公开(公告)号：US07985958B2

公开(公告)日：2011-07-26

申请号：US11268603

申请日：2005-11-08

申请人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

发明人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

IPC分类号： H01J37/153

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/15 ,  H01J2237/30433

摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.

摘要翻译： 根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分， 指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部 部分。

公开(公告)号：US07368736B2

公开(公告)日：2008-05-06

申请号：US11378471

申请日：2006-03-20

申请人： Shunko Magoshi

发明人： Shunko Magoshi

IPC分类号： H01J37/302

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

摘要： A exposure apparatus includes a charged beam radiating unit configured to radiate a charged beam, a shaping unit including an opening for shaping the beam, a storage unit to store a history of data concerning a beam area of the beam on the shaping unit, a predicting unit to predict change amount of dimensions of the beam passing through the opening to design dimensions of the opening, the predicting the change amount being carried out based on a relation between the beam area previously prepared and change amount of the dimensions of the beam passing through the opening to the design dimensions of the opening, and a correcting unit to correct dimension of a pattern which corresponds to the beam and is to be formed on the sample based on the change amount predicted by the predicting unit.

摘要翻译： 曝光装置包括被配置为辐射带电束的带电波束辐射单元，包括用于使波束成形的开口的整形单元，存储单元，用于存储关于波束在成形单元上的波束面积的数据历史，预测 单元，用于预测通过开口的光束的尺寸的变化量以设计开口的尺寸，基于先前准备的光束面积与通过的光束的尺寸的变化量之间的关系来预测正在执行的变化量 基于所述预测单元所预测的变化量的校正单元，其对应于所述光束并形成在样本上的图案的尺寸进行校正。

公开(公告)号：US20060151721A1

公开(公告)日：2006-07-13

申请号：US11268603

申请日：2005-11-08

申请人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

发明人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

IPC分类号： G21K5/10

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/15 ,  H01J2237/30433

摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.

摘要翻译： 根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分， 指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部 部分。

公开(公告)号：US20050167661A1

公开(公告)日：2005-08-04

申请号：US10994242

申请日：2004-11-23

申请人： Kazuo Tawarayama ,  Shunko Magoshi

发明人： Kazuo Tawarayama ,  Shunko Magoshi

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01L21/00 ,  H01L21/66 ,  H01L23/58

CPC分类号： G03F7/70616

摘要： A lithography evaluating method comprises preparing a substrate, the substrate including a semiconductor substrate and a wiring structure including at least one wiring layer formed on the semiconductor substrate, partitioning the substrate into a plurality of regions to be evaluated, and obtaining a value of property relating to the wiring structure previously, and evaluating proximity effect on each of the plurality of regions to be evaluated based on the value of the property relating to the wiring structure.

摘要翻译： 光刻评估方法包括准备衬底，所述衬底包括半导体衬底和布线结构，所述布线结构包括形成在所述半导体衬底上的至少一个布线层，将所述衬底划分成多个要评估的区域，并获得相关的属性值 并且基于与布线结构相关的属性的值来评估要评估的多个区域中的每一个上的接近效应。

公开(公告)号：US06675368B2

公开(公告)日：2004-01-06

申请号：US09962454

申请日：2001-09-26

申请人： Mariko Takayanagi ,  Shunko Magoshi ,  Tatsuya Ohguro

发明人： Mariko Takayanagi ,  Shunko Magoshi ,  Tatsuya Ohguro

IPC分类号： G06F1750

CPC分类号： H01J37/3026 ,  H01J2237/31764 ,  Y10T428/24802

摘要： A method divides a layout area of an electronic part into sections, designs patterns according to circuit data of de electronic part, and draws the patterns in the layout area section by section so that the patterns in the sections may collectively form the electronic part. The method detects, among the patterns, any violation pattern that may cause a characteristic failure in the electronic part due to a section-to section connection error. Such violation pattern has a size L smaller than a threshold “k*La” where La is a section-to-section connection allowance and k is a coefficient. Also provided is an apparatus for executing the method.

摘要翻译： 一种方法将电子部件的布局区域划分为部分，根据电子部件的电路数据设计图案，并逐段绘制布局区域中的图案，使得部分中的图案可以共同形成电子部件。 该方法在模式之中检测到可能由于段到段连接错误而导致电子部件中的特征故障的任何违规模式。 这种违反模式的尺寸L小于阈值“k * La”，其中La是截面连接容限，k是系数。 还提供了一种用于执行该方法的装置。