Electron beam line evaporator
    22.
    发明授权
    Electron beam line evaporator 失效
    电子束线蒸发器

    公开(公告)号:US4778974A

    公开(公告)日:1988-10-18

    申请号:US37662

    申请日:1987-04-13

    CPC分类号: H01J37/305 H01J37/147

    摘要: An electron beam line evaporator for coating heat-sensitive strips or substrates includes a magnetic trap overlying an evaporation crucible to prevent unpermissible heating and static electrification by back-scattered electrons, complemented with means to influence the injection angle of a dynamically deflected electron beam in such a manner that the beam enters the horizontal magnetic field of the trap at the same angle in each deflection phase independent of stray fields. Such means are arranged inside a gap of a pole shoe necessary for the horizontal magnetic field used by the trap and are operative to generate a vertical magnetic field variable in time and locally alongside the pole shoe.

    摘要翻译: 用于涂覆热敏胶条或基材的电子束线蒸发器包括覆盖在蒸发坩埚上的磁捕集器,以防止不可允许的加热和由后向散射的电子静电带电,补充了影响动态偏转的电子束在其中的注入角度的手段 波束在每个偏转阶段以相同的角度进入陷阱的水平磁场,而不考虑杂散场。 这种装置布置在用于由捕集器使用的水平磁场所需的极靴的间隙内,并且可操作地在时间上产生可变的垂直磁场并且在极靴旁边局部地产生。

    PROCESSING-FRIENDLY DIANHYDRIDE HARDENER FOR EPOXY RESIN SYSTEMS BASED ON 5,5'-CARBONYLBIS(ISOBENZOFURAN-1,3-DIONE)
    24.
    发明申请
    PROCESSING-FRIENDLY DIANHYDRIDE HARDENER FOR EPOXY RESIN SYSTEMS BASED ON 5,5'-CARBONYLBIS(ISOBENZOFURAN-1,3-DIONE) 审中-公开
    基于5,5'-碳双环(ISOBENZOFURAN-1,3-DIONE)的环氧树脂体系的加工友好的二氢硬化剂

    公开(公告)号:US20150175740A1

    公开(公告)日:2015-06-25

    申请号:US14575397

    申请日:2014-12-18

    IPC分类号: C08G59/42 C08G59/40

    摘要: The present invention provides a composition comprising 5,5′-carbonylbis(isobenzofuran-1,3-dione), 3,3′,4,4′-benzophenonetetracarboxylic acid and at least one monoanhydride compound selected from the group consisting of methylhexahydroisobenzofuran-1,3-dione, 5-methyl-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione, 5-methyl-3a,4,7,7a-tetrahydroisobenzofuran-1,3-dione, 3-methylfuran-2,5-dione, 3,3,4,4,5,5-hexafluorodihydro-2H-pyran-2,6(3H)-dione and 3,3-dimethyldihydrofuran-2,5-dione. The invention also provides a hardener system for an epoxy resin, said hardener system comprising said composition. The invention also provides a method for hardening an epoxy resin employing the inventive composition.

    摘要翻译: 本发明提供了包含5,5'-羰基双(异苯并呋喃-1,3-二酮),3,3',4,4'-二苯甲酮四羧酸和至少一种选自甲基六氢异苯并呋喃-1 ,3-二酮,5-甲基-3a,4,7,7a-四氢-4,7-甲氧基异苯并呋喃-1,3-二酮,5-甲基-3a,4,7,7a-四氢异苯并呋喃-1,3-二酮 ,3-甲基呋喃-2,5-二酮,3,3,4,4,5,5-六氟二氢-2H-吡喃-2,6(3H) - 二酮和3,3-二甲基二氢呋喃-2,5-二酮。 本发明还提供了一种用于环氧树脂的硬化剂体系,所述硬化剂体系包括所述组合物。 本发明还提供了使用本发明组合物硬化环氧树脂的方法。

    PROCESSING-FRIENDLY DIANHYDRIDE HARDENER FOR EPOXY RESIN SYSTEMS BASED ON 5,5'-OXYBIS(ISOBENZOFURAN-1,3-DIONE)
    25.
    发明申请
    PROCESSING-FRIENDLY DIANHYDRIDE HARDENER FOR EPOXY RESIN SYSTEMS BASED ON 5,5'-OXYBIS(ISOBENZOFURAN-1,3-DIONE) 审中-公开
    基于5,5'-氧化物(ISOBENZOFURAN-1,3-DIONE)的环氧树脂体系的加工友好的二氢硬化剂

    公开(公告)号:US20150175738A1

    公开(公告)日:2015-06-25

    申请号:US14575331

    申请日:2014-12-18

    IPC分类号: C08G59/16

    摘要: The present invention provides a composition comprising 5,5′-oxybis(isobenzofuran-1,3-dione), 4,4′-oxybis(ortho-phthalic acid) and at least one monoanhydride compound selected from the group consisting of methylhexahydroisobenzofuran-1,3-dione, 5-methyl-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione, 5-methyl-3 a,4,7,7a-tetrahydroisobenzofuran-1,3-dione, 3-methylfuran-2,5-dione, 3,3,4,4,5,5-hexafluorodihydro-2H-pyran-2,6(3H)-dione, and 3,3-dimethyldihydrofuran-2,5-dione. The invention also provides a hardener system for epoxy resins, said hardener system comprising said composition. The invention also provides a method for hardening of epoxy resins employing the inventive composition.

    摘要翻译: 本发明提供一种组合物,其包含5,5'-氧双(异苯并呋喃-1,3-二酮),4,4'-氧双(邻 - 邻苯二甲酸)和至少一种选自甲基六氢异苯并呋喃-1 ,5-甲基-3a,4,7,7a-四氢-4,7-甲氧基异苯并呋喃-1,3-二酮,5-甲基-3a,4,7,7a-四氢异苯并呋喃-1,3-二酮, 二酮,3-甲基呋喃-2,5-二酮,3,3,4,4,5,5-六氟二氢-2H-吡喃-2,6(3H) - 二酮和3,3-二甲基二氢呋喃-2,5-二酮, 二酮 本发明还提供一种用于环氧树脂的硬化剂体系,所述硬化剂体系包括所述组合物。 本发明还提供了使用本发明组合物硬化环氧树脂的方法。

    Process for preparing high-purity cyclopropyl methyl ketone
    29.
    发明授权
    Process for preparing high-purity cyclopropyl methyl ketone 失效
    制备高纯度环丙基甲基酮的方法

    公开(公告)号:US6045662A

    公开(公告)日:2000-04-04

    申请号:US033071

    申请日:1998-03-02

    摘要: A process for preparing high-purity cyclopropyl methyl ketone from compositions which contain cyclopropyl methyl ketone, 4,5-dihydro-2-methylfuran, addition products of 4,5-dihydro-2-methylfuran by a continuous rectification process in which at least a portion of the composition to be purified is introduced into a rectification apparatus via a side feed located above the bottom portion of the apparatus.

    摘要翻译: 从含有环丙基甲基酮,4,5-二氢-2-甲基呋喃,通过连续精馏方法的4,5-二氢-2-甲基呋喃的加成产物的组合物制备高纯度环丙基甲基酮的方法,其中至少一种 要净化的组合物的部分经由位于装置的底部上方的侧进料引入精馏装置。

    Process for ion-supported vacuum coating
    30.
    发明授权
    Process for ion-supported vacuum coating 失效
    离子支持真空镀膜工艺

    公开(公告)号:US5846608A

    公开(公告)日:1998-12-08

    申请号:US722024

    申请日:1996-10-11

    摘要: A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.

    摘要翻译: PCT No.PCT / DE95 / 00476 Sec。 371日期:1996年10月11日 102(e)日期1996年10月11日PCT提交1995年4月7日PCT公布。 公开号WO95 / 28508 日期:1995年10月26日一种用于离子支持真空涂层的装置。 该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面,导电和电绝缘基板的高速涂布。 基底主要是带状,特别是宽度超过一米的塑料片。 根据本发明,在本来已知的用于真空涂覆的装置中,将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底,直接设置在其后面的电极,例如, 冷却辊相对于等离子体或几乎处于等离子体电位的电极。 脉冲的形式,电压和持续时间适用于涂层任务和材料。 该方法特别用于沉积磨损保护,防腐蚀和阻隔涂层。 用户是包装行业等。