公开(公告)号：US5846608A

公开(公告)日：1998-12-08

申请号：US722024

申请日：1996-10-11

申请人： Manfred Neumann ,  Klaus Goedicke ,  Siegfried Schiller ,  Jonathan Reschke ,  Henry Morgner ,  Falk Milde ,  Fred Fietzke

发明人： Manfred Neumann ,  Klaus Goedicke ,  Siegfried Schiller ,  Jonathan Reschke ,  Henry Morgner ,  Falk Milde ,  Fred Fietzke

IPC分类号： H05H1/32 ,  C23C14/32 ,  C23C14/56 ,  H01J37/32 ,  H05H1/46 ,  C23C14/08

CPC分类号： H01J37/32422 ,  C23C14/32 ,  C23C14/562 ,  H01J37/32706

摘要： A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.

摘要翻译： PCT No.PCT / DE95 / 00476 Sec。 371日期：1996年10月11日 102（e）日期1996年10月11日PCT提交1995年4月7日PCT公布。 公开号WO95 / 28508 日期：1995年10月26日一种用于离子支持真空涂层的装置。 该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面，导电和电绝缘基板的高速涂布。 基底主要是带状，特别是宽度超过一米的塑料片。 根据本发明，在本来已知的用于真空涂覆的装置中，将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底，直接设置在其后面的电极，例如， 冷却辊相对于等离子体或几乎处于等离子体电位的电极。 脉冲的形式，电压和持续时间适用于涂层任务和材料。 该方法特别用于沉积磨损保护，防腐蚀和阻隔涂层。 用户是包装行业等。

公开(公告)号：US6130002A

公开(公告)日：2000-10-10

申请号：US91487

申请日：1998-07-22

申请人： Manfred Neumann ,  Siegfried Schiller ,  Henry Morgner ,  Nicolas Schiller ,  Steffen Straach

发明人： Manfred Neumann ,  Siegfried Schiller ,  Henry Morgner ,  Nicolas Schiller ,  Steffen Straach

IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C14/32 ,  B32B9/00 ,  H05H1/00

CPC分类号： C23C14/08 ,  C23C14/0021 ,  C23C14/32 ,  Y10T428/31663

摘要： Method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of evaporation material comprising nitride-forming evaporation material and one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate. A method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate. Substrates with an organically-modified oxide, oxinitride or nitride layer, as produced by the methods, wherein the at least one layer deposited by plasma-enhanced, high-rate vapor deposition includes more than 50 wt% of inorganic molecules and less than 50 wt% of partially cross-linked organic molecules.

摘要翻译： PCT No.PCT / DE96 / 02434 Sec。 371日期：1998年7月22日 102（e）日期1998年7月22日PCT 1996年12月13日PCT PCT。 公开号WO97 / 23661 日期1997年7月3日通过使包含氮化物形成蒸发材料和氧化物和低氧化物蒸发材料之一的蒸发材料的等离子体增强蒸发在衬底上真空涂覆来生产至少一种有机改性氧化物，氮氧化物或氮化物层的方法，其中 通过使用气体单体和包括氧和氮中的至少一种的反应性气体，通过等离子体增强的反应性高速蒸发蒸发材料沉积至少一层，并且其中蒸发材料，气体单体和反应性 气体立即在基板的前方通过高密度等离子体区域。 一种用于通过氧化物和低氧化物蒸发材料之一的等离子体增强蒸发在衬底上真空涂覆来生产至少一种有机改性氧化物，氮氧化物或氮化物层的方法，其中所述至少一层通过等离子体增强的反应性沉积 使用气体单体和包括至少一种氧气和氮气的反应气体蒸发材料的高速蒸发，并且其中蒸发材料，气体单体和反应性气体立即通过高密度等离子体区域 底物。 通过该方法制备的具有有机改性的氧化物，氮氧化物或氮化物层的衬底，其中通过等离子体增强的高速气相沉积沉积的至少一层包括超过50重量％的无机分子和小于50重量％ ％的部分交联的有机分子。

公开(公告)号：US4778974A

公开(公告)日：1988-10-18

申请号：US37662

申请日：1987-04-13

申请人： Manfred Neumann ,  Siegfried Schiller ,  Henry Morgner ,  Peter Unganz

发明人： Manfred Neumann ,  Siegfried Schiller ,  Henry Morgner ,  Peter Unganz

IPC分类号： H01J37/147 ,  H01J37/305 ,  B23K15/00

CPC分类号： H01J37/305 ,  H01J37/147

摘要： An electron beam line evaporator for coating heat-sensitive strips or substrates includes a magnetic trap overlying an evaporation crucible to prevent unpermissible heating and static electrification by back-scattered electrons, complemented with means to influence the injection angle of a dynamically deflected electron beam in such a manner that the beam enters the horizontal magnetic field of the trap at the same angle in each deflection phase independent of stray fields. Such means are arranged inside a gap of a pole shoe necessary for the horizontal magnetic field used by the trap and are operative to generate a vertical magnetic field variable in time and locally alongside the pole shoe.

摘要翻译： 用于涂覆热敏胶条或基材的电子束线蒸发器包括覆盖在蒸发坩埚上的磁捕集器，以防止不可允许的加热和由后向散射的电子静电带电，补充了影响动态偏转的电子束在其中的注入角度的手段 波束在每个偏转阶段以相同的角度进入陷阱的水平磁场，而不考虑杂散场。 这种装置布置在用于由捕集器使用的水平磁场所需的极靴的间隙内，并且可操作地在时间上产生可变的垂直磁场并且在极靴旁边局部地产生。

公开(公告)号：US4524717A

公开(公告)日：1985-06-25

申请号：US485650

申请日：1983-04-18

申请人： Manfred Neumann ,  Siegfried Schiller ,  Gerhard ZeiBig ,  Henry Morgner ,  Gunter Jasch

发明人： Manfred Neumann ,  Siegfried Schiller ,  Gerhard ZeiBig ,  Henry Morgner ,  Gunter Jasch

IPC分类号： C23C14/30 ,  H01J37/305 ,  C23C13/10

CPC分类号： C23C14/30 ,  H01J37/3053

摘要： The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.

摘要翻译： 本发明是用于温度敏感的宽条或类似基底的涂布装置。 为了获得高质量的涂层，必须使通过蒸汽云的电子束（EB）的路径最小化，并且避免反向散射的电子从蒸发材料中排出。 根据本发明，通过在与EB喷枪连接的偏转系统上组装具有垂直场方向的扇区场来解决该问题，随后是具有水平场方向的偏转场。 发散电子束通过场的几何形状被引导到蒸发材料。

公开(公告)号：US5635087A

公开(公告)日：1997-06-03

申请号：US416869

申请日：1995-06-12

申请人： Siegfried Schiller ,  Manfred Neumann ,  Henry Morgner

发明人： Siegfried Schiller ,  Manfred Neumann ,  Henry Morgner

IPC分类号： C23C14/30 ,  C23C14/10 ,  C23C14/32 ,  C23C14/54 ,  H01J37/305 ,  B23K10/00

CPC分类号： C23C14/10 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/3266 ,  H01J2237/3137

摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporization. Substantially higher coating rates can be attained in vapor deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode are source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.

公开(公告)号：US5614248A

公开(公告)日：1997-03-25

申请号：US424418

申请日：1995-05-30

申请人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

发明人： Siegfried Schiller ,  Manfred Neumann ,  Volker Kirchhoff ,  Gerhard Zeissig ,  Nicolas Schiller ,  Klaus Goedicke

IPC分类号： C23C14/30 ,  C23C14/00 ,  C23C14/32 ,  C23C14/54 ,  C23C14/56 ,  B05D3/06 ,  H05H1/02

CPC分类号： C23C14/54 ,  C23C14/0021

摘要： Certain non-optical characteristics and, in particular, mechanical characteristics are not measurable in situ in the industrial production of layers using plasma-assisted reactive electron beam vaporization, particularly if high demands are made on the hardness, wear resistance and barrier action, so as to be able to reproducibly apply the layers. The values of the optical layer characteristics are to be used as a control signal. In this method, immediately after the substrate has passed through the vaporizing zone, the reflection and/or transmission and absorption capacity are measured in the wavelength range .DELTA..sub.k =150 to 800 nm and from this are determined the refractive index and optical absorption coefficient. These determined values are compared with an experimentally determined desired value. A control signal obtained therefrom, in the case of a constant reactive gas partial pressure, controls the plasma and maintains constant the optical characteristics of the layer. The method is used in the vapor-deposition of wear-resistance, hard layers or barrier layers, e.g. of metal oxide on glass, plastic and other materials, e.g. in the building industry for facade glass and in the packaging industry.

摘要翻译： PCT No.PCT / DE93 / 00748 Sec。 371日期：1995年5月30日 102（e）日期1995年5月30日PCT提交1993年8月18日PCT公布。 公开号WO94 / 10356 日期1994年5月11日具有非光学特性，特别是在使用等离子体辅助的反应电子束蒸发的工业生产中不能测量机械特性，特别是如果对硬度，耐磨性和阻挡层有高要求 动作，以便能够可重复地应用层。 光层特性的值被用作控制信号。 在该方法中，在基板通过蒸发区之后，在DELTA k = 150〜800nm的波长范围内测定反射和/或透射吸收能力，由此确定折射率和光吸收系数。 将这些确定的值与实验确定的期望值进行比较。 在恒定的反应气体分压的情况下，从其获得的控制信号控制等离子体并保持该层的光学特性恒定。 该方法用于耐磨性，硬质层或阻挡层的气相沉积，例如， 玻璃，塑料和其他材料上的金属氧化物，例如。 在建筑行业的立面玻璃和包装行业。

公开(公告)号：US4532888A

公开(公告)日：1985-08-06

申请号：US518473

申请日：1983-07-29

申请人： Manfred Neumann ,  Henry Morgner ,  Harry Forster ,  Gunter Jasch ,  Wilfried Kunack ,  Martin Godenschweg ,  Peter Unganz

发明人： Manfred Neumann ,  Henry Morgner ,  Harry Forster ,  Gunter Jasch ,  Wilfried Kunack ,  Martin Godenschweg ,  Peter Unganz

IPC分类号： C23C14/30 ,  H01J37/305 ,  C23C13/12

CPC分类号： H01J37/3053 ,  C23C14/30

摘要： Electron-beam (EB) coating of broad strips with improved film quality, and without undue scattering and deflection of the electron beam at long beam paths is accomplished with a shielding mantle, placed between the EB gun and the evaporation crucible, providing vacuum-tight shielding of the beam path from the coating chamber.

摘要翻译： 电子束（EB）涂层具有改善的膜质量，并且在长波束路径下电子束没有不适当的散射和偏转的情况下，用放置在EB喷枪和蒸发坩埚之间的屏蔽罩实现真空密封 光束路径与涂层室的屏蔽。

公开(公告)号：US08784537B2

公开(公告)日：2014-07-22

申请号：US13884840

申请日：2011-11-10

申请人： Matthias Seiler ,  Rolf Schneider ,  Jörn Rolker ,  Daniel Dembkowski ,  Manfred Neumann ,  Daniel Witthaut ,  Michael Keup ,  Volker Brehme ,  Muhammad Irfan

发明人： Matthias Seiler ,  Rolf Schneider ,  Jörn Rolker ,  Daniel Dembkowski ,  Manfred Neumann ,  Daniel Witthaut ,  Michael Keup ,  Volker Brehme ,  Muhammad Irfan

IPC分类号： B01D53/14

CPC分类号： B01D53/1425 ,  B01D53/1475 ,  B01D53/1493 ,  B01D53/62 ,  B01D53/78 ,  B01D2252/103 ,  B01D2252/20415 ,  B01D2252/20426 ,  B01D2252/20431 ,  B01D2252/20442 ,  B01D2252/502 ,  B01D2252/504 ,  B01D2257/504 ,  B01D2258/0283 ,  B01D2258/05 ,  C07D211/58 ,  C09K3/00 ,  C10K1/003 ,  C10K1/143 ,  C10L3/102 ,  F23J15/04 ,  F23J2215/50 ,  F23J2219/40 ,  Y02C10/06 ,  Y02E20/326 ,  Y02P20/152

摘要： CO2 is absorbed from a gas mixture by contacting the gas mixture with an absorption medium which comprises at least water as solvent and at least one amine of formula (I) where R1 is an aliphatic radical, having 2 to 6 carbon atoms and at least one amino group, and R2 is hydrogen, a C1-4 alkyl radical or a radical R1.

摘要翻译： 通过使气体混合物与至少包含水作为溶剂和至少一种式（I）的胺（其中R 1是具有2至6个碳原子的脂族基团）和至少一个 氨基，R2是氢，C1-4烷基或基团R1。

公开(公告)号：US20130247758A1

公开(公告)日：2013-09-26

申请号：US13884840

申请日：2011-11-10

申请人： Matthias Seiler ,  Rolf Schreider ,  Jörn Rolker ,  Daniel Dembkowski ,  Manfred Neumann ,  Daniel Witthaut ,  Michael Keup ,  Volker Brehme ,  Muhammad Irfan

发明人： Matthias Seiler ,  Rolf Schreider ,  Jörn Rolker ,  Daniel Dembkowski ,  Manfred Neumann ,  Daniel Witthaut ,  Michael Keup ,  Volker Brehme ,  Muhammad Irfan

IPC分类号： B01D53/14 ,  C09K3/00

CPC分类号： B01D53/1425 ,  B01D53/1475 ,  B01D53/1493 ,  B01D53/62 ,  B01D53/78 ,  B01D2252/103 ,  B01D2252/20415 ,  B01D2252/20426 ,  B01D2252/20431 ,  B01D2252/20442 ,  B01D2252/502 ,  B01D2252/504 ,  B01D2257/504 ,  B01D2258/0283 ,  B01D2258/05 ,  C07D211/58 ,  C09K3/00 ,  C10K1/003 ,  C10K1/143 ,  C10L3/102 ,  F23J15/04 ,  F23J2215/50 ,  F23J2219/40 ,  Y02C10/06 ,  Y02E20/326 ,  Y02P20/152

摘要： CO2 is absorbed from a gas mixture by contacting the gas mixture with an absorption medium which comprises at least water as solvent and at least one amine of formula (I) where R1 is an aliphatic radical, having 2 to 6 carbon atoms and at least one amino group, and R2 is hydrogen, a C1-4 alkyl radical or a radical R1.

摘要翻译： 通过使气体混合物与至少包含水作为溶剂和至少一种式（I）的胺（其中R 1是具有2至6个碳原子的脂族基团）和至少一个 氨基，R2是氢，C1-4烷基或基团R1。

公开(公告)号：US08522791B2

公开(公告)日：2013-09-03

申请号：US13120658

申请日：2009-07-09

申请人： Manfred Neumann

发明人： Manfred Neumann

IPC分类号： A24C5/00 ,  A24C5/18

CPC分类号： A24C5/425

摘要： An apparatus for filling a prefabricated cigarette tube includes a housing, a tobacco chamber with a tobacco holder, and a movable pressing bar configured so as to form tobacco introduced into the tobacco chamber into a tobacco strand. An abutment for an end of the tobacco strand is assigned to the tobacco holder, wherein a first length of the to be formed tobacco strand is adjustable to prefabricated cigarette tubes having different filling-cavity lengths by adjusting a second length of the pressing bar. A slider is configured to be moved relative to the housing so as to fill the prefabricated cigarette tube with the tobacco strand. The tobacco holder is displacably arranged relative to the abutment in a movement direction of the slider by a distance which approximately corresponds to the different filling-cavity lengths.

摘要翻译： 用于填充预制香烟管的装置包括壳体，具有烟草支架的烟草室和可移动按压杆，所述可动按压杆被构造成形成烟草引入到烟草股中的烟草。 用于烟丝束端的支座被分配给烟草支架，其中待成形烟草股的第一长度可通过调节压杆的第二长度而调节到具有不同填充腔长度的预制香烟管。 滑块构造成相对于壳体移动，以便用烟草线填充预制的香烟管。 烟草支架相对于支座在滑动件的运动方向上可置换地设置大致对应于不同的填充腔长度的距离。