有金属膜的阴极射线管，其能够防止起泡现象和亮度降低。

    Coating machine having a timer for continuously forming a coating of uniform thickness on a substrate
    23.
    发明授权
    Coating machine having a timer for continuously forming a coating of uniform thickness on a substrate 失效
    涂布机具有用于在基板上连续形成均匀厚度的涂层的定时器

    公开(公告)号：US6139639A

    公开(公告)日：2000-10-31

    申请号：US700421

    申请日：1996-08-28

    申请人： Yoshiyuki Kitamura ,  Hideo Ido ,  Tetsuo Suzuki ,  Kazuhiko Abe ,  Hiromitsu Kanamori ,  Tetsuya Goto ,  Takayoshi Akamatsu ,  Masaharu Tooyama ,  Toshihide Sekido

    发明人： Yoshiyuki Kitamura ,  Hideo Ido ,  Tetsuo Suzuki ,  Kazuhiko Abe ,  Hiromitsu Kanamori ,  Tetsuya Goto ,  Takayoshi Akamatsu ,  Masaharu Tooyama ,  Toshihide Sekido

    IPC分类号： B05C5/02 ,  B05C9/02 ,  B05C3/00

    CPC分类号： B05C5/0254 ,  B05C5/0208 ,  B05C9/02 ,  Y10S118/02

    摘要： A coating apparatus which comprises a feeding means to feed a coating liquid, a coating liquid applicator having a slot extending in one direction to discharge the coating liquid fed by the feeding means, and a conveying means to move at least either the coating liquid applicator or a substrate to be coated with the coating liquid relatively one to the other, comprising: (a) a first control means which comprises (a-1) a position detecting means to detect positions of the coating liquid applicator or the substrate which is moved by the conveying means, and (a-2) a controller capable of stopping the coating liquid applicator or the substrate which is moved by the conveying means at a position detected by the position detecting means such that a start-of-coating line of the substrate is in register with the slot of the coating liquid applicator and capable of starting the movement of the coating liquid applicator or the substrate which is stopped at the position; and (b) a second control means which comprises a timer controller capable of transmitting a signal to the controller of the first control means for the movement of the coating liquid applicator or the substrate which is stopped at the position after a desired period which begins with commencement of feeding the coating liquid and is needed for forming a coating liquid bead which is in contact with both the exit aperture of the slot of the coating liquid applicator and the substrate at the start-of-coating line.

    摘要翻译： PCT No.PCT / JP95 / 02741 Sec。 371日期：1996年8月28日 102（e）日期1996年8月28日PCT 1995年12月27日PCT PCT。 第WO96 / 20045号公报 日期1996年7月4日一种涂布装置，其特征在于，包括供给装置，用于供给涂布液，涂布液涂布器，其具有沿一个方向延伸的槽，以排出由所述进给装置供给的涂布液;以及输送装置， 所述涂布液施加器或相对于所述涂布液涂布的基板包括：（a）第一控制装置，其包括：（a-1）位置检测装置，用于检测涂布液施加器的位置或 通过输送装置移动的基板和（a-2）能够停止由位置检测装置检测的位置处被输送装置移动的涂布液施加器或基板的控制器， 基材的涂布线与涂布液施加器的槽对准，并且能够开始涂布液施加器或停止在该位置的基板的移动; 和（b）第二控制装置，其包括定时器控制器，该定时器控制器能够向第一控制装置的控制器发送信号，用于使涂料液施加器或基板停止在所述期间之后的位置移动 开始进料涂布液体，并且需要形成与涂布液施加器的槽的出口孔和涂层开始线处的基板两者接触的涂布液珠。

    Ink jet recording apparatus
    24.
    发明授权
    Ink jet recording apparatus 失效
    喷墨记录装置

    公开(公告)号：US6092892A

    公开(公告)日：2000-07-25

    申请号：US416096

    申请日：1995-04-04

    申请人： Masahiro Taniguro ,  Tetsuo Suzuki ,  Hiroyuki Saito ,  Koichi Tanno ,  Haruyuki Yanagi ,  Makoto Kawarama ,  Hiroyuki Kinoshita ,  Masaya Shinmachi ,  Tan At Ming

    发明人： Masahiro Taniguro ,  Tetsuo Suzuki ,  Hiroyuki Saito ,  Koichi Tanno ,  Haruyuki Yanagi ,  Makoto Kawarama ,  Hiroyuki Kinoshita ,  Masaya Shinmachi ,  Tan At Ming

    IPC分类号： B41J2/21 ,  B41J2/01 ,  B41J11/00 ,  B41J11/02 ,  B41J11/08 ,  B41J13/00 ,  B41J13/10

    CPC分类号： B41J11/08 ,  B41J11/005 ,  B41J13/10

    摘要： An ink jet recording apparatus having an image recording area for performing image recording onto a recording medium includes a head holding portion for holding an ink jet recording head, a platen, and a recording medium exhausting device. The platen has planar and facial sections. The planar section supports the recording medium opposed to the ink discharge ports in the image recording area. The facial section is disposed downstream of the image recording area with respect to a conveyance direction of the recording medium, and extends in a direction away from the ink discharge ports toward the conveyance direction. The planar section and the facial section are continuous, and the angle between the extension of the planar section and the facial section is from 3.7 to 7.5 degrees. The recording medium exhausting device, disposed downstream of the facial section of the platen in the conveyance direction, exhausts the recording medium from the recording area by guiding the recording medium from the extension of the planar section of the platen in a direction closer to the facial section of the platen.

    摘要翻译： 具有用于在记录介质上进行图像记录的图像记录区域的喷墨记录装置包括用于保持喷墨记录头，压板和记录介质排出装置的头保持部分。 压板有平面和面部。 平面部分支持与图像记录区域中的排墨口相对的记录介质。 面部部分相对于记录介质的输送方向设置在图像记录区域的下游，并且沿着远离排墨口的方向朝向输送方向延伸。 平面部分和面部部分是连续的，并且平面部分和面部部分的延伸部之间的角度为3.7至7.5度。 记录介质排出装置设置在输送方向上的压板的面部部分的下游，通过从压板的平面部分的延伸部向接近面部的方向引导记录介质，从记录区域排出记录介质 压板的截面。

    Polishing fluid composition and polishing method
    28.
    发明授权
    Polishing fluid composition and polishing method 失效
    抛光液组成和抛光方法

    公开(公告)号：US5885334A

    公开(公告)日：1999-03-23

    申请号：US857366

    申请日：1997-05-15

    申请人： Tetsuo Suzuki ,  Yoshihiro Hara

    发明人： Tetsuo Suzuki ,  Yoshihiro Hara

    IPC分类号： C09G1/02 ,  C09K3/14 ,  C09K13/04

    CPC分类号： C09G1/02 ,  C09K3/1463

    摘要： The present invention provides a polishing fluid composition which can effectively polish a surface of a semiconductor silicon wafer or a surface of a film comprising silicon to be formed on silicon wafers with a markedly reduced amount of colloidal silica to be used as abrasives, or a polishing fluid composition which is particularly useful for a polishing step after removal of an oxide layer in a two-step polishing method. The former polishing fluid composition comprises an alkaline suspension which contains a water-soluble silicic acid component, colloidal silica and an alkaline component, and which has a pH value of 8.5 to 13. Meanwhile, the latter polishing fluid composition comprises an alkaline solution which contains a water-soluble silicic acid component and an alkaline component, and which has a pH value of 8.5 to 13; and is substantially free of abrasive particles.

    摘要翻译： 本发明提供了一种抛光液组合物，其可以有效地抛光半导体硅晶片的表面或包含待形成硅晶片的表面，其中硅晶片的显微减少量用作研磨剂，或抛光 流体组合物，其特别可用于在两步抛光方法中除去氧化物层之后的抛光步骤。 前述抛光液组合物含有含有水溶性硅酸成分，胶体二氧化硅和碱性成分的碱性悬浮液，其pH值为8.5〜13。另外，后者的研磨液组合物含有碱溶液，其含有 水溶性硅酸成分和碱性成分，pH值为8.5〜13， 并且基本上不含磨料颗粒。

    Mechanism for mounting and removing head member and recording apparatus provided with such mechanism
    29.
    发明授权
    Mechanism for mounting and removing head member and recording apparatus provided with such mechanism 失效
    用于安装和移除头部构件和设置有这种机构的记录装置的机构

    公开(公告)号：US5872581A

    公开(公告)日：1999-02-16

    申请号：US560984

    申请日：1995-11-20

    申请人： Haruyuki Yanagi ,  Tetsuo Suzuki ,  Hiroyuki Saito ,  Koichi Tanno ,  Makoto Kawarama ,  Hiroyuki Kinoshita ,  Masaya Shinmachi ,  Tan At Ming

    发明人： Haruyuki Yanagi ,  Tetsuo Suzuki ,  Hiroyuki Saito ,  Koichi Tanno ,  Makoto Kawarama ,  Hiroyuki Kinoshita ,  Masaya Shinmachi ,  Tan At Ming

    IPC分类号： B41J2/01 ,  B41J25/304 ,  B41J25/34 ,  B41J2/14

    CPC分类号： B41J25/34

    摘要： A recording apparatus includes a carriage capable of mounting and removing a head member, one side portion provided with a positioning unit for the carriage unit to position the head member, a head holding unit for holding the head member, being relatively movable with respect to the one side portion, an operational unit that engages with the head holding unit to move such head holding unit relatively with respect to the one side portion, a first biasing device for biasing the operational unit in the same direction as that in which the head holding member approaches the one side portion, a stopper arranged on the carriage for regulating the biasing force of the first biasing device in a given position, at the same time, causing the biasing force of the first biasing device not to be exerted on the operational unit in the given position, and a second biasing device for biasing the head holding unit in the direction in which such unit parts further away from the one side portion. With the structure thus arranged, a recording head can be removed from the carriage without any additional power from the user or the like once the operational unit is allowed to move to a given position where the stopper acts. The head removal is reliably executable just by one action.

    摘要翻译： 记录装置包括能够安装和拆卸头部构件的托架，设置有用于托架单元的定位单元以定位头部构件的托架，用于保持头部构件的头部保持单元，该头部保持单元相对于 一个侧部，与头部保持单元接合以相对于一个侧部移动该头部保持单元的操作单元，用于沿与头部保持构件的相同方向偏压操作单元的第一偏压装置 接近一侧部分，设置在滑架上用于调节给定位置的第一偏压装置的偏置力的止动件，同时使得第一偏置装置的偏置力不会施加在操作单元上 以及第二偏压装置，用于使所述头部保持单元沿所述单元部分远离所述一个侧部的方向偏压。 利用如此布置的结构，一旦允许操作单元移动到停止器作用的给定位置，记录头可以从托架移除而不需要用户等的任何额外的动力。 头部移除可靠地执行，只需一个动作。